Patents by Inventor Norikazu Nishiyama

Norikazu Nishiyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6949293
    Abstract: A mesoporous silica has uniform mesopores and a periodic structure, which contains a Zr element in the form of a Si—O—Zr bond and wherein the Zr content in the Si—O—Zr bond, represented by [Zr/(Si+Zr)] is 0.05 to 20 mole %. The mesoporous silica is superior in alkali resistance and is suitably used particularly as a separation membrane (e.g. a ceramic membrane) and a catalytic support for solid-liquid system, in which an alkaline liquid may be used.
    Type: Grant
    Filed: February 5, 2002
    Date of Patent: September 27, 2005
    Assignees: NGK Insulators, Ltd.
    Inventors: Norikazu Nishiyama, Yasuyuki Egashira, Korekazu Ueyama
  • Publication number: 20050106802
    Abstract: It is an object to provide, with a high productivity, a dielectric thin film having a high degree of pore and a very great mechanical strength, and there are included a surfactant film forming step of forming a film including a surfactant on a surface of a substrate on which a thin film is to be formed, a vapor deposition step of causing the substrate to come in contact with a gas phase containing a silica derivative to form a thin film including the silica derivative, and a step of calcining the substrate having the thin film formed thereon and decomposing and removing the surfactant, the thin film being thus formed.
    Type: Application
    Filed: March 3, 2003
    Publication date: May 19, 2005
    Inventors: Norikazu Nishiyama, Yoshiaki Oku, Shunsuke Tanaka, Korekazu Ueyama
  • Publication number: 20050003678
    Abstract: The invention aims at providing a dielectric film having a low dielectric constant and enhanced mechanical strength. A surfactant and an silica derivative are dissolved into a solvent at a desired mole ratio. The precursor solution is applied over the substrate, and the substrate is exposed to a silica derivative atmosphere before being sintered, thereby supplying a silica derivative. Thus, contraction of the film stemming from hydrolysis is inhibited, and a sturdy mesoporous silica thin film which takes the self-assembly of the surfactant as a mold is obtained while cavities are maintained intact without being fractured. Thus, there is formed an inorganic dielectric film which is formed on the surface of the substrate and has a cyclic porous structure including layered or columnar pores oriented so as to become parallel with the surface of the substrate.
    Type: Application
    Filed: September 17, 2002
    Publication date: January 6, 2005
    Inventors: Norikazu Nishiyama, Korekazu Ueyama, Yoshiaki Oku
  • Publication number: 20040235288
    Abstract: The invention is characterized by attaining a lower dielectric constant and including an inorganic dielectric film which is formed on the surface of a substrate and has a cyclic porous structure having a pore ratio of 50% or higher.
    Type: Application
    Filed: December 29, 2003
    Publication date: November 25, 2004
    Inventors: Yoshiaki Oku, Norikazu Nishiyama, Korekazu Ueyama
  • Publication number: 20020155053
    Abstract: A mesoporous silica has uniform mesopores and a periodic structure, which contains a Zr element in the form of a Si—O—Zr bond and wherein the Zr content in the Si—O—Zr bond, represented by [Zr/(Si+Zr)] is 0.05 to 20 mole %. The mesoporous silica is superior in alkali resistance and is suitably used particularly as a separation membrane (e.g. a ceramic membrane) and a catalytic support for solid-liquid system, in which an alkaline liquid may be used.
    Type: Application
    Filed: February 5, 2002
    Publication date: October 24, 2002
    Applicant: NGK Insulators, Ltd.
    Inventors: Norikazu Nishiyama, Yasuyuki Egashira, Korekazu Ueyama