Patents by Inventor Norbert Muehlberger
Norbert Muehlberger has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9996012Abstract: A facet mirror is to be used as a bundle-guiding optical component in a projection exposure apparatus for microlithography. The facet mirror has a plurality of separate mirrors. For individual deflection of incident illumination light, the separate mirrors are in each case connected to an actuator in such a way that they are separately tiltable about at least one tilt axis. A control device, which is connected to the actuators, is configured in such a way that a given grouping of the separate mirrors can be grouped into separate mirror groups that include in each case at least two separate mirrors. The result is a facet mirror which, when installed in the projection exposure apparatus, increases the variability for setting various illumination geometries of an object field to be illuminated by the projection exposure apparatus. Various embodiments of separate mirrors for forming the facet mirrors are described.Type: GrantFiled: July 5, 2016Date of Patent: June 12, 2018Assignee: Carl Zeiss SMT GmbHInventors: Udo Dinger, Martin Endres, Armin Werber, Norbert Muehlberger, Florian Bach
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Patent number: 9513562Abstract: A projection exposure apparatus for microlithography for the production of semiconductor components includes at least one optical assembly with at least one optical element which can be actuated in a mechanically controlled manner is mounted in a structure. For carrying out the mechanical actuation, a control signal transmission device and/or an energy transmission device are/is provided, which introduce(s) no parasitic mechanical effects into the optical assembly at least during specific operating states of the projection exposure apparatus.Type: GrantFiled: September 29, 2014Date of Patent: December 6, 2016Assignee: Carl Zeiss SMT GmbHInventors: Juergen Fischer, Armin Schoeppach, Matthias Orth, Norbert Muehlberger, Thorsten Rassel, Armin Werber, Juergen Huber
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Publication number: 20160313646Abstract: A facet mirror is to be used as a bundle-guiding optical component in a projection exposure apparatus for microlithography. The facet mirror has a plurality of separate mirrors. For individual deflection of incident illumination light, the separate mirrors are in each case connected to an actuator in such a way that they are separately tiltable about at least one tilt axis. A control device, which is connected to the actuators, is configured in such a way that a given grouping of the separate mirrors can be grouped into separate mirror groups that include in each case at least two separate mirrors. The result is a facet mirror which, when installed in the projection exposure apparatus, increases the variability for setting various illumination geometries of an object field to be illuminated by the projection exposure apparatus. Various embodiments of separate mirrors for forming the facet mirrors are described.Type: ApplicationFiled: July 5, 2016Publication date: October 27, 2016Inventors: Udo Dinger, Martin Endres, Armin Werber, Norbert Muehlberger, Florian Bach
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Patent number: 9448384Abstract: The invention relates to an arrangement for mounting an optical element, in particular in an EUV projection exposure apparatus, comprising a weight force compensation device for exerting a compensation force on the optical element, wherein the compensation force at least partly compensates for the weight force acting on the optical element, wherein the weight force compensation device has a passive magnetic circuit for generating a force component of the compensation force acting on the optical element, and wherein at least one adjustment element is provided via which the force component generated by the passive magnetic circuit is continuously adjustable.Type: GrantFiled: May 28, 2013Date of Patent: September 20, 2016Assignee: Carl Zeiss SMT GmbHInventors: Michael Erath, Florian Bach, Ulrich Schoenhoff, Rodolfo Rabe, Norbert Muehlberger, Dirk Eicher, Jasper Wesselingh
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Patent number: 9411241Abstract: A facet mirror is to be used as a bundle-guiding optical component in a projection exposure apparatus for microlithography. The facet mirror has a plurality of separate mirrors. For individual deflection of incident illumination light, the separate mirrors are in each case connected to an actuator in such a way that they are separately tiltable about at least one tilt axis. A control device, which is connected to the actuators, is configured in such a way that a given grouping of the separate mirrors can be grouped into separate mirror groups that include in each case at least two separate mirrors. The result is a facet mirror which, when installed in the projection exposure apparatus, increases the variability for setting various illumination geometries of an object field to be illuminated by the projection exposure apparatus. Various embodiments of separate mirrors for forming the facet mirrors are described.Type: GrantFiled: August 2, 2010Date of Patent: August 9, 2016Assignee: Carl Zeiss SMT GmbHInventors: Udo Dinger, Martin Endres, Armin Werber, Norbert Muehlberger, Florian Bach
