Patents by Inventor Noritaka Tanimura

Noritaka Tanimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7772310
    Abstract: The present invention provides a polyacetal resin composition comprising (I) a polyacetal resin; and per 100 parts by weight thereof, (II) more than 5 parts by weight but less than 100 parts by weight of calcium carbonate, wherein the calcium carbonate has an average particle diameter of 0.1 to less than 1.5 ?m and an average aspect ratio (L/D) which is a ratio of average major axis (L) of particles to average minor axis (D) of particles (D) of 3 or less; (III) 0.005 to 10 parts by weight of an organic acid; and (IV) 0 to less than 0.05 part by weight of a fatty acid ester, wherein the amount of Na relative to Ca is 250 ppm or less while the amount of Sr relative to Ca is 500 to 2500 ppm.
    Type: Grant
    Filed: August 28, 2009
    Date of Patent: August 10, 2010
    Assignee: Asahi Kasei Chemicals Corporation
    Inventors: Kenya Sonobe, Noritaka Tanimura
  • Publication number: 20090318600
    Abstract: The present invention provides a polyacetal resin composition comprising (I) a polyacetal resin; and per 100 parts by weight thereof, (II) more than 5 parts by weight but less than 100 parts by weight of calcium carbonate, wherein the calcium carbonate has an average particle diameter of 0.1 to less than 1.5 ?m and an average aspect ratio (L/D) which is a ratio of average major axis (L) of particles to average minor axis (D) of particles (D) of 3 or less; (III) 0.005 to 10 parts by weight of an organic acid; and (IV) 0 to less than 0.05 part by weight of a fatty acid ester, wherein the amount of Na relative to Ca is 250 ppm or less while the amount of Sr relative to Ca is 500 to 2500 ppm.
    Type: Application
    Filed: August 28, 2009
    Publication date: December 24, 2009
    Applicant: ASAHI KASEI CHEMICALS CORPORATION
    Inventors: Kenya Sonobe, Noritaka Tanimura
  • Patent number: 7625969
    Abstract: The present invention provides a polyacetal resin composition comprising (I) a polyacetal resin; and per 100 parts by weight thereof, (II) more than 5 parts by weight but less than 100 parts by weight of calcium carbonate, wherein the calcium carbonate has an average particle diameter of 0.1 to less than 1.5 ?m and an average aspect ratio (L/D) which is a ratio of average major axis (L) of particles to average minor axis (D) of particles (D) of 3 or less; (III) 0.00.5 to 10 parts by weight of an organic acid; and (IV) 0 to less than 0.05 part by weight of a fatty acid ester, wherein the amount of Na relative to Ca is 250 ppm or less while the amount of Sr relative to Ca is 500 to 2500 ppm.
    Type: Grant
    Filed: January 19, 2005
    Date of Patent: December 1, 2009
    Assignee: Asahi Kasei Chemicals Corporation
    Inventors: Kenya Sonobe, Noritaka Tanimura
  • Publication number: 20070179231
    Abstract: The present invention provides a polyacetal resin composition comprising (I) a polyacetal resin; and per 100 parts by weight thereof, (II) more than 5 parts by weight but less than 100 parts by weight of calcium carbonate, wherein the calcium carbonate has an average particle diameter of 0.1 to less than 1.5 ?m and an average aspect ratio (L/D) which is a ratio of average major axis (L) of particles to average minor axis (D) of particles (D) of 3 or less; (III) 0.00.5 to 10 parts by weight of an organic acid; and (IV) 0 to less than 0.05 part by weight of a fatty acid ester, wherein the amount of Na relative to Ca is 250 ppm or less while the amount of Sr relative to Ca is 500 to 2500 ppm.
    Type: Application
    Filed: January 19, 2005
    Publication date: August 2, 2007
    Applicant: ASAHI KASEI CHEMICALS CORPORATION
    Inventors: Kenya Sonobe, Noritaka Tanimura
  • Patent number: 6506850
    Abstract: A polyoxymethylene copolymer having a melting point of 167° to 173° C. and containing a low molecular weight polyoxymethylene copolymer in an amount of not higher than 5000 ppm, and a composition thereof. The copolymer is obtainable by subjecting unstable terminal groups to heat treatment in the presence of 0.05 to 50 ppm by weight of a quaternary ammonium compound. Further, the above composition is used for working parts such as a gear and a cam; apparatuses for image, music and telecommunication; interior and exterior parts for an automobile; and the like.
