Patents by Inventor Norman E. Schumaker
Norman E. Schumaker has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8318066Abstract: The present invention is directed to methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. In one embodiment, the imprint process is designed to imprint only a portion of the substrate. The remainder of the substrate is imprinted by moving the template to a different portion of the template and repeating the imprint lithography process.Type: GrantFiled: May 16, 2011Date of Patent: November 27, 2012Assignee: Molecular Imprints, Inc.Inventors: Sidlgata V. Sreenivasan, Byung-Jin Choi, Norman E. Schumaker, Ronald D. Voisin, Michael P. C. Watts, Mario Johannes Meissl
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Publication number: 20110221095Abstract: The present invention is directed to methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. In one embodiment, the imprint process is designed to imprint only a portion of the substrate. The remainder of the substrate is imprinted by moving the template to a different portion of the template and repeating the imprint lithography process.Type: ApplicationFiled: May 16, 2011Publication date: September 15, 2011Applicant: MOLECULAR IMPRINTS, INC.Inventors: Sidlgata V. Sreenivasan, Byung J. Choi, Norman E. Schumaker, Ronald D. Voisin, Michael P. C. Watts, Mario J. Meissl
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Patent number: 7943081Abstract: Methods of forming continuous layers on regions of a substrate are described. Generally, an imprint lithography template may contact liquid positioned on the substrate. The liquid may be cured forming a masking layer, and the imprint lithography template separated from the masking layer. Prior to separation, pressurized gas and/or vacuum may be applied between the template and the substrate. Additionally, during separation, pressurized gas and/or vacuum may be applied between the template and the substrate.Type: GrantFiled: April 19, 2010Date of Patent: May 17, 2011Assignee: Molecular Imprints, Inc.Inventors: Sidlgata V. Sreenivasan, Byung-Jin Choi, Norman E. Schumaker, Ronald D. Voisin, Michael P. C. Watts, Mario Johannes Meissl
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Publication number: 20100201042Abstract: Methods of forming continuous layers on regions of a substrate are described. Generally, an imprint lithography template may contact liquid positioned on the substrate. The liquid may be cured forming a masking layer, and the imprint lithography template separated from the masking layer. Prior to separation, pressurized gas and/or vacuum may be applied between the template and the substrate. Additionally, during separation, pressurized gas and/or vacuum may be applied between the template and the substrate.Type: ApplicationFiled: April 19, 2010Publication date: August 12, 2010Applicant: MOLECULAR IMPRINTS, INC.Inventors: Sidlgata V. Sreenivasan, Byung J. Choi, Norman E. Schumaker, Ronald D. Voisin, Michael P.C. Watts, Mario J. Meissl
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Patent number: 7727453Abstract: The present invention is directed to a method of forming a layer on a region of a substrate, the method including, inter alia, positioning a liquid on the substrate; and contacting the liquid with the mold, defining a gap between the mold and the substrate, with the gap enabling positioning of the liquid by capillary forces to generate the layer over the region.Type: GrantFiled: May 11, 2005Date of Patent: June 1, 2010Assignee: Molecular Imprints, Inc.Inventors: Sidlgata V. Sreenivasan, Byung J. Choi, Norman E. Schumaker, Ronald D. Voisin, Michael P. C. Watts, Mario J. Meissl
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Patent number: 7635445Abstract: The present invention is directed towards a method of separating a mold, included in a template, from a layer disposed on a substrate, the method including, inter alia, applying a separation force to the template to separate the template from the layer; and facilitating localized deformation in the substrate to reduce the separation force required to achieve separation.Type: GrantFiled: April 18, 2005Date of Patent: December 22, 2009Assignee: Molecular Imprints, Inc.Inventors: Byung-Jin Choi, Anshuman Cherala, Yeong-jun Choi, Mario J. Meissl, Sidlgata V. Sreenivasan, Norman E. Schumaker, Xiaoming Lu, Ian M. McMackin, Daniel A. Babbs
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Patent number: 7261830Abstract: The present invention comprises a method for applying a liquid, such as imprinting material, to a substrate that features use of an electromagnetic field to rapidly spread the liquid over a desired portion of the substrate, while confining the same to the desired region.Type: GrantFiled: October 16, 2003Date of Patent: August 28, 2007Assignees: Molecular Imprints, Inc., The University of Texas System, Board of RegentsInventors: Anshuman Cherala, Sidlgata V. Sreenivasan, Norman E. Schumaker
