Patents by Inventor Norihiro Ito
Norihiro Ito has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11322373Abstract: A liquid processing apparatus according to an embodiment includes a holding unit, a driving unit, a shaft, and a nozzle. The driving unit rotates the substrate and the holding unit that horizontally holds the substrate. The shaft is extended along an axial direction of a rotation axis. The nozzle includes a base that is attached to an upper end of the shaft, and a liquid supply unit that is extended from the base to a radial-direction outer side of the substrate and includes discharge ports formed to discharge the liquid toward a lower surface of the substrate. The shaft and the base are configured to include a discharge passage that is formed along the axial direction to discharge the liquid discharged toward the lower surface of the substrate. The base includes a concave portion that is concave downward to cause the liquid to flow toward the discharge passage.Type: GrantFiled: January 29, 2018Date of Patent: May 3, 2022Assignee: TOKYO ELECTRON LIMITEDInventors: Terufumi Wakiyama, Norihiro Ito
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Publication number: 20210230795Abstract: The present invention relates to a method for producing modified cellulose fibers having cellulose I crystal structure, comprising: step A: introducing Substituent Group A to cellulose fibers via an ether bond in a solvent comprising water in the presence of a base, and step B: introducing Substituent Group B to cellulose fibers via an ether bond in a solvent comprising water in the presence of a base, wherein the method includes the steps A and B concurrently, or in the order of the step A and then the step B. The cellulose fibers of the present invention obtained by the method for production of the present invention have favorable dispersibility in a hydrophobic medium and a controlled increase in viscosity.Type: ApplicationFiled: June 11, 2019Publication date: July 29, 2021Applicant: KAO CORPORATIONInventors: Yutaka YOSHIDA, Shotaro SHIBATA, Haruka NAKAGAWA, Yoshiaki KUMAMOTO, Norihiro ITO, Yusaku ASAI
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Patent number: 11024518Abstract: A substrate processing apparatus includes a stationary cup body 51 provided to surround a substrate holding unit 31 and configured to receive a processing liquid or mist of the processing liquid discharged onto a substrate, the stationary cup body not being moved relatively with respect to a processing vessel; a mist guard 80; and a guard elevating mechanism 84 configured to elevate the mist guard. Here, the mist guard is provided at an outside of the stationary cup body to surround the stationary cup body and configured to block a liquid scattered outwards beyond a space above the stationary cup body. Further, the mist guard includes a cylindrical portion 81 of a cylindrical shape and a protruding portion 82 protruded from an upper portion of the cylindrical portion toward an inside of the cylindrical portion.Type: GrantFiled: July 28, 2016Date of Patent: June 1, 2021Assignee: TOKYO ELECTRON LIMITEDInventors: Norihiro Ito, Jiro Higashijima, Nobuhiro Ogata, Takahisa Otsuka, Yuichi Douki, Yusuke Hashimoto, Kazuhiro Aiura, Daisuke Goto
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Patent number: 10947194Abstract: A method for producing dihydroxyindoles includes: a step 1 of obtaining an aqueous first solution including DHIs obtained by causing DOPAs to react with hexacyanoferrate(III); a step 2 of obtaining an oleaginous second solution in which DHIs are extracted in an extraction solvent by mixing the first solution obtained in the step 1 with the extraction solvent; and a step 3 of obtaining an aqueous third solution by evaporating the extraction solvent from a mixture of the second solution obtained in the step 2 and water. The extraction of DHIs in the step 2 is performed in a tank A. After the second solution is discharged from the tank A, the second solution is supplied to a tank B, and then the step 3 is performed in the tank B.Type: GrantFiled: October 31, 2018Date of Patent: March 16, 2021Assignee: KAO CORPORATIONInventors: Norihiro Ito, Masayoshi Nakamoto
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Patent number: 10947195Abstract: A method for producing dihydroxyindoles includes: a step 1 of obtaining an aqueous first solution including dihydroxyindoles obtained by causing at least a material selected from the group consisting of 3-(3,4-dihydroxyphenyl)alanine and a derivative of 3-(3,4-dihydroxyphenyl)alanine to react with an oxidizing agent; and a step 2 of obtaining an oleaginous second solution in which the dihydroxyindoles are extracted in an extraction solvent by mixing the first solution obtained in the step 1 with the extraction solvent. Before the first solution obtained in the step 1 is mixed with the extraction solvent in the step 2, a water-insoluble by-product is removed from the first solution.Type: GrantFiled: October 31, 2018Date of Patent: March 16, 2021Assignee: KAO CORPORATIONInventors: Masayoshi Nakamoto, Norihiro Ito
