Patents by Inventor Noriyuki Takakuma
Noriyuki Takakuma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 10662339Abstract: A coating-forming composition for an electrical steel sheet that maintains excellent insulating properties, corrosion resistance, adhesion, and the like required in a coating for an electrical steel sheet, and exhibits excellent viscosity stability, with an increase in viscosity over time being kept gradual. A coating-forming composition for an electrical steel sheet comprises colloidal silica, a phosphate, phenylphosphonic acid or a salt thereof, and an aqueous medium.Type: GrantFiled: February 24, 2017Date of Patent: May 26, 2020Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Yoshiyuki Kashima, Noriyuki Takakuma, Daisuke Shimizu
-
Patent number: 10550300Abstract: A method for producing an active silicic acid solution in which the existing amount of foreign matters as plate-like fine particles is reduced and a method for producing a silica sol in which such foreign matters are reduced. The method fulfills the following condition; the existing amount of plate-like fine particles having a length of one side of 0.2 to 4.0 ?m and a thickness of 1 to 100 nm is measured to be 0% to 30% in accordance with measuring method A, the method including the steps of: preparing an active silicic acid solution by subjecting an alkali silicate aqueous solution having a silica concentration of 0.5% by mass to 10.0% by mass to cation-exchange to remove alkaline components; and filtering the active silicic acid solution through a filter whose removal rate of particles having a primary particle size of 1.0 ?m is 50% or more.Type: GrantFiled: July 8, 2016Date of Patent: February 4, 2020Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Kiyomi Ema, Noriyuki Takakuma, Tohru Nishimura, Naoki Kawashita, Kouji Yamaguchi
-
Patent number: 10400147Abstract: A method for producing an active silicic acid solution in which the existing amount of foreign matters as plate-like fine particles is reduced and a method for producing a silica sol in which such foreign matters are reduced. The method fulfills the following condition: the existing amount of plate-like fine particles having a length of one side of 0.2 to 4.0 ?m and a thickness of 1 to 100 nm is measured to be 0% to 30% in accordance with measuring method A, the method including the steps of: preparing an active silicic acid solution by subjecting an alkali silicate aqueous solution having a silica concentration of 0.5% by mass to 10.0% by mass to cation-exchange to remove alkaline components; and filtering the active silicic acid solution through a filter whose removal rate of particles having a primary particle size of 1.0 ?m is 50% or more.Type: GrantFiled: September 14, 2012Date of Patent: September 3, 2019Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Kiyomi Ema, Noriyuki Takakuma, Tohru Nishimura, Naoki Kawashita, Kouji Yamaguchi
-
Publication number: 20190153240Abstract: A coating-forming composition for an electrical steel sheet that maintains excellent insulating properties, corrosion resistance, adhesion, and the like required in a coating for an electrical steel sheet, and exhibits excellent viscosity stability, with an increase in viscosity over time being kept gradual. A coating-forming composition for an electrical steel sheet comprises colloidal silica, a phosphate, phenylphosphonic acid or a salt thereof, and an aqueous medium.Type: ApplicationFiled: February 24, 2017Publication date: May 23, 2019Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Yoshiyuki KASHIMA, Noriyuki TAKAKUMA, Daisuke SHIMIZU
-
Patent number: 9938155Abstract: To provide a method for producing an alkali silicate aqueous solution containing a reduced amount of foreign substance of plate-like fine particles and a method for producing a silica sol containing a reduced amount of foreign substance of plate-like fine particles. A method for producing an alkali silicate aqueous solution fulfilling the following condition: the existing amount of plate-like fine particles having a length of one side of 0.2 to 4.0 ?m and a thickness of 1 to 100 nm is determined to be 0 to 30%. The method for producing an alkali silicate aqueous solution includes the steps of adjusting a silica concentration of an alkali silicate aqueous solution to 0.5 to 10.0% by mass and filtering the alkali silicate aqueous solution through a filter having a removal rate of particles with a primary particle size of 1.0 ?m of 50% or more.Type: GrantFiled: April 20, 2015Date of Patent: April 10, 2018Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Kiyomi Ema, Noriyuki Takakuma, Tohru Nishimura, Naoki Kawashita, Kouji Yamaguchi
