Patents by Inventor Norihiko Nomura
Norihiko Nomura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7635501Abstract: An exhaust pipe (10) includes an inner cylinder (11) having an exhaust gas passage (10?) formed therein, an outer cylinder provided outside the inner cylinder with a gap (15) being formed therebetween and a heating device (13) attached to the inner cylinder 11. The gap (15) is communicated with the exhaust gas passage (10?). When a gas is discharged from the reaction vacuum chamber, a vacuum is created not only in the exhaust gas passage (10?) but also in the gap (15). Therefore, release of heat from the heating device to the outside can be suppressed. Consequently, the inner cylinder (11) can be efficiently heated to a sufficiently high temperature, thus preventing deposition and accumulation of a substance contained in the discharged gas on the inner surface of the inner cylinder (11). The deposition and accumulation of such a substance can also be prevented by forming a gas flow layer (18) of, for example, an inert gas, along the inner surface of the inner cylinder (11.Type: GrantFiled: February 14, 2001Date of Patent: December 22, 2009Assignee: Ebara CorporationInventors: Tetsuo Komai, Norihiko Nomura
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Patent number: 7217306Abstract: A continuous processing trap apparatus is capable of increasing the trapping efficiency while maintaining conductance required by a vacuum chamber. The trap apparatus includes an exhaust passage for evacuating a hermetically sealed chamber by a vacuum pump, a hermetically sealed trapping and regenerating casing extending across the exhaust passage and a regenerating passage adjacent to the exhaust passage, and a trap unit movably housed in the trapping and regenerating casing for selective movement between a trapping position connected to the exhaust passage and a regenerating position connected to the regenerating passage. The trap apparatus further includes valve bodies disposed one on each side of the trap unit and supporting seals on outer circumferential surfaces thereof for sealing the exhaust passage and the regenerating passage from each other, and a monitoring mechanism for monitoring whether the seals are functioning normally.Type: GrantFiled: May 6, 2004Date of Patent: May 15, 2007Assignee: Ebara CorporationInventors: Norihiko Nomura, Nobuharu Noji, Kiyoshi Yanagisawa
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Publication number: 20040200214Abstract: A continuous processing trap apparatus is capable of increasing the trapping efficiency while maintaining conductance required by a vacuum chamber. The trap apparatus includes an exhaust passage for evacuating a hermetically sealed chamber by a vacuum pump, a hermetically sealed trapping and regenerating casing extending across the exhaust passage and a regenerating passage adjacent to the exhaust passage, and a trap unit movably housed in the trapping and regenerating casing for selective movement between a trapping position connected to the exhaust passage and a regenerating position connected to the regenerating passage. The trap apparatus further includes valve bodies disposed one on each side of the trap unit and supporting seals on outer circumferential surfaces thereof for sealing the exhaust passage and the regenerating passage from each other, and a monitoring mechanism for monitoring whether the seals are functioning normally.Type: ApplicationFiled: May 6, 2004Publication date: October 14, 2004Inventors: Norihiko Nomura, Nobuharu Noji, Kiyoshi Yanagisawa
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Patent number: 6763700Abstract: A continuous processing trap apparatus is capable of increasing the trapping efficiency while maintaining conductance required by a vacuum chamber. The trap apparatus includes an exhaust passage for evacuating a hermetically sealed chamber by a vacuum pump, a hermetically sealed trapping and regenerating casing extending across the exhaust passage and a regenerating passage adjacent to the exhaust passage, and a trap unit movably housed in the trapping and regenerating casing for selective movement between a trapping position connected to the exhaust passage and a regenerating position connected to the regenerating passage. The trap apparatus further includes valve bodies disposed one on each side of the trap unit and supporting seals on outer circumferential surfaces thereof for sealing the exhaust passage and the regenerating passage from each other, and a monitoring mechanism for monitoring whether the seals are functioning normally.Type: GrantFiled: March 14, 2003Date of Patent: July 20, 2004Assignee: Ebara CorporationInventors: Norihiko Nomura, Nobuharu Noji, Kiyoshi Yanagisawa