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Publication number: 20200339510Abstract: A method for producing dihydroxyindoles includes: a step 1 of obtaining an aqueous first solution including DHIs obtained by causing DOPAs to react with hexacyanoferrate(III); a step 2 of obtaining an oleaginous second solution in which DHIs are extracted in an extraction solvent by mixing the first solution obtained in the step 1 with the extraction solvent; and a step 3 of obtaining an aqueous third solution by evaporating the extraction solvent from a mixture of the second solution obtained in the step 2 and water. The extraction of DHIs in the step 2 is performed in a tank A. After the second solution is discharged from the tank A, the second solution is supplied to a tank B, and then the step 3 is performed in the tank B.Type: ApplicationFiled: October 31, 2018Publication date: October 29, 2020Applicant: KAO CORPORATIONInventors: Norihiro ITO, Masayoshi NAKAMOTO
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Publication number: 20200270208Abstract: A method for producing dihydroxyindoles includes: a step 1 of obtaining an aqueous first solution including dihydroxyindoles obtained by causing at least a material selected from the group consisting of 3-(3,4-dihydroxyphenyl)alanine and a derivative of 3-(3,4-dihydroxyphenyl)alanine to react with an oxidizing agent; and a step 2 of obtaining an oleaginous second solution in which the dihydroxyindoles are extracted in an extraction solvent by mixing the first solution obtained in the step 1 with the extraction solvent. Before the first solution obtained in the step 1 is mixed with the extraction solvent in the step 2, a water-insoluble by-product is removed from the first solution.Type: ApplicationFiled: October 31, 2018Publication date: August 27, 2020Applicant: Kao CorporationInventors: Masayoshi NAKAMOTO, Norihiro ITO
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Patent number: 10712602Abstract: Optical device includes first substrate being light transmissive, second substrate opposing first substrate and being light transmissive, and light distribution layer disposed between first substrate and second substrate and distributing incident light. Light distribution layer includes uneven structure portion having a plurality of projections repeated in the z axial direction parallel to the main face of first substrate, and optical medium portion containing a birefringent material and disposed to fill a plurality of recesses that are spaces between the plurality of projections. Light blocking component configured to block at least part of incident light is disposed in the plurality of recesses.Type: GrantFiled: June 13, 2017Date of Patent: July 14, 2020Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.Inventors: Kazuki Kitamura, Hiroshi Fukushima, Norihiro Ito, Hirofumi Kubota, Masuyuki Ota
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Patent number: 10580669Abstract: After a discharge of a processing liquid is stopped, a position of a liquid surface within a nozzle can be observed. A substrate processing apparatus includes a substrate holding mechanism and the nozzle. The substrate holding mechanism is configured to hold a substrate. The nozzle is configured to supply the processing liquid to the substrate. The nozzle includes a pipe member and an observation window. The pipe member has a horizontal part and a downward part extended downwards from the horizontal part, and is configured to discharge the processing liquid from a tip end of the downward part. The observation window is provided at the horizontal part of the pipe member.Type: GrantFiled: July 24, 2017Date of Patent: March 3, 2020Assignee: TOKYO ELECTRON LIMITEDInventors: Tsuyoshi Fukushima, Kazuhiro Aiura, Norihiro Ito
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Patent number: 10486208Abstract: According to the present disclosure, both first and second cup bodies are brought into a state of being close to each other by lifting one of the first and second cup bodies. A first gap between a gap forming portion formed on the lower surface of a first protruding portion and the upper surface of a second protruding portion is narrower than a second gap between a portion of the first protruding portion where the gap forming portion is absent, and the upper surface of the second protruding portion. In this state, a cleaning liquid is supplied to the second gap. Since movement of the cleaning liquid that tends to flow radially outward is restricted by the first narrow gap, the entire area between the first and second protruding portions may be filled with the cleaning liquid so that the surface to be cleaned may be evenly cleaned.Type: GrantFiled: June 16, 2017Date of Patent: November 26, 2019Assignee: Tokyo Electron LimitedInventors: Nobuhiro Ogata, Norihiro Ito, Jiro Higashijima, Yusuke Hashimoto, Kazuhiro Aiura