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Patent number: 7224443Abstract: The present invention is directed to a chucking system to modulate substrates so as to properly shape and position the same with respect to a wafer upon which a pattern is to be formed with the substrate. The chucking system includes a chuck body having first and second opposed sides. A side surface extends therebetween. The first side includes first and second spaced-apart recesses defining first and second spaced-apart support regions. The first support region cinctures the second support region and the first and second recesses. The second support region cinctures the second recess, with a portion of the body in superimposition with the second recess being transparent to radiation having a predetermined wavelength. The second side and the side surface define exterior surfaces. The body includes throughways placing the first and second recesses in fluid communication with one of the exterior surfaces.Type: GrantFiled: March 27, 2006Date of Patent: May 29, 2007Assignee: Molecular Imprints, Inc.Inventors: Byung-Jin Choi, Ronald D. Voisin, Sidlgata V. Sreenivasan, Michael P. C. Watts, Daniel A. Babbs, Mario J. Meissl, Hillman L. Bailey, Norman E. Schumaker
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Patent number: 7077992Abstract: The present invention is directed to methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. In one embodiment, the imprint process is designed to imprint only a portion of the substrate. The remainder of the substrate is imprinted by moving the template to a different portion of the template and repeating the imprint lithography process.Type: GrantFiled: July 11, 2002Date of Patent: July 18, 2006Assignee: Molecular Imprints, Inc.Inventors: Sidlgata V. Sreenivasan, Byung J. Choi, Norman E. Schumaker, Ronald D. Voisin, Michael P. C. Watts, Mario J. Meissl
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Patent number: 7070405Abstract: Described are systems for patterning a substrate by imprint lithography. Imprint lithography systems include an imprint head configured to hold a template in a spaced relation to a substrate. The imprint lithography system is configured to dispense an activating light curable liquid onto a substrate or template. The system includes a light source that applies activating light to cure the activating light curable liquid. Multiple optical imaging devices are used to align the template with the substrate.Type: GrantFiled: August 1, 2002Date of Patent: July 4, 2006Assignee: Molecular Imprints, Inc.Inventors: Sidlgata V Sreenivasan, Michael P. C. Watts, Byung Jin Choi, Ronald D. Voisin, Norman E. Schumaker
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Patent number: 7019819Abstract: The present invention is directed to a chucking system to modulate substrates so as to properly shape and position the same with respect to a wafer upon which a pattern is to be formed with the substrate. The chucking system includes a chuck body having first and second opposed sides. A side surface extends therebetween. The first side includes first and second spaced-apart recesses defining first and second spaced-apart support regions. The first support region cinctures the second support region and the first and second recesses. The second support region cinctures the second recess, with a portion of the body in superimposition with the second recess being transparent to radiation having a predetermined wavelength. The second side and the side surface define exterior surfaces. The body includes throughways placing the first and second recesses in fluid communication with one of the exterior surfaces.Type: GrantFiled: November 13, 2002Date of Patent: March 28, 2006Assignee: Molecular Imprints, Inc.Inventors: Byung J. Choi, Ronald D. Voisin, Sidlgata V. Sreenivasan, Michael P. C. Watts, Daniel Babbs, Mario J. Meissl, Hillman Bailey, Norman E. Schumaker
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Patent number: 6982783Abstract: The present invention is directed to a chucking system to modulate substrates so as to properly shape and position the same with respect to a wafer upon which a pattern is to be formed with the substrate.Type: GrantFiled: June 9, 2004Date of Patent: January 3, 2006Assignee: Molecular Imprints, Inc.Inventors: Byung J. Choi, Ronald D. Voisin, Sidlgata V. Sreenivasan, Michael P. C. Watts, Daniel Babbs, Mario J. Meissl, Hillman Bailey, Norman E. Schumaker
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Patent number: 6980282Abstract: The present invention is directed to a method for modulating shapes of a substrate, having first and second opposed surfaces. This is achieved by creating a pressure differential between differing regions of the first opposed surface to attenuate structural distortions in the second opposed surface that results from external forces bearing on the substrate.Type: GrantFiled: December 11, 2002Date of Patent: December 27, 2005Assignee: Molecular Imprints, Inc.Inventors: Byung J. Choi, Ronald D. Voisin, Sidlgata V. Sreenivasan, Michael P. C. Watts, C. Grant Willson, Norman E. Schumaker, Mario J. Meissl
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Patent number: 6900881Abstract: Described are systems for patterning a substrate by imprint lithography. Imprint lithography systems include an imprint head configured to hold a template in a spaced relation to a substrate. The imprint lithography system is configured to dispense an activating light curable liquid onto a substrate or template. The system includes a light source that applies activating light to cure the activating light curable liquid.Type: GrantFiled: July 11, 2002Date of Patent: May 31, 2005Assignee: Molecular Imprints, Inc.Inventors: Sidlgata V. Sreenivasan, Michael P. C. Watts, Byung Jin Choi, Mario J. Meissl, Norman E. Schumaker, Ronald D. Voisin
