Patents by Inventor Nora Sabina Radu
Nora Sabina Radu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9159927Abstract: A compound having Formula I, Formula II, or Formula III: Ar1 may independently be phenylene, substituted phenylene, naphthylene, or substituted naphthylene. Ar2 is the same or different at each occurrence and is an aryl group. M is the same or different at each occurrence and is a conjugated moiety. T1 and T2 are independently the same or different at each occurrence and are conjugated moieties which are connected in a non-planar configuration; a and e are the same or different at each occurrence and are an integer from 1 to 6; b, c, and d are mole fractions such that b+c+d=1.0, with the proviso that c is not zero, and at least one of b and d is not zero, and when b is zero, M has at least two triarylamine units; and n is an integer greater than 1.Type: GrantFiled: March 12, 2013Date of Patent: October 13, 2015Assignee: E I DU PONT DE NEMOURS AND COMPANYInventors: Gary A Johansson, Eric Maurice Smith, Reid John Chesterfield, Michael Henry Howard, Jr., Kyung-Ho Park, Nora Sabina Radu, Gene M Rossi, Frederick P Gentry, Troy C Gehret, Daniel David Lecloux, Adam Fennimore
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Patent number: 9099653Abstract: There is provided a compound having Formula I or Formula II: In the Formula: Ar1 is a single bond or an arylene; Ar2 is an aryl group; Ar3 is a single bond or an arylene; R1 is selected from H, D, aryl groups, alkyl groups, silyl groups, siloxane groups, fluoroalkyl groups, alkoxy groups, and fluoroalkoxy groups, or the two R1 groups may be joined together to form an aliphatic ring having 5-10 carbons; R2 is selected from D, aryl groups, alkyl groups, silyl groups, siloxane groups, fluoroalkyl groups, alkoxy groups, or fluoroalkoxy groups; M is a conjugated moiety; a is an integer from 0 to 2; b is an integer from 0 to 3; n is an integer equal to or greater than 1; and x and y are mole fractions where x+y=1.0.Type: GrantFiled: December 1, 2009Date of Patent: August 4, 2015Assignee: E I DU PONT DE NEMOURS AND COMPANYInventors: Kyung-Ho Park, Nora Sabina Radu
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Publication number: 20150021586Abstract: This invention relates to deuterated aryl-anthracene compounds that are useful in electronic applications. It also relates to electronic devices in which the active layer includes such a deuterated compound.Type: ApplicationFiled: October 8, 2014Publication date: January 22, 2015Inventors: DANIEL DAVID LECLOUX, Adam Fennimore, Weiying Gao, Nora Sabina Radu, Weishi Wu, Vsevolod Rostovtsev, Michael Henry Howard, JR., Hong Meng, Yulong Shen, Jeffrey A. Merlo, Eric Maurice Smith
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Patent number: 8890131Abstract: This invention relates to deuterated aryl-anthracene compounds that are useful in electronic applications. It also relates to electronic devices in which the active layer includes such a deuterated compound.Type: GrantFiled: March 6, 2013Date of Patent: November 18, 2014Assignee: E I du Pont de Nemours and CompanyInventors: Daniel David Lecloux, Adam Fennimore, Weiying Gao, Nora Sabina Radu, Weishi Wu, Vsevolod Rostovtsev, Michael Henry Howard, Jr., Hong Meng, Yulong Shen, Jeffrey A Merlo, Eric Maurice Smith
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Patent number: 8889269Abstract: A compound having Formula I, Formula II, or Formula III: Ar1 may independently be phenylene, substituted phenylene, naphthylene, or substituted naphthylene. Ar2 is the same or different at each occurrence and is an aryl group. M is the same or different at each occurrence and is a conjugated moiety. T1 and T2 are independently the same or different at each occurrence and are conjugated moieties which are connected in a non-planar configuration; a and e are the same or different at each occurrence and are an integer from 1 to 6; b, c, and d are mole fractions such that b+c+d=1.0, with the proviso that c is not zero, and at least one of b and d is not zero, and when b is zero, M has at least two triarylamine units; and n is an integer greater than 1.Type: GrantFiled: September 23, 2011Date of Patent: November 18, 2014Assignee: E I du Pont de Nemours and CompanyInventors: Gary A. Johansson, Eric Maurice Smith, Reid John Chesterfield, Michael Henry Howard, Jr., Kyung-Ho Park, Nora Sabina Radu, Gene M. Rossi, Frederick P. Gentry, Troy C. Gehret, Daniel David Lecloux, Adam Fennimore