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Patent number: 10460962Abstract: A substrate processing apparatus can suppress a rear surface of a substrate from being contaminated when moving the substrate and a liquid supply unit upwards. When a lift pin 22 and a liquid supply pipe 40 are moved from a neighboring position where they are adjacent to a holding plate 30 to a distanced position, an elevating device 60 raises only the lift pin 22 for a time during which the first lifting member 61 is moved up to a preset position while being connected to the lift pin 22. The elevating device 60 raises the lift pin 22 and the liquid supply pipe 40 for a time during which the first lifting member 61 is raised from the preset position to the distanced position.Type: GrantFiled: November 7, 2017Date of Patent: October 29, 2019Assignee: TOKYO ELECTRON LIMITEDInventors: Terufumi Wakiyama, Norihiro Ito
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Publication number: 20190196255Abstract: Optical device includes first substrate being light transmissive, second substrate opposing first substrate and being light transmissive, and light distribution layer disposed between first substrate and second substrate and distributing incident light. Light distribution layer includes uneven structure portion having a plurality of projections repeated in the z axial direction parallel to the main face of first substrate, and optical medium portion containing a birefringent material and disposed to fill a plurality of recesses that are spaces between the plurality of projections. Light blocking component configured to block at least part of incident light is disposed in the plurality of recesses.Type: ApplicationFiled: June 13, 2017Publication date: June 27, 2019Applicant: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.Inventors: Kazuki KITAMURA, Hiroshi FUKUSHIMA, Norihiro ITO, Hirofumi KUBOTA, Masuyuki OTA
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Patent number: 10297473Abstract: A liquid processing apparatus performs a liquid processing on a rotating substrate by supplying a processing liquid. Surrounding members surround a region including an upper space of a cup body surrounding the rotating substrate and provided with an opening above the substrate. An air flow forming portion forms a descending air flow from an upper side of the cup body. A bottom surface portion blocks between the cup body and the surrounding member along a circumferential direction. An exhaust port is provided above the bottom surface portion and outside the cup body to exhaust an atmosphere in a region surrounded by the surrounding members and the bottom surface portion.Type: GrantFiled: August 21, 2017Date of Patent: May 21, 2019Assignee: Tokyo Electron LimitedInventors: Terufumi Wakiyama, Norihiro Ito, Jiro Higashijima
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Patent number: 10276425Abstract: A substrate processing system includes: a holding plate provided to be rotatable around a vertical axis; a substrate holding member provided on the holding plate to hold a substrate; a rotary drive unit that rotates the substrate in a predetermined direction; and a processing fluid supply unit that supplies a processing liquid to the substrate. The substrate holding member includes a first side portion provided at a position facing the substrate and a second side portion and a third side portion that are adjacent to the first side portion. The first side portion includes a gripping portion configured to grip an end surface of the substrate. The second side portion forms a pointed end portion with the first side portion, and includes a liquid flow guide portion that guides the processing liquid to a lower side of the substrate after the processing liquid is supplied to the substrate.Type: GrantFiled: November 17, 2015Date of Patent: April 30, 2019Assignee: Tokyo Electron LimitedInventors: Terufumi Wakiyama, Norihiro Ito, Jiro Higashijima, Satoshi Biwa
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Publication number: 20180373082Abstract: An optical device includes a first substrate which is light-transmissive, a second substrate which is light-transmissive and opposes the first substrate, a light distribution layer which is interposed between the first substrate and the second substrate and distributes incident light, and an optical element which is disposed on one of a surface of the second substrate on a side opposite to a side facing the first substrate and a surface of the first substrate on a side opposite to a side facing the second substrate. The light distribution layer includes an optical medium containing a birefringent material and an uneven structure. The optical element has an optical property of reducing an amount of at least one of first polarized light and second polarized light that differ in a polarization direction.Type: ApplicationFiled: December 1, 2016Publication date: December 27, 2018Applicant: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.Inventors: Kazuki KITAMURA, Norihiro ITO, Hirofumi KUBOTA, Masuyuki OTA
