Patents by Inventor Noritaka Yokomichi

Noritaka Yokomichi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Polishing composition and polishing method using the same
    Publication number: 20060048455
    Abstract: A polishing composition includes an abrasive, at least one acid selected from the group consisting of orthophosphoric acid, diphosphoric acid, polyphosphoric acid, metaphosphoric acid, hexametaphosphoric acid, methyl acid phosphate, ethyl acid phosphate, ethyl glycol acid phosphate, isopropyl acid phosphate, phytic acid, and 1-hydroxyethylidene-1,1-diphosphonic acid; at least one salt selected from the group consisting of sodium salts, potassium salts, and lithium salts of an acid selected from orthophosphoric acid, diphosphoric acid, polyphosphoric acid, metaphosphoric acid, hexametaphosphoric acid, methyl acid phosphate, ethyl acid phosphate, ethyl glycol acid phosphate, isopropyl acid phosphate, phytic acid, and 1-hydroxyethylidene-1,1-diphosphonic acid; an oxidizing agent; and water.
    Type: Application
    Filed: September 8, 2005
    Publication date: March 9, 2006
    Inventors: Junichi Hirano, Yasushi Matsunami, Noritaka Yokomichi
  • Polishing composition
    Patent number: 6423125
    Abstract: A polishing composition for magnetic disk substrates to be used for memory hard disks, which comprises: (a) water; (b) at least one phosphate. compound selected from the group consisting of a phosphate ester of ethoxylated alkylalcohol and a phosphate ester of ethoxylated arylalcohol; (c) at least one polishing accelerator selected from the group consisting of an inorganic acid and an organic acid, and their salts, other than the phosphate compound of component (b); (d) at least one abrasive selected from the group consisting of aluminum oxide, silicon dioxide, cerium oxide, zirconium oxide, titanium oxide, silicon nitride and manganese dioxide.
    Type: Grant
    Filed: August 28, 2000
    Date of Patent: July 23, 2002
    Assignee: Fujimi Incorporated
    Inventors: Tomoaki Ishibashi, Noritaka Yokomichi, Hiroyasu Sugiyama
  • Polishing composition
    Patent number: 6190443
    Abstract: A polishing composition for polishing a memory hard disk, which comprises water and at least one abrasive selected from the group consisting of silicon dioxide, aluminum oxide, cerium oxide, zirconium oxide, titanium oxide, silicon nitride and manganese dioxide and which further contains an iron chelate complex dissolved in the composition, the iron chelate complex having a nitrogen-containing compound as a ligand, and the pH of the entire composition being from 6 to 10.
    Type: Grant
    Filed: August 31, 1999
    Date of Patent: February 20, 2001
    Assignee: Fujimi Incorporated
    Inventors: Keigo Ohashi, Hitoshi Kodama, Noritaka Yokomichi
  • Polishing composition and rinsing composition
    Patent number: 6117220
    Abstract: A polishing composition for a memory hard disc, which comprises the following components (a) to (d):(a) water,(b) at least one compound selected from the group consisting of a polystyrenesulfonic acid, and its salts,(c) a compound selected from the group consisting of an inorganic acid and an organic acid, and their salts, other than component (b), and(d) at least one abrasive selected from the group consisting of aluminum oxide, silicon dioxide, cerium oxide, zirconium oxide, titanium oxide, silicon nitride and manganese dioxide.
    Type: Grant
    Filed: November 16, 1999
    Date of Patent: September 12, 2000
    Assignees: Fujimi Incorporated, Toho Chemical Industry Co., Ltd.
    Inventors: Hitoshi Kodama, Toshiki Owaki, Katsumi Tani, Noritaka Yokomichi, Takashi Tokuue, Norio Fujioka, Tetsuya Sayama
  • Polishing composition
    Patent number: 6027554
    Abstract: A polishing composition comprising silicon nitride fine powder, water and an acid.
    Type: Grant
    Filed: October 14, 1997
    Date of Patent: February 22, 2000
    Assignee: Fujimi Incorporated
    Inventors: Hitoshi Kodama, Satoshi Suzumura, Noritaka Yokomichi, Shirou Miura, Hideki Otake, Atsunori Kawamura, Masatoki Ito
  • Polishing composition
    Patent number: 5733819
    Abstract: A polishing composition comprising silicon nitride fine powder, water and an acid.
    Type: Grant
    Filed: January 27, 1997
    Date of Patent: March 31, 1998
    Assignee: Fujimi Incorporated
    Inventors: Hitoshi Kodama, Satoshi Suzumura, Noritaka Yokomichi, Shirou Miura, Hideki Otake, Atsunori Kawamura, Masatoki Ito