-
Publication number: 20160319173Abstract: A method for producing an active silicic acid solution in which the existing amount of foreign matters as plate-like fine particles is reduced and a method for producing a silica sol in which such foreign matters are reduced. The method fulfills the following condition; the existing amount of plate-like fine particles having a length of one side of 0.2 to 4.0 ?m and a thickness of 1 to 100 nm is measured to be 0% to 30% in accordance with measuring method A, the method including the steps of: preparing an active silicic acid solution by subjecting an alkali silicate aqueous solution having a silica concentration of 0.5% by mass to 10.0% by mass to cation-exchange to remove alkaline components; and filtering the active silicic acid solution through a filter whose removal rate of particles having a primary particle size of 1.0 ?m is 50% or more.Type: ApplicationFiled: July 8, 2016Publication date: November 3, 2016Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Kiyomi EMA, Noriyuki TAKAKUMA, Tohru NISHIMURA, Naoki KAWASHITA, Kouji YAMAGUCHI
-
Patent number: 9108855Abstract: To provide a method for producing an alkali silicate aqueous solution containing a reduced amount of foreign substance of plate-like fine particles and a method for producing a silica sol containing a reduced amount of foreign substance of plate-like fine particles. A method for producing an alkali silicate aqueous solution fulfilling the following condition: the existing amount of plate-like fine particles having a length of one side of 0.2 to 4.0 ?m and a thickness of 1 to 100 nm is determined to be 0 to 30%. The method for producing an alkali silicate aqueous solution includes the steps of adjusting a silica concentration of an alkali silicate aqueous solution to 0.5 to 10.0% by mass and filtering the alkali silicate aqueous solution through a filter having a removal rate of particles with a primary particle size of 1.0 ?m of 50% or more.Type: GrantFiled: September 5, 2012Date of Patent: August 18, 2015Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Kiyomi Ema, Noriyuki Takakuma, Tohru Nishimura, Naoki Kawashita, Kouji Yamaguchi
-
Publication number: 20150225248Abstract: To provide a method for producing an alkali silicate aqueous solution containing a reduced amount of foreign substance of plate-like fine particles and a method for producing a silica sol containing a reduced amount of foreign substance of plate-like fine particles. A method for producing an alkali silicate aqueous solution fulfilling the following condition: the existing amount of plate-like fine particles having a length of one side of 0.2 to 4.0 ?m and a thickness of 1 to 100 nm is determined to be 0 to 30%. The method for producing an alkali silicate aqueous solution includes the steps of adjusting a silica concentration of an alkali silicate aqueous solution to 0.5 to 10.0% by mass and filtering the alkali silicate aqueous solution through a filter having a removal rate of particles with a primary particle size of 1.0 ?m of 50% or more.Type: ApplicationFiled: April 20, 2015Publication date: August 13, 2015Inventors: Kiyomi EMA, Noriyuki TAKAKUMA, Tohru NISHIMURA, Naoki KAWASHITA, Kouji YAMAGUCHI
-
Publication number: 20130075651Abstract: A method for producing an active silicic acid solution in which the existing amount of foreign matters as plate-like fine particles is reduced and a method for producing a silica sol in which such foreign matters are reduced. The method fulfills the following condition: the existing amount of plate-like fine particles having a length of one side of 0.2 to 4.0 ?m and a thickness of 1 to 100 nm is measured to be 0% to 30% in accordance with measuring method A, the method including the steps of: preparing an active silicic acid solution by subjecting an alkali silicate aqueous solution having a silica concentration of 0.5% by mass to 10.0% by mass to cation-exchange to remove alkaline components; and filtering the active silicic acid solution through a filter whose removal rate of particles having a primary particle size of 1.0 ?m is 50% or more.Type: ApplicationFiled: September 14, 2012Publication date: March 28, 2013Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Kiyomi EMA, Noriyuki TAKAKUMA, Tohru NISHIMURA, Naoki KAWASHITA, Kouji YAMAGUCHI