    Type: Grant
    Filed: February 21, 2001
    Date of Patent: January 14, 2003
    Assignee: Asahi Kasei Kabushiki Kaisha
    Inventors: Noritaka Tanimura, Atushi Nanasawa
  • Patent number: 6384179
    Abstract: A polyacetal resin composition comprising 30-90% by weight of polyacetal copolymer (A) having a melt index of less than 1.0 g/10 min. and 70-10% by weight of polyacetal copolymer (B) having a melt index of 1.0-100 g/10 min., both melting points of (A) and (B) being 155°-162° C., or a difference in melting point between (A) and (B) being not less than 6° C., has distinguished toughness and creep resistance.
    Type: Grant
    Filed: December 15, 2000
    Date of Patent: May 7, 2002
    Assignee: Asahi Kasei Kabushiki Kaisha
    Inventors: Noritaka Tanimura, Tadao Matsushika
  • Patent number: 6365655
    Abstract: Disclosed is a method for stabilizing a crude oxy-methylene copolymer having thermally unstable terminal groups, which comprises subjecting a crude oxymethylene copolymer to heat treatment in the presence of at least one quaternary ammonium compound represented by the following formula (1): [R1R2R3R4N+]nX−n  (1) wherein each of R1, R2, R3 and R4 independently represents an unsubstituted or substituted alkyl group, an aryl group, an aralkyl group which is an unsubstituted or substituted alkyl group substituted with at least one aryl group, or an alkylaryl group which is an aryl group substituted with at least one unsubstituted or substituted alkyl group; n is an integer of from 1 to 3; and X is a hydroxyl group or an acid residue. In this method, even by the addition of a very small amount of the quaternary ammonium compound, the decomposition rate of the unstable terminal groups can be remarkably increased, thereby facilitating the stabilization of the crude copolymer.
    Type: Grant
    Filed: August 16, 1999
    Date of Patent: April 2, 2002
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Noritaka Tanimura, Hajime Nagahara, Tadashi Tanaka, Satoru Ohtsuki
  • Publication number: 20010007006
    Abstract: A polyacetal resin composition comprising 30-90% by weight of polyacetal copolymer (A) having a melt index of less than 1.0 g/10 min. and 70-10% by weight of polyacetal copolymer (B) having a melt index of 1.0-100 g/10 min., both melting points of (A) and (B) being 155°-162° C., or a difference in melting point between (A) and (B) being not less than 6° C., has distinguished toughness and creep resistance.
    Type: Application
    Filed: December 15, 2000
    Publication date: July 5, 2001
    Inventors: Noritaka Tanimura, Tadao Matsushika
  • Patent number: 5837781
    Abstract: A polyoxymethylene copolymer prepared by copolymerizing a mixture comprising trioxane and 1,3-dioxolane in the presence of at least one polymerization catalyst selected from the group consisting of boron trifluoride, a boron trifluoride hydrate and a coordination complex compound of an organic compound containing an oxygen atom or a sulfur atom with boron trifluoride, wherein the 1,3-dioxolane has a 2-methyl-1,3-dioxolane content of not more than 500 ppm by weight and a 1,3-dioxolane peroxide content of not more than 15 ppm by weight in terms of hydrogen peroxide, and contains at least one hindered phenol in an amount of from 10 to 500 ppm by weight, each based on the weight of the 1,3-dioxolane.
    Type: Grant
    Filed: February 24, 1997
    Date of Patent: November 17, 1998
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Noritaka Tanimura, Yukio Tanigawa
  • Patent number: 5688897
    Abstract: The present invention provides a method for producing an oxymethylene copolymer, which comprises:copolymerizing trioxane and a cyclic ether and/or a cyclic formal in the presence of at least one selected from the group consisting of boron trifluoride, boron trifluoride hydrate, and a coordination compound of an organic compound having an oxygen or a sulphur atom with boron trifluoride,volatilizing the residual polymerization catalyst to decrease its amount, by heating the obtained oxymethylene copolymer in an atmosphere of inert gas at or below its melting point, and/or reducing the pressure, without conducting any operation of deactivating the residual polymerization catalyst before volatilizing the residual polymerization catalyst, andstabilizing terminal moities of the oxymethylene copolymer after deactivating residual catalyst or stabilizing terminal moieties of the oxymethylene copolymer directly.
    Type: Grant
    Filed: July 10, 1996
    Date of Patent: November 18, 1997
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Noritaka Tanimura, Yukio Tanigawa, Sumio Komatsu