Abstract: A support structure supports support objects. The support structure comprises a resonance apparatus that resonates with air vibrations transmitted from the exterior to damp the air vibrations.

Abstract: A piezoelectric device is provided at a base member. Regulating apparatus is provided that regulate, of deformations transmitted via the base member to the piezoelectric device, the transmission of a deformation in second directions, which intersect first directions.

Abstract: Positional information on the scanning direction and non-scanning direction of a reticle stage is measured, based on each of the measurement results of a reticle Y interferometer and a reticle X interferometer. Positional information of a wafer stage is also measured, based on measurement results of a wafer interferometer. Then, based on the measurement results of positional information on the non-scanning direction of the reticle stage, and on correlation information that denotes a relation between position measurement errors of reference points on the reflection surfaces stored in advance and the position of the reticle stage in the non-scanning direction corresponding to the position measurement errors, the positional information of the reticle stage whose measurement errors by the reticle Y interferometer have been corrected is obtained, and thus both stages are driven and controlled based on the corrected positional information and the positional information on the scanning direction-of the wafer sage.