-
Publication number: 20130055646Abstract: To provide a method for producing an alkali silicate aqueous solution containing a reduced amount of foreign substance of plate-like fine particles and a method for producing a silica sol containing a reduced amount of foreign substance of plate-like fine particles. A method for producing an alkali silicate aqueous solution fulfilling the following condition: the existing amount of plate-like fine particles having a length of one side of 0.2 to 4.0 ?m and a thickness of 1 to 100 nm is determined to be 0 to 30%. The method for producing an alkali silicate aqueous solution includes the steps of adjusting a silica concentration of an alkali silicate aqueous solution to 0.5 to 10.0% by mass and filtering the alkali silicate aqueous solution through a filter having a removal rate of particles with a primary particle size of 1.0 ?m of 50% or more.Type: ApplicationFiled: September 5, 2012Publication date: March 7, 2013Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Kiyomi EMA, Noriyuki TAKAKUMA, Tohru NISHIMURA, Naoki KAWASHITA, Kouji YAMAGUCHI
-
Patent number: 8323368Abstract: [Problems to Be Solved] To provide a method for obtaining a polishing composition by which a polishing speed is high and the polished surface has little surface failure. [Means to Solve the Problems] The present invention relates to a production method of a polishing composition containing zirconia oxide sol including: baking at a temperature ranging from 400 to 1000° C.Type: GrantFiled: May 10, 2006Date of Patent: December 4, 2012Assignee: Nissan Chemical Industries, Ltd.Inventors: Noriyuki Takakuma, Isao Ota, Kenji Tanimoto
-
Publication number: 20090042393Abstract: A production method of a semiconductor device including: producing a polishing composition containing zirconium oxide sol; and planarizing a substrate having an uneven surface with said polishing composition, wherein the polishing composition containing zirconium oxide is produced by the steps comprising: baking at a temperature ranging from 400 to 1000° C.Type: ApplicationFiled: October 7, 2008Publication date: February 12, 2009Applicant: Nissan Chemical Industries, Ltd.Inventors: Noriyuki Takakuma, Isao Ota, Kenji Tanimoto
-
Patent number: 7484679Abstract: A method of milling cerium compound by means of a ball mill using a milling medium, characterized in that ratio Hb/r of radius r of a cylindrical ball mill container and depth Hb of the milling medium in the ball mill container disposed horizontally ranges from 1.2 to 1.9, and the ball mill container is rotated at a rotational speed which is 50% or less of critical rotational speed Nc=299/r1/2 of the ball mill container converted from the radius r expressed in centimeter. The milling method can be carried out in a wet or dry process, and the cerium compound is preferably cerium oxide. The method can be also applied for producing a cerium compound slurry.Type: GrantFiled: July 3, 2003Date of Patent: February 3, 2009Assignee: Nissan Chemical Industries, Ltd.Inventors: Isao Ota, Kenji Tanimoto, Gen Yamada, Noriyuki Takakuma
-
Publication number: 20080254718Abstract: [Problems to Be Solved] To provide a method for obtaining a polishing composition by which a polishing speed is high and the polished surface has little surface failure. [Means to Solve the Problems] The present invention relates to a production method of a polishing composition containing zirconia oxide sol including: baking at a temperature ranging from 400 to 1000° C.Type: ApplicationFiled: May 10, 2006Publication date: October 16, 2008Inventors: Noriyuki Takakuma, Isao Ota, Kenji Tanimoto
-
Patent number: 7431758Abstract: The production method for cerium oxide particles of the present invention is a method of producing a cerium oxide particle by heating a cerium compound from a normal temperature to a temperature range of 400° C. to 1200° C., and comprises at least a temperature raising stage of a temperature rise speed of 2° C./hour to 60° C./hour, or proceeds via a stage of heating while supplying a humidified gas in a temperature raising process. By the method of the present invention, a cerium oxide powder whose particle diameter distribution of primary particles is narrow can be obtained. An aqueous cerium oxide slurry produced from the powder enables an improvement in the productivity and a reduction in the cost of a polishing step, because if it is used as an abrasive a high-quality polished face is obtained without deteriorating the polishing speed. The aqueous cerium oxide slurry of the present invention is particularly useful as an abrasive for final finish of a substrate whose main component is silica.Type: GrantFiled: October 28, 2003Date of Patent: October 7, 2008Assignee: Nissan Chemical Industries, Ltd.Inventors: Isao Ota, Kenji Tanimoto, Noriyuki Takakuma