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Publication number: 20180328557Abstract: An optical device includes a first substrate having light transmission properties, a second substrate opposing the first substrate and having light transmission properties, and an optical control layer disposed between the first substrate and the second substrate and including a first light-transmitting portion that includes an optical medium and an uneven structure and a second light-transmitting portion that includes only the optical medium out of the optical medium and the uneven structure. The optical medium and the uneven structure have different refractive indices. In a plan view, the first light-transmitting portion and the second light-transmitting portion are repeatedly arranged in one direction, and the area of repetition of at least one of the first light-transmitting portion and the second light-transmitting portion varies in the one direction.Type: ApplicationFiled: November 4, 2016Publication date: November 15, 2018Applicant: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LT D.Inventors: Kazuki KITAMURA, Norihiro ITO, Hirofumi KUBOTA, Masuyuki OTA
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Publication number: 20180221925Abstract: A substrate processing apparatus includes a stationary cup body 51 provided to surround a substrate holding unit 31 and configured to receive a processing liquid or mist of the processing liquid discharged onto a substrate, the stationary cup body not being moved relatively with respect to a processing vessel; a mist guard 80; and a guard elevating mechanism 84 configured to elevate the mist guard. Here, the mist guard is provided at an outside of the stationary cup body to surround the stationary cup body and configured to block a liquid scattered outwards beyond a space above the stationary cup body. Further, the mist guard includes a cylindrical portion 81 of a cylindrical shape and a protruding portion 82 protruded from an upper portion of the cylindrical portion toward an inside of the cylindrical portion.Type: ApplicationFiled: July 28, 2016Publication date: August 9, 2018Inventors: Norihiro Ito, Jiro Higashijima, Nobuhiro Ogata, Takahisa Otsuka, Yuichi Douki, Yusuke Hashimoto, Kazuhiro Aiura, Daisuke Goto
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Publication number: 20180226277Abstract: A liquid processing apparatus according to an embodiment includes a holding unit, a driving unit, a shaft, and a nozzle. The driving unit rotates the substrate and the holding unit that horizontally holds the substrate. The shaft is extended along an axial direction of a rotation axis. The nozzle includes a base that is attached to an upper end of the shaft, and a liquid supply unit that is extended from the base to a radial-direction outer side of the substrate and includes discharge ports formed to discharge the liquid toward a lower surface of the substrate. The shaft and the base are configured to include a discharge passage that is formed along the axial direction to discharge the liquid discharged toward the lower surface of the substrate. The base includes a concave portion that is concave downward to cause the liquid to flow toward the discharge passage.Type: ApplicationFiled: January 29, 2018Publication date: August 9, 2018Inventors: Terufumi Wakiyama, Norihiro Ito
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Publication number: 20180185856Abstract: A liquid processing apparatus includes a holding device, a rotation device, and a processing fluid supply device including a nozzle positioned to face a surface of a substrate, a first supply path connected to the nozzle, and a second supply path connected to the nozzle such that the supply device supplies processing liquid to the substrate. The nozzle has a common flow path extending in radial direction from center portion toward peripheral portion of the substrate, and discharge ports connected to the common path and positioned in the radial direction, the first path is connected to the common path and supplies first liquid to the common path, the second path is connected to the common path and supplies second liquid to the common path that is different from the first liquid in temperature and/or concentration, and the first and second paths are communicatively connected each other via the common path.Type: ApplicationFiled: December 29, 2017Publication date: July 5, 2018Applicant: TOKYO ELECTRON LIMITEDInventors: Hirofumi TAKEGUCHI, Terufumi WAKIYAMA, Norihiro ITO
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Publication number: 20180130677Abstract: A substrate processing apparatus can suppress a rear surface of a substrate from being contaminated when moving the substrate and a liquid supply unit upwards. When a lift pin 22 and a liquid supply pipe 40 are moved from a neighboring position where they are adjacent to a holding plate 30 to a distanced position, an elevating device 60 raises only the lift pin 22 for a time during which the first lifting member 61 is moved up to a preset position while being connected to the lift pin 22. The elevating device 60 raises the lift pin 22 and the liquid supply pipe 40 for a time during which the first lifting member 61 is raised from the preset position to the distanced position.Type: ApplicationFiled: November 7, 2017Publication date: May 10, 2018Inventors: Terufumi Wakiyama, Norihiro Ito