Patents by Inventor Noriko Iwase

Noriko Iwase has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9697954
    Abstract: The invention provides a process and an apparatus for producing a high quality electronic component by reducing sagging at pattern side walls, which may occur when patterns of a wiring, an electrode, etc. are printed by a screen printing process using an electroconductive paste, an insulation paste, or a semiconductor paste, and reducing a mesh mark on the patterns of a wiring, an electrode, etc., or a full solid surface film, as well as a pattern formation process, by which screen printing can be applied and double face printing can be conducted with the number of process steps less than a conventional process. A pattern is formed by that a pattern is printed on a blanket having a surface comprising polydimethylsiloxane using an electroconductive paste, an insulation paste, or a semiconductor paste by a screen printing process, and the pattern is transferred from the blanket to a printing object.
    Type: Grant
    Filed: September 11, 2013
    Date of Patent: July 4, 2017
    Assignee: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
    Inventors: Kenichi Nomura, Hirobumi Ushijima, Noriko Iwase, Manabu Yoshida
  • Publication number: 20150243441
    Abstract: The invention provides a process and an apparatus for producing a high quality electronic component by reducing sagging at pattern side walls, which may occur when patterns of a wiring, an electrode, etc. are printed by a screen printing process using an electroconductive paste, an insulation paste, or a semiconductor paste, and reducing a mesh mark on the patterns of a wiring, an electrode, etc., or a full solid surface film, as well as a pattern formation process, by which screen printing can be applied and double face printing can be conducted with the number of process steps less than a conventional process. A pattern is formed by that a pattern is printed on a blanket having a surface comprising polydimethylsiloxane using an electroconductive paste, an insulation paste, or a semiconductor paste by a screen printing process, and the pattern is transferred from the blanket to a printing object.
    Type: Application
    Filed: September 11, 2013
    Publication date: August 27, 2015
    Applicant: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
    Inventors: Kenichi Nomura, Hirobumi Ushijima, Noriko Iwase, Manabu Yoshida