-
Publication number: 20080156908Abstract: A method of milling cerium compound by means of a ball mill using a milling medium, characterized in that ratio Hb/r of radius r of a cylindrical ball mill container and depth Hb of the milling medium in the ball mill container disposed horizontally ranges from 1.2 to 1.9, and the ball mill container is rotated at a rotational speed which is 50% or less of critical rotational speed Nc=299/r1/2 of the ball mill container converted from the radius r expressed in centimeter. The milling method can be carried out in a wet or dry process, and the cerium compound is preferably cerium oxide. The method can be also applied for producing a cerium compound slurry.Type: ApplicationFiled: February 26, 2008Publication date: July 3, 2008Applicant: Nissan Chemical Industries, Ltd.Inventors: Isao Ota, Kenji Tanimoto, Gen Yamada, Noriyuki Takakuma
-
Publication number: 20070240366Abstract: [Problems] To provide a polishing agent for use in polishing for planarization in semiconductor device production steps and for use in a semiconductor device isolation process. [Means for Solving Problems] The composition for polishing comprises a component (A), which is a water-soluble organic compound containing a carboxyl group or a salt thereof; and a component (B), which is an aqueous sol of cerium oxide particles obtained by calcining a cerium compound by holding it in at least two different calcining temperature ranges and wet-milling the resultant cerium oxide powder until the ratio of the mean particle size (b1) measured in the aqueous sol by the laser diffraction method to the particle size (b2) as determined from the specific surface area measured by the gas adsorption method is in the range of either 1 to 4 or 15 to 40. The component (A) is ammonium acrylate, ammonium methacrylate, an amino acid or a derivative thereof.Type: ApplicationFiled: May 16, 2005Publication date: October 18, 2007Applicant: NISSAN CHEMICAL INDUSTRIES, LTDInventors: Isao Ota, Kenji Tanimoto, Noriyuki Takakuma
-
Publication number: 20060150526Abstract: The production method for cerium oxide particles of the present invention is a method of producing a cerium oxide particle by heating a cerium compound from a normal temperature to a temperature range of 400° C. to 1200° C., and comprises at least a temperature raising stage of a temperature rise speed of 2° C./hour to 60° C./hour, or proceeds via a stage of heating while supplying a humidified gas in a temperature raising process. By the method of the present invention, a cerium oxide powder whose particle diameter distribution of primary particles is narrow can be obtained. An aqueous cerium oxide slurry produced from the powder enables an improvement in the productivity and a reduction in the cost of a polishing step, because if it is used as an abrasive a high-quality polished face is obtained without deteriorating the polishing speed. The aqueous cerium oxide slurry of the present invention is particularly useful as an abrasive for final finish of a substrate whose main component is silica.Type: ApplicationFiled: October 28, 2003Publication date: July 13, 2006Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Isao Ota, Kenji Tanimoto, Noriyuki Takakuma
-
Publication number: 20050253001Abstract: A method of milling cerium compound by means of a ball mill using a milling medium, characterized in that ratio Hb/r of radius r of a cylindrical ball mill container and depth Hb of the milling medium in the ball mill container disposed horizontally ranges from 1.2 to 1.9, and the ball mill container is rotated at a rotational speed which is 50% or less of critical rotational speed Nc=299/r1/2 of the ball mill container converted from the radius r expressed in centimeter. The milling method can be carried out in a wet or dry process, and the cerium compound is preferably cerium oxide. The method can be also applied for producing a cerium compound slurry.Type: ApplicationFiled: July 3, 2003Publication date: November 17, 2005Applicant: Nissan Chemical Industries, Ltd.Inventors: Isao Ota, Kenji Tanimoto, Gen Yamada, Noriyuki Takakuma