Abstract: An administration device including a needle; a cartridge which is capable of storing a liquid medicine to be administered into a living body by the needle; a case which has an open or openable first end to be pressed against the skin, and in which the needle and the cartridge are stored in such a manner as to be movable toward the first end side, the needle being capable of moving to the outside of the first end in response to the movement of the needle toward the first end ide; and a pressing force control member which intervenes so as to generate a reactive force between the cartridge and the case and which controls a pressing force exerted on the skin by the case while the needle moves toward the first end side.

Abstract: A stage apparatus includes a surface plate as well as a guide shaft fixedly secured to the surface plate, a drive member moving along the guide shaft, and a hydrostatic fluid bearing that forms fluid films in the gap portion between the guide shaft and the drive member. The apparatus further includes: a positional deviation detection section—for detecting a relative positional deviation which occurs between the guide shaft and the drive member and which affects the thickness dimensions of the fluid films; and a state decision section for making a decision on the condition of the apparatus itself based on the positional deviation detected by the detection section and outputting information responsive to the decision.

Abstract: There is provided an electron beam inspection system which can enhance the safety of the whole system if servo valves are deactivated in the event of a power failure or an emergency stop. The electron beam inspection system has a beam source, a stage mechanism, and a pump. The stage mechanism has a guide shaft, a slider, a first servo valve, a second servo valve, a first exhaust pipe, a second exhaust pipe, and an exhaust valve. The slider is movably supported to the guide shaft via a hydrostatic bearing and has a first pressure subchamber and a second pressure subchamber. The exhaust valve is mounted in the first exhaust pipe. When the servo valves are in operation, the exhaust valve is opened. When supply of electric power to the servo valves is ceased, the exhaust valve is closed.

Abstract: A device which, in a shallow region including the epidermal layer or the dermal layer, can administer a target even in extremely small amounts. This includes a puncture needle which, in a flat puncture unit for puncturing the shallow region, has a groove and a through-hole which constitute a recess that extends through part of or the entire thickness of the puncture unit; and a casing which houses the puncture needle so as to allow the puncture needle to advance. By part or all of a flow agent containing the drug being arranged in the groove and the through-hole, the drug is positioned with respect to the puncture unit. The device is designed such that a flow agent in the amount of 10-1000 nL is dosed in the shallow region per puncture.

Abstract: Provided with a heat storage device having a simple and small shape without occupying large space when mounted on an electric car and capable of storing and releasing heat efficiently without using water so that the heat storage device is used as a heater. A heat storage device 10 includes: a heat storage material 14 configured to be oxidized and deoxidized by a temperature control operation; a heat transfer material 15 for heating the heat storage material 14; at least a pair of electrodes 11, 12 configured to be connected to a power source for heating the heat transfer material 15; a container 16 containing the heat storage material 14, the heat transfer material 15 and the at least a pair of electrodes; an upstream valve 17 provided on an upstream inlet of the container 16 for shielding an inside of the container 16 from an outside; and a downstream valve provided on a downstream outlet of the container 16 for shielding the inside of the container 16 from the outside.

Abstract: The present invention provides low hygroscopic forms of aripiprazole and processes for the preparation thereof which will not convert to a hydrate or lose their original solubility even when a medicinal preparation containing the anhydrous aripiprazole crystals is stored for an extended period.

Abstract: An apparatus acquires a first input-table, based on target table information, and acquires a script for generating a first output-table from the first input-table, and a constraint condition between columns included in the first input-table and the first output-table. The apparatus converts the first input-table into a second input-table such that the second input-table obtained by converting a column structure of the first input-table and a second output-table to be obtained by converting a column structure of the target table comply with the constraint condition, and generates assignment information indicating a correspondence relationship between columns to be included in the second output-table and the target table. The apparatus generates the second output-table from the script and the second input-table, and converts the second output-table into the target table, based on the assignment information.

Abstract: A plasma processing apparatus includes a process container that forms a process space to accommodate a target substrate, and a first electrode and a second electrode disposed opposite each other inside the process container. The first electrode is an upper electrode and the second electrode is a lower electrode and configured to support the target substrate through a mount face. A correction ring is disposed to surround the target substrate placed on the mount face of the second electrode. The correction ring includes a combination of a first ring to be around the target substrate and a second ring arranged around or above the first ring. A power supply unit is configured to apply a first electric potential and a second electric potential respectively to the first ring and the second ring to generate a potential difference between the first and second rings. The power supply unit is configured to variably set the potential difference.

Abstract: A heat storage reactor, comprising: a plurality of heat storage layers including first flow paths through which a first fluid can flow, each of the first flow paths being filled with heat storage materials; and a plurality of heat exchange layers including second flow paths through which a second fluid can flow. In the heat storage reactor, the plurality of heat storage layers and the plurality of heat exchange layers are alternately stacked. Further, open ends for the second flow paths are formed on a surface different from a surface on which open ends of the first flow paths are formed. Furthermore, at least a part of the second flow paths is formed in parallel to the first flow paths.

Abstract: A plasma etching apparatus includes a second electrode configured to support a target substrate thereon, a second RF power supply unit configured to apply a second RF power for providing a bias for ion attraction to the second electrode, and a control system including and an RF controller. The RF controller is configured to switch the second RF power supply unit between a continuous mode that executes continuous supply of the second RF power at a constant power level and a power modulation mode that executes modulation of the second RF power between a first power and a second power larger than the first power. The RF controller is preset to control the second RF power supply unit such that the second RF power supply unit is first operated in the continuous mode for plasma ignition and then is switched into the power modulation mode.