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Patent number: 8766242Abstract: This invention relates to dibenzothiopyran compounds. This invention also relates to layers and devices including at least one of these compounds.Type: GrantFiled: November 29, 2011Date of Patent: July 1, 2014Assignee: E I du Pont de Nemours and CompanyInventors: Nora Sabina Radu, Steven W. Shuey, Ying Wang
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Patent number: 8759818Abstract: This invention relates to deuterated aryl-anthracene compounds that are useful in electronic applications. It also relates to electronic devices in which the active layer includes such a deuterated compound.Type: GrantFiled: December 21, 2009Date of Patent: June 24, 2014Assignee: E I du Pont de Nemours and CompanyInventors: Daniel David LeCloux, Adam Fennimore, Weiying Gao, Nora Sabina Radu, Weishi Wu, Vsevolod Rostovtsev, Michael Henry Howard, Jr., Hong Meng, Yulong Shen, Jeffrey A. Merlo, Eric Maurice Smith
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Patent number: 8716697Abstract: The present disclosure relates to electronic devices comprising at least one layer comprising novel cross-linkable polymers. The compounds can function as monomers, and copolymers can be formed from such monomers, such copolymers comprising, as polymerized units, a plurality of units of the compounds. The compositions are especially useful when incorporated into charge transport layers and light-emitting layers of a wide variety of electronic devices.Type: GrantFiled: December 28, 2007Date of Patent: May 6, 2014Assignee: E I du Pont de Nemours and CompanyInventors: Norman Herron, Gary A. Johansson, Nora Sabina Radu
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Patent number: 8652655Abstract: A compound having Formula I, Formula II, or Formula III: Ar1 may independently be phenylene, substituted phenylene, naphthylene, or substituted naphthylene. Ar2 is the same or different at each occurrence and is an aryl group. M is the same or different at each occurrence and is a conjugated moiety. T1 and T2 are independently the same or different at each occurrence and are conjugated moieties which are connected in a non-planar configuration.Type: GrantFiled: September 23, 2011Date of Patent: February 18, 2014Assignee: E I du Pont de Nemours and CompanyInventors: Gary A. Johansson, Eric Maurice Smith, Reid John Chesterfield, Michael Henry Howard, Jr., Kyung-Ho Park, Nora Sabina Radu, Gene M. Rossi, Frederick P. Gentry, Troy C. Gehret, Daniel David Lecloux, Adam Fennimore
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Publication number: 20140034941Abstract: There is provided a process for forming a contained second layer over a first layer, including the steps: forming the first layer having a first surface energy; treating the first layer with a priming layer; exposing the priming layer patternwise with radiation resulting in exposed areas and unexposed areas; developing the priming layer to effectively remove the priming layer from either the exposed areas or the unexposed areas resulting in a first layer having a pattern of priming layer, wherein the pattern of priming layer has a second surface energy that is higher than the first surface energy; and forming the second layer by liquid depositions on the pattern of priming layer on the first layer. There is also provided an organic electronic device made by the process.Type: ApplicationFiled: October 14, 2013Publication date: February 6, 2014Applicant: E I Du Pont De Nemours And CompanyInventors: ADAM FENNIMORE, Jonathan M. Ziebarth, Nora Sabina Radu