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Patent number: 9341807Abstract: A gravitation compensator for mounting optical elements in a projection exposure apparatus and a corresponding projection exposure apparatus are disclosed. The gravitation compensator at least partly compensates for the weight force of a mounted optical element and simultaneously enables a change in the position of the optical element without the compensated weight force being altered in an impermissible manner during the change in position. This applies, in particular, to high weight forces which are to be compensated. Furthermore, the gravitation compensator enables use in different atmospheres and the compensation of corresponding aging effects.Type: GrantFiled: September 12, 2014Date of Patent: May 17, 2016Assignee: Carl Zeiss SMT GmbHInventors: Norbert Muehlberger, Thorsten Rassel, Armin Schoeppach, Juergen Fischer, Matthias Orth
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Patent number: 9025128Abstract: The present disclosure relates to an actuator for projection exposure systems that include a magnet. The magnet is encapsulated and/or supported in a magnet holding plate that is produced by microtechnical production methods so that a moving manipulator surface is held in the magnet holding plate via monolithic or bonded connections without additional connecting material so that there is a secure connection.Type: GrantFiled: August 2, 2011Date of Patent: May 5, 2015Assignee: Carl Zeiss SMT GmbHInventors: Armin Werber, Norbert Muehlberger, Almut Czap, Juergen Fischer
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Patent number: 9013676Abstract: An individual mirror is used to construct a facet mirror. A mirror body of the individual mirror is configured to be tiltable relative to a rigid carrier body about at least one tilting axis of a tilting joint. The tilting joint is configured as a solid-body joint. The solid-body joint, perpendicular to the tilting axis, has a joint thickness S and, along the tilting axis, a joint length L. The following applies: L/S>50. The result is an individual mirror to construct a facet mirror, which can be reproduced and is precisely adjustable and simultaneously ensures adequate heat removal, in particular, heat produced by residually absorbed useful radiation, which is reflected by the individual mirror, by dissipation of the heat by the mirror body.Type: GrantFiled: June 29, 2011Date of Patent: April 21, 2015Assignee: Carl Zeiss SMT GmbHInventors: Armin Werber, Norbert Muehlberger, Florian Bach
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Publication number: 20150015864Abstract: A projection exposure apparatus for microlithography for the production of semiconductor components includes at least one optical assembly with at least one optical element which can be actuated in a mechanically controlled manner is mounted in a structure. For carrying out the mechanical actuation, a control signal transmission device and/or an energy transmission device are/is provided, which introduce(s) no parasitic mechanical effects into the optical assembly at least during specific operating states of the projection exposure apparatus.Type: ApplicationFiled: September 29, 2014Publication date: January 15, 2015Inventors: Juergen Fischer, Armin Schoeppach, Matthias Orth, Norbert Muehlberger, Thorsten Rassel, Armin Werber, Juergen Huber
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Publication number: 20150009557Abstract: A gravitation compensator for mounting optical elements in a projection exposure apparatus and a corresponding projection exposure apparatus are disclosed. The gravitation compensator at least partly compensates for the weight force of a mounted optical element and simultaneously enables a change in the position of the optical element without the compensated weight force being altered in an impermissible manner during the change in position. This applies, in particular, to high weight forces which are to be compensated. Furthermore, the gravitation compensator enables use in different atmospheres and the compensation of corresponding aging effects.Type: ApplicationFiled: September 12, 2014Publication date: January 8, 2015Inventors: Norbert Muehlberger, Thorsten Rassel, Armin Schoeppach, Juergen Fischer, Matthias Orth
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Patent number: 8885143Abstract: A projection exposure apparatus for microlithography for the production of semiconductor components includes at least one optical assembly with at least one optical element which can be actuated in a mechanically controlled manner is mounted in a structure. For carrying out the mechanical actuation, a control signal transmission device and/or an energy transmission device are/is provided, which introduce(s) no parasitic mechanical effects into the optical assembly at least during specific operating states of the projection exposure apparatus.Type: GrantFiled: March 24, 2011Date of Patent: November 11, 2014Assignee: Carl Zeiss SMT GmbHInventors: Juergen Fischer, Armin Schoeppach, Matthias Orth, Norbert Muehlberger, Thorsten Rassel, Armin Werber, Juergen Huber
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Patent number: 8854603Abstract: A gravitation compensator for mounting optical elements in a projection exposure apparatus and a corresponding projection exposure apparatus are disclosed. The gravitation compensator at least partly compensates for the weight force of a mounted optical element and simultaneously enables a change in the position of the optical element without the compensated weight force being altered in an impermissible manner during the change in position. This applies, in particular, to high weight forces which are to be compensated. Furthermore, the gravitation compensator enables use in different atmospheres and the compensation of corresponding aging effects.Type: GrantFiled: May 19, 2011Date of Patent: October 7, 2014Assignee: Carl Zeiss SMT GmbHInventors: Norbert Muehlberger, Thorsten Rassel, Armin Schoeppach, Juergen Fischer, Matthias Orth