Abstract: A plasma processing method includes executing an etching process that includes supplying an etching gas into a process container in which a target substrate is supported on a second electrode serving as a lower electrode, and applying an RF power for plasma generation and an RF power for ion attraction to turn the etching gas into plasma and to subject the target substrate to etching. The etching process includes applying a negative DC voltage to a first electrode serving as an upper electrode during the etching to increase an absolute value of self-bias on the first electrode. The etching process includes releasing DC electron current generated by the negative DC voltage to ground through plasma and a conductive member disposed as a ring around the first electrode, by using a first state where the conductive member is connected to a ground potential portion.

Abstract: There is provided a compressor motor in which a teeth member and a yoke member are bonded while inhibiting deformation of bridge portions and which is capable of decreasing drop of torque due to a leakage magnetic flux. A stator is constituted of a teeth member 26 in which inner end portions of adjacent teeth 27 are continuous in a bridge portion and on which wires are wounded, and a yoke member 28 bonded to an outer side of the teeth member to form a magnetic path, the yoke member includes press-fitting concave regions 32 which are opened inwardly and into which outer end portions of the teeth are press-fitted, and inner side surfaces 32A of the press-fitting concave regions which face each other possess projecting shapes, respectively, and both side surfaces 27B of each of the outer end portions of the teeth are formed in a recessed shape which matches the shape of the inner side surfaces of the press-fitting concave regions.

Abstract: An etching method of etching a silica-based residue containing a base component formed in an SiO2 film, includes selectively etching the silica-based residue by supplying an HF gas, an H2O gas or an alcohol gas to a target substrate having the SiO2 film, on which the silica-based residue is formed, and removing an etching residue caused by the selectively etching the silica-based residue, after the selectively etching the silica-based residue. The removing an etching residue includes a first process of supplying an H2O gas or an alcohol gas to the target substrate and a second process of heating the target substrate after the first process.

Abstract: The present invention provides low hygroscopic forms of aripiprazole and processes for the preparation thereof which will not convert to a hydrate or lose their original solubility even when a medicinal preparation containing the anhydrous aripiprazole crystals is stored for an extended period.

Abstract: A plasma processing method includes executing an etching process that includes supplying an etching gas into a process container in which a target substrate is supported on a second electrode serving as a lower electrode, and applying an RF power for plasma generation and an RF power for ion attraction to turn the etching gas into plasma and to subject the target substrate to etching. The etching process includes applying a negative DC voltage to a first electrode serving as an upper electrode during the etching to increase an absolute value of self-bias on the first electrode. The etching process includes releasing DC electron current generated by the negative DC voltage to ground through plasma and a conductive member disposed as a ring around the first electrode, by using a first state where the conductive member is connected to a ground potential portion.

Abstract: Using drive force from a voice coil motor constituted of an autofocus coil unit and an autofocus magnet unit, a lens drive device automatically carries out focusing by moving an autofocus movable unit, which includes the autofocus coil unit, with respect to an autofocus fixed unit, which includes the autofocus magnet unit, in the direction of an optical axis. The autofocus movable unit has a lens holder that holds the autofocus coil unit. The lens holder has a cut-out part recessed on the inside in the radial direction from the outer periphery of the holder, and a binding part that protrudes to the outside in the radial direction from the cut-out part and binds an end part of the autofocus coil unit. The tip of the binding part is positioned to the inside of the outer periphery of the holder in the radial direction.

Abstract: A plasma etching apparatus includes an upper electrode and a lower electrode, between which plasma of a process gas is generated to perform plasma etching on a wafer W. The apparatus further comprises a cooling ring disposed around the wafer, a correction ring disposed around the cooling ring, and a variable DC power supply directly connected to the correction ring, the DC voltage being preset to provide the correction ring with a negative bias, relative to ground potential, for attracting ions in the plasma and to increase temperature of the correction ring to compensate for a decrease in temperature of a space near the edge of the target substrate due to the cooling ring.

Abstract: An apparatus includes an upper electrode and a lower electrode for supporting a wafer disposed opposite each other within a process chamber. A first RF power supply configured to apply a first RF power having a relatively higher frequency, and a second RF power supply configured to apply a second RF power having a relatively lower frequency is connected to the lower electrode. A variable DC power supply is connected to the upper electrode. A process gas is supplied into the process chamber to generate plasma of the process gas so as to perform plasma etching.

Abstract: Provided is a lens drive device that, using drive force from a voice coil motor, automatically carries out focusing by moving an autofocus movable unit with respect to an autofocus fixed unit in the direction of an optical axis. The lens drive unit is provided with a position detection unit that is disposed with an intervening space on the image formation side of the autofocus movable unit in the direction of the optical axis and that is for emitting light toward the autofocus movable unit, receiving reflected light that has been reflected by the autofocus movable unit, and detecting the position of the autofocus movable unit in the direction of the optical axis on the basis of the received light intensity. Part of the member displaced along with the autofocus movable unit functions as a reflective plate for reflecting light emitted from the position detection unit.

Abstract: An apparatus acquires a first input-table, based on target table information, and acquires a script for generating a first output-table from the first input-table, and a constraint condition between columns included in the first input-table and the first output-table. The apparatus converts the first input-table into a second input-table such that the second input-table obtained by converting a column structure of the first input-table and a second output-table to be obtained by converting a column structure of the target table comply with the constraint condition, and generates assignment information indicating a correspondence relationship between columns to be included in the second output-table and the target table. The apparatus generates the second output-table from the script and the second input-table, and converts the second output-table into the target table, based on the assignment information.