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Publication number: 20030172713Abstract: A continuous processing trap apparatus is capable of increasing the trapping efficiency while maintaining conductance required by a vacuum chamber. The trap apparatus includes an exhaust passage for evacuating a hermetically sealed chamber by a vacuum pump, a hermetically sealed trapping and regenerating casing extending across the exhaust passage and a regenerating passage adjacent to the exhaust passage, and a trap unit movably housed in the trapping and regenerating casing for selective movement between a trapping position connected to the exhaust passage and a regenerating position connected to the regenerating passage. The trap apparatus further includes valve bodies disposed one on each side of the trap unit and supporting seals on outer circumferential surfaces thereof for sealing the exhaust passage and the regenerating passage from each other, and a monitoring mechanism for monitoring whether the seals are functioning normally.Type: ApplicationFiled: March 14, 2003Publication date: September 18, 2003Inventors: Norihiko Nomura, Nobuharu Noji, Kiyoshi Yanagisawa
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Publication number: 20030136365Abstract: It is an object of the present invention to provide an exhaust pipe used for discharging a gas from a reaction vacuum chamber, which effectively prevents a substance contained in the discharged gas from being deposited and accumulated on an inner surface of the exhaust pipe.Type: ApplicationFiled: November 5, 2002Publication date: July 24, 2003Inventors: Tetsuo Komai, Norihiko Nomura
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Patent number: 6553811Abstract: A continuous processing trap apparatus is capable of increasing the trapping efficiency while maintaining conductance required by a vacuum chamber. The trap apparatus includes an exhaust passage for evacuating a hermetically sealed chamber by a vacuum pump, a hermetically sealed trapping and regenerating casing extending across the exhaust passage and a regenerating passage adjacent to the exhaust passage, and a trap unit movably housed in the trapping and regenerating casing for selective movement between a trapping position connected to the exhaust passage and a regenerating position connected to the regenerating passage. The trap apparatus further includes valve bodies disposed one on each side of the trap unit and supporting seals on outer circumferential surfaces thereof for sealing the exhaust passage and the regenerating passage from each other, and a monitoring mechanism for monitoring whether the seals are functioning normally.Type: GrantFiled: November 9, 2001Date of Patent: April 29, 2003Assignee: Ebara CorporationInventors: Norihiko Nomura, Nobuharu Noji, Kiyoshi Yanagisawa
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Patent number: 6554879Abstract: A trap apparatus includes a discharge path for evacuating a hermetically sealed chamber through a vacuum pump, a hermetically sealed trap container extended across the discharge path and a regeneration path disposed adjacent to the discharge path, a trap unit disposed in the trap container for attaching a product in a discharged gas thereon and removing the product form the discharged gas, the trap unit being selectively located at the discharge path or the regeneration path, a valve element disposed on both sides of the trap unit and being movable integrally with the trap unit, and a sealing material mounted on an outer circumferential surface of the valve element so as to slide over an inner circumferential surface of the trap container when the trap unit is moved.Type: GrantFiled: August 1, 2000Date of Patent: April 29, 2003Assignee: Ebara CorporationInventor: Norihiko Nomura
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Patent number: 6464466Abstract: A trap apparatus is provided for improving the efficiency of trapping a product or the efficiency of regenerating the trap unit, i.e., the efficiency of removing the product deposited on the trap unit. The trap apparatus is disposed in a discharge path for evacuating a hermetically sealed chamber through a vacuum pump. The trap apparatus comprises a trap unit for depositing thereon a product contained in a discharged gas and removing the product, and the trap unit has a surface which has been subjected to hydrophilization treatment.Type: GrantFiled: November 7, 2000Date of Patent: October 15, 2002Assignee: Ebara CorporationInventors: Norihiko Nomura, Nobuharu Noji