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Publication number: 20040223131Abstract: The present invention is directed to a chucking system to modulate substrates so as to properly shape and position the same with respect to a wafer upon which a pattern is to be formed with the substrate.Type: ApplicationFiled: June 9, 2004Publication date: November 11, 2004Applicant: MOLECULAR IMPRINTS, INC.Inventors: Byung J. Choi, Ronald D. Voisin, Sidlgata V. Sreenivasan, Michael P.C. Watts, Daniel Babbs, Mario J. Meissl, Hillman Bailey, Norman E. Schumaker
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Publication number: 20040112861Abstract: The present invention is directed to a method for modulating shapes of a substrate, having first and second opposed surfaces. This is achieved by creating a pressure differential between differing regions of the first opposed surface to attenuate structural distortions in the second opposed surface that results from external forces bearing on the substrate.Type: ApplicationFiled: December 11, 2002Publication date: June 17, 2004Applicant: MOLECULAR IMPRINTS, INC.Inventors: Byung J. Choi, Ronald D. Voisin, Sidlgata V. Sreenivasan, Michael P.C. Watts, C. Grant Willson, Norman E. Schumaker
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Publication number: 20040090611Abstract: The present invention is directed to a chucking system to modulate substrates so as to properly shape and position the same with respect to a wafer upon which a pattern is to be formed with the substrate. The chucking system includes a chuck body having first and second opposed sides. A side surface extends therebetween. The first side includes first and second spaced-apart recesses defining first and second spaced-apart support regions. The first support region cinctures the second support region and the first and second recesses. The second support region cinctures the second recess, with a portion of the body in superimposition with the second recess being transparent to radiation having a predetermined wavelength. The second side and the side surface define exterior surfaces. The body includes throughways placing the first and second recesses in fluid communication with one of the exterior surfaces.Type: ApplicationFiled: November 13, 2002Publication date: May 13, 2004Applicant: MOLECULAR IMPRINTS, INC.Inventors: Byung J. Choi, Ronald D. Voisin, Sidlgata V. Sreenivasan, Michael P.C. Watts, Daniel Babbs, Mario J. Meissl, Hillman Bailey, Norman E. Schumaker
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Publication number: 20040022888Abstract: Described are systems for patterning a substrate by imprint lithography. Imprint lithography systems include an imprint head configured to hold a template in a spaced relation to a substrate. The imprint lithography system is configured to dispense an activating light curable liquid onto a substrate or template. The system includes a light source that applies activating light to cure the activating light curable liquid. Multiple optical imaging devices are used to align the template with the substrate.Type: ApplicationFiled: August 1, 2002Publication date: February 5, 2004Inventors: Sidlgata V. Sreenivasan, Michael P.C. Watts, Byung Jin Choi, Ronald D. Voisin, Norman E. Schumaker
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Publication number: 20040008334Abstract: Described are systems for patterning a substrate by imprint lithography. Imprint lithography systems include an imprint head configured to hold a template in a spaced relation to a substrate. The imprint lithography system is configured to dispense an activating light curable liquid onto a substrate or template. The system includes a light source that applies activating light to cure the activating light curable liquid.Type: ApplicationFiled: July 11, 2002Publication date: January 15, 2004Inventors: Sidlgata V. Sreenivasan, Michael P.C. Watts, Byung Jin Choi, Mario J. Meissl, Norman E. Schumaker, Ronald D. Voisin
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Patent number: 4969416Abstract: Substrates such as semiconductor wafers are treated with a gas by advancing the substrate along a path, preferably a circular path through the gas while maintaining a face of the substrate transverse, preferably oblique, to the path so that the gas contacts be exposed from the face of the substrate. Preferably, a plurality of substrates are treated simultaneously, and the substrates serve as vanes to impel the gas into rotational motion, thereby pumping the gas through the process chamber. Preferably, the substrates are carried on susceptors having generally planar faces, the susceptors also serving as vanes impelling the gas into rotational motion. The gas may be a depositing gas for forming epitaxial layers on the faces of the substrates, or an etching gas.Type: GrantFiled: February 27, 1990Date of Patent: November 13, 1990Assignee: Emcore, Inc.Inventors: Norman E. Schumaker, Richard A. Stall, Craig R. Nelson, Wilfried R. Wagner