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Patent number: 8617720Abstract: There is provided an electroactive composition including: a deuterated first host material and an electroluminescent dopant material. The first host is a compound having Formula I: The compound of Formula I is deuterated. In Formula I: Ar1 to Ar4 are the same or different and are aryl; Q is a multivalent aryl group or where T is (CR?)a, SiR2, S, SO2, PR, PO, PO2, BR, or R; R is the same or different at each occurrence and is an alkyl group or an ary group; R? is the same or different at each occurrence and is selected H, D, or alkyl; a is an integer from 1-6; and m is an integer from 0-6.Type: GrantFiled: December 21, 2009Date of Patent: December 31, 2013Assignee: E I du Pont de Nemours and CompanyInventors: Michael Henry Howard, Jr., Nora Sabina Radu, Weishi Wu, Weiying Gao, Norman Herron, Eric Maurice Smith, Christina M. Older, Adam Fennimore, Ying Wang, Daniel David Lecloux, Kalindi Dogra, Vsevolod Rostovtsev, Jerald Feldman, Siddhartha Shenoy
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Publication number: 20130323880Abstract: There is provided a process for forming a contained second layer over a first layer, including the steps: forming the first layer having a first surface energy; treating the first layer with a priming material to form a priming layer; exposing the priming layer patternwise with radiation resulting in exposed areas and unexposed areas; developing the priming layer to effectively remove the priming layer from the unexposed areas resulting in a first layer having a pattern of developed priming layer, wherein the pattern of developed priming layer has a second surface energy that is higher than the first surface energy; and forming the second layer by liquid depositions on the pattern of developed priming layer on the first layer.Type: ApplicationFiled: February 10, 2012Publication date: December 5, 2013Applicant: EI Du Pont De Nemours and CompanyInventors: Nora Sabina Radu, Kyung-Ho Park, Adam Fennimore, Kerwin D. Dobbs
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Publication number: 20130320319Abstract: There is provided a compound having Formula I or Formula II: In the Formulae: Ar1 is an arylene having 6-30 carbons; Ar2 is an aryl group; Ar3 is an arylene; R1 is selected from H, D, aryl groups, alkyl groups, silyl groups, siloxane groups, fluoroalkyl groups, alkoxy groups, and fluoroalkoxy groups; R2 is selected from D, aryl groups, alkyl groups, silyl groups, siloxane groups, fluoroalkyl groups, alkoxy groups, or fluoroalkoxy groups; M is a conjugated moiety; a is an integer from 0 to 2; b is an integer from 0 to 3; n is an integer equal to or greater than 1; and x and y are mole fractions where x+y=1.0.Type: ApplicationFiled: August 9, 2013Publication date: December 5, 2013Applicant: E I DU PONT DE NEMOURS AND COMPANYInventors: KYUNG-HO PARK, NORA SABINA RADU
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Patent number: 8592239Abstract: There is provided a process for forming a contained second layer over a first layer, including the steps: forming the first layer having a first surface energy; treating the first layer with a priming layer; exposing the priming layer patternwise with radiation resulting in exposed areas and unexposed areas; developing the priming layer to effectively remove the priming layer from either the exposed areas or the unexposed areas resulting in a first layer having a pattern of priming layer, wherein the pattern of priming layer has a second surface energy that is higher than the first surface energy; and forming the second layer by liquid depositions on the pattern of priming layer on the first layer. There is also provided an organic electronic device made by the process.Type: GrantFiled: December 21, 2009Date of Patent: November 26, 2013Assignee: E I du Pont de Nemours and CompanyInventors: Adam Fennimore, Jonathan M. Ziebarth, Nora Sabina Radu
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Publication number: 20130299801Abstract: This invention relates to deuterated compounds that are useful in electroluminescent applications. It also relates to electronic devices in which the active layer includes such a deuterated compound.Type: ApplicationFiled: July 18, 2013Publication date: November 14, 2013Inventors: NORMAN HERRON, Vsevolod Rostovtsev, Jeffrey A. Merlo, Michael Henry Howard, JR., Adam Fennimore, Weiying Gao, Kalindi Dogra, Nora Sabina Radu, Weishi Wu, Eric Maurice Smith, Daniel David Lecloux