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Publication number: 20020056311Abstract: A continuous processing trap apparatus is capable of increasing the trapping efficiency while maintaining conductance required by a vacuum chamber. The trap apparatus includes an exhaust passage for evacuating a hermetically sealed chamber by a vacuum pump, a hermetically sealed trapping and regenerating casing extending across the exhaust passage and a regenerating passage adjacent to the exhaust passage, and a trap unit movably housed in the trapping and regenerating casing for selective movement between a trapping position connected to the exhaust passage and a regenerating position connected to the regenerating passage. The trap apparatus further includes valve bodies disposed one on each side of the trap unit and supporting seals on outer circumferential surfaces thereof for sealing the exhaust passage and the regenerating passage from each other, and a monitoring mechanism for monitoring whether the seals are functioning normally.Type: ApplicationFiled: November 9, 2001Publication date: May 16, 2002Inventors: Norihiko Nomura, Nobuharu Noji, Kiyoshi Yanagisawa
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Patent number: 6368371Abstract: The present invention provides a trap apparatus which is capable of increasing the trapping efficiency while fulfilling a conductance allowed by a vacuum chamber in a depositing process or the like, for thereby increasing the service life of a vacuum pump and protecting a toxic substance removing device for increased operation reliability, and reducing equipment and running costs. The trap apparatus has a trap unit (18) disposed in a discharge passage (14) for discharging therethrough a gas from a vacuum chamber (10) with a vacuum pump (12) for trapping and removing a product in a discharged gas. The trap unit (18) has trap passages comprising an upstream passage portion (44) spreading outwardly from the center and a downstream passage portion (42) directed inwardly toward the center.Type: GrantFiled: February 14, 2000Date of Patent: April 9, 2002Assignee: Ebara CorporationInventors: Norihiko Nomura, Nobuharu Noji
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Patent number: 6332925Abstract: An evacuation system having a long service life, a compact configuration and high reliability is disclosed. The system enables the process gases to be reused, so that the overall costs of capital investment and operation are reduced. The system comprises a processing chamber, and a vacuum pump communicating with the processing chamber by way of an evacuation conduit for evacuating the processing chamber. The evacuation conduit are provided with not less than two trapping devices arranged in series and operating at different temperatures for capturing different components contained in an exhaust gas discharged from the processing chamber.Type: GrantFiled: May 21, 1997Date of Patent: December 25, 2001Assignee: Ebara CorporationInventors: Nobuharu Noji, Yasuhiro Niimura, Hiroaki Ogamino, Hiroshi Hattori, Norihiko Nomura, Tetsuro Sugiura, Yuji Matsuoka
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Patent number: 6158226Abstract: A trapping device is presented to improve production efficiency of vacuum processing devices. The trapping device comprises an exhaust path for evacuating process gas from a hermetic chamber through a vacuum pump; a regeneration path disposed adjacent to the exhaust path and comprising a regeneration means; not less than two trap sections communicable either with the exhaust path or with the regeneration path; and switching means for transposing the trap sections either to the exhaust path or to the regeneration path. A trapping operation and a regeneration operation can be performed concurrently respectively in the exhaust path and the regeneration path.Type: GrantFiled: December 15, 1997Date of Patent: December 12, 2000Assignees: Ebara Corporation, CKD CorporationInventors: Nobuharu Noji, Norihiko Nomura, Tetsuro Sugiura, Yuji Matsuoka
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Patent number: 6051053Abstract: A trapping device that performs a regeneration operation efficiently so as to raise the overall operational reliability by improving the service life as well as to lower the capital and operation cost of the processing system. The trapping device includes an exhaust path for evacuating a spent gas from a hermetic chamber through a vacuum pump; a trap section for trapping component substances from the spent gas flowing through the exhaust path; a cleaning path disposed adjacent to the exhaust path for flowing a cleaning solution for cleaning the trap section; and driving device for transposing the trap section to communicate either with the exhaust path or with the cleaning path.Type: GrantFiled: December 15, 1997Date of Patent: April 18, 2000Assignee: Ebara CorporationInventors: Nobuharu Noji, Norihiko Nomura, Tetsuro Sugiura