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Publication number: 20130314681Abstract: The invention relates to an arrangement for mounting an optical element, in particular in an EUV projection exposure apparatus, comprising a weight force compensation device (103) for exerting a compensation force on the optical element (101), wherein said compensation force at least partly compensates for the weight force acting on the optical element (101), wherein the weight force compensation device (103) has a passive magnetic circuit for generating a force component of the compensation force acting on the optical element (101), and wherein at least one adjustment element (880) is provided by means of which the force component generated by the passive magnetic circuit is continuously adjustable.Type: ApplicationFiled: May 28, 2013Publication date: November 28, 2013Inventors: Michael Erath, Florian Bach, Ulrich Schoenhoff, Rodolfo Rabe, Norbert Muehlberger, Dirk Eicher, Jasper Wesselingh
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Publication number: 20120008121Abstract: The present disclosure relates to an actuator for projection exposure systems that include a magnet. The magnet is encapsulated and/or supported in a magnet holding plate that is produced by microtechnical production methods so that a moving manipulator surface is held in the magnet holding plate via monolithic or bonded connections without additional connecting material so that there is a secure connection.Type: ApplicationFiled: August 2, 2011Publication date: January 12, 2012Applicant: CARL ZEISS SMT GMBHInventors: Armin Werber, Norbert Muehlberger, Almut Czap, Juergen Fischer
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Publication number: 20110273694Abstract: An individual mirror is used to construct a facet mirror. A mirror body of the individual mirror is configured to be tiltable relative to a rigid carrier body about at least one tilting axis of a tilting joint. The tilting joint is configured as a solid-body joint. The solid-body joint, perpendicular to the tilting axis, has a joint thickness S and, along the tilting axis, a joint length L. The following applies: L/S>50. The result is an individual mirror to construct a facet mirror, which can be reproduced and is precisely adjustable and simultaneously ensures adequate heat removal, in particular, heat produced by residually absorbed useful radiation, which is reflected by the individual mirror, by dissipation of the heat by the mirror body.Type: ApplicationFiled: June 29, 2011Publication date: November 10, 2011Applicant: CARL ZEISS SMT GMBHInventors: Armin Werber, Norbert Muehlberger, Florian Bach
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Publication number: 20110267596Abstract: A gravitation compensator for mounting optical elements in a projection exposure apparatus and a corresponding projection exposure apparatus are disclosed. The gravitation compensator at least partly compensates for the weight force of a mounted optical element and simultaneously enables a change in the position of the optical element without the compensated weight force being altered in an impermissible manner during the change in position. This applies, in particular, to high weight forces which are to be compensated. Furthermore, the gravitation compensator enables use in different atmospheres and the compensation of corresponding aging effects.Type: ApplicationFiled: May 19, 2011Publication date: November 3, 2011Applicant: CARL ZEISS SMT GMBHInventors: Norbert Muehlberger, Thorsten Rassel, Armin Schoeppach, Juergen Fischer, Matthias Orth
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Publication number: 20110235012Abstract: A projection exposure apparatus for microlithography for the production of semiconductor components includes at least one optical assembly with at least one optical element which can be actuated in a mechanically controlled manner is mounted in a structure. For carrying out the mechanical actuation, a control signal transmission device and/or an energy transmission device are/is provided, which introduce(s) no parasitic mechanical effects into the optical assembly at least during specific operating states of the projection exposure apparatus.Type: ApplicationFiled: March 24, 2011Publication date: September 29, 2011Applicant: CARL ZEISS SMT GMBHInventors: Juergen Fischer, Armin Schoeppach, Matthias Orth, Norbert Muehlberger, Thorsten Rassel, Armin Werber, Juergen Huber
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Publication number: 20110001947Abstract: A facet mirror is to be used as a bundle-guiding optical component in a projection exposure apparatus for microlithography. The facet mirror has a plurality of separate mirrors. For individual deflection of incident illumination light, the separate mirrors are in each case connected to an actuator in such a way that they are separately tiltable about at least one tilt axis. A control device, which is connected to the actuators, is configured in such a way that a given grouping of the separate mirrors can be grouped into separate mirror groups that include in each case at least two separate mirrors. The result is a facet mirror which, when installed in the projection exposure apparatus, increases the variability for setting various illumination geometries of an object field to be illuminated by the projection exposure apparatus. Various embodiments of separate mirrors for forming the facet mirrors are described.Type: ApplicationFiled: August 2, 2010Publication date: January 6, 2011Applicant: CARL ZEISS SMT AGInventors: Udo Dinger, Martin Endres, Armin Werber, Norbert Muehlberger, Florian Bach