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Publication number: 20130264561Abstract: This invention relates to a composition including (a) a dopant, (b) a first host having at least one unit of Formula I, and (c) a second host compound. Formula I has the structure In Formula I: Ar1, Ar2, and Ar3 are the same or different and are H, D, or aryl groups. At least two of Ar1, Ar2, and Ar3 are aryl and none of Ar1, Ar2, and Ar3 includes an indolocarbazole moiety.Type: ApplicationFiled: December 19, 2011Publication date: October 10, 2013Applicant: E I DU PONT DE NEMOURS AND COMPANYInventors: Kerwin D. Dobbs, Adam Fennimore, Weiying Gao, Mark A. Guidry, Norman Herron, Nora Sabina Radu, Gene M. Rossi, Gabriel C. Schumacher
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Publication number: 20130264560Abstract: There is provided a compound having at least one unit of Formula I where Ar1, Ar2, and Ar3 are the same or different and have Formula II In Formula II: R1 is the same or different at each occurrence and is D, alkyl, or silyl, or adjacent R1 groups can be joined together to form a 6-membered fused aromatic ring; Q is the same or different at each occurrence and is phenyl, naphthyl, substituted naphthyl, an N,O,S-heterocycle, or a deuterated analog thereof; a is an integer from 1-5; b is an integer from 0-5, with the proviso that when b=5, c=0; and c is an integer from 0-4. In the compound not all Ar1, Ar2, and Ar3 are the same.Type: ApplicationFiled: December 19, 2011Publication date: October 10, 2013Applicant: E I DU PONT DE NEMOURS AND COMPANYInventors: Kerwin D. Dobbs, Adam Fennimore, Weiying Gao, Mark A Guidry, Norman Herron, Nora Sabina Radu, Gene M Rossi, Gabriel C Schumacher
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Patent number: 8551624Abstract: There is provided a compound having Formula I or Formula II: In the Formulae: Ar1 is an arylene having 6-30 carbons; Ar2 is an aryl group; Ar3 is an arylene; R1 is selected from H, D, aryl groups, alkyl groups, silyl groups, siloxane groups, fluoroalkyl groups, alkoxy groups, and fluoroalkoxy groups; R2 is selected from D, aryl groups, alkyl groups, silyl groups, siloxane groups, fluoroalkyl groups, alkoxy groups, or fluoroalkoxy groups; M is a conjugated moiety; a is an integer from 0 to 2; b is an integer from 0 to 3; n is an integer equal to or greater than 1; and x and y are mole fractions where x+y=1.0.Type: GrantFiled: December 1, 2009Date of Patent: October 8, 2013Assignee: E I du Pont de Nemours and CompanyInventors: Kyung-Ho Park, Nora Sabina Radu
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Publication number: 20130248848Abstract: There is provided a process for forming a contained second layer over a first layer, including the steps: forming the first layer having a first surface energy; treating the first layer with a priming material to form a priming layer; exposing the priming layer patternwise with radiation resulting in exposed areas and unexposed areas; developing the priming layer to effectively remove the priming layer from the unexposed areas resulting in a first layer having a pattern of priming layer, wherein the pattern of priming layer has a second surface energy that is higher than the first surface energy; and forming the second layer by liquid depositions on the pattern of priming layer on the first layer.Type: ApplicationFiled: December 19, 2011Publication date: September 26, 2013Applicant: E.I. Du Pont Nemours and CompanyInventors: Nora Sabina Radu, Adam Fennimore
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Publication number: 20130248849Abstract: This invention relates to a composition including (a) a dopant, (b) a first host having at least one unit of Formula I, and (c) a second host compound. Formula I has the structure where Q is a fused ring linkage having the formula In Formula I: R1 is the same or different at each occurrence and is D, alkyl, aryl, silyl, alkoxy, aryloxy, cyano, vinyl, or allyl; R2 is the same or different at each occurrence and is H, D, alkyl, or aryl, or both R2 are an N-heterocycle; R3 is the same or different at each occurrence and is H, D, cyano, alkyl or aryl; and a is the same or different at each occurrence and is an integer from 0-4.Type: ApplicationFiled: December 19, 2011Publication date: September 26, 2013Applicant: E I DuPont De Nemours and CompanyInventors: Jerals Feldman, Norman Herron, Michael Henry Howard, JR., Nora Sabina Radu, Vsevolod Rostovtsev, Kerwin D. Dobbs, Adam Fennimore, Weiying Gao, Weishi Wu, Ying Wang, Charles D. Mclaren