Abstract: A glow-discharge decomposition apparatus comprises ground electrodes, substrates, RF-electrodes, a RF-power supply, a matching circuit and a controlling circuit having at least one electric element. Each of the substrates is provided on the ground electrodes which are placed over each of the RF-electrodes in parallel to each other. Each of the RF-electrodes standing in parallel are electrically insulated to each other. The matching circuit is connected to accept a RF-power from the RF-power supply. The controlling circuit is connected to accept a RF-power from the matching circuit. The outputs of the controlling circuit are connected to supply RF-powers to the RF-electrodes. The films are fabricated on the substrates by supplying RF-powers being independently controlled via the controlling circuit, thereby plasmas are controlled over each of the RF-electrodes. Thus, deposition rates are individually controlled and uniform films are fabricated on each of the substrates.