Patents by Inventor Norikazu Chuchi

Norikazu Chuchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Semiconductor device having enhanced impurity concentration profile
    Patent number: 5163178
    Abstract: A semiconductor device comprises a semiconductor substrate provided with a collector region a base region and an emitter region in a lateral arrangement. Respective portions having peak impurity concentrations of the collector region and the emitter region are formed within the semiconductor substrate. A method of fabricating a semiconductor device comprises a step of forming a collector region of a second conduction type and an emitter region of a second conduction type in a lateral arrangement in a semiconductor substrate serving as a base region of a first conduction type by using a first mask provided with a pair of openings, and a step of forming heavily doped regions of the second conduction type so as to be connected respectively to the collector region and the emitter region by using a second mask provided with a pair of openings separated from each other by a distance greater than the distance between the openings of the first mask.
    Type: Grant
    Filed: December 27, 1990
    Date of Patent: November 10, 1992
    Assignee: Sony Corporation
    Inventors: Takayuki Gomi, Minoru Nakamura, Hiroaki Anmo, Norikazu Chuchi, Hiroyuki Miwa, Akio Kayanuma, Koji Kobayashi