Patents by Inventor Norman Jessiman

Norman Jessiman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photoresist compositions
    Publication number: 20060172225
    Abstract: Photoresists of the invention contain an added acid reaction component together with one or more resins and a photoactive component. Preferred photoresists of the invention can provide processes substrates such as microelectronic wafers with desired iso-dense bias values. Particularly preferred photoresists of the invention are chemically-amplified positive-acting resists and contain an ester-based solvent such as ethyl lactate or propylene glycol methyl ether acetate in addition to the acid reaction component.
    Type: Application
    Filed: December 6, 2005
    Publication date: August 3, 2006
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Joan Mintz, Michael Kaufman, Norman Jessiman