Patents by Inventor Nozomu Nagashima
Nozomu Nagashima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11981682Abstract: A drug is provided, which containing, as an active ingredient, a compound having ABHD6 inhibitory activity in prevention and/or treatment of a disease associated with ABHD6. A compound of formula (I-A) or a pharmaceutically acceptable salt thereof has ABHD6 inhibitory activity and therefore is useful as a pharmaceutical ingredient having potent ABHD6 inhibitory activity in the prevention and/or treatment of a disease associated with ABHD6: in which all symbols represent the same meaning as the symbols described in the specification.Type: GrantFiled: September 22, 2023Date of Patent: May 14, 2024Assignee: ONO PHARMACEUTICAL CO., LTD.Inventors: Atsushi Yoshida, Ryuichi Hyakutake, Nozomu Nagashima, Ryosuke Misu, Shohei Mori
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Patent number: 11908664Abstract: A plasma processing apparatus includes a stage for supporting a target object in a chamber defined by a chamber body. The stage includes a lower electrode, an electrostatic chuck provided on the lower electrode, heaters provided in the electrostatic chuck, and terminals electrically connected to the heaters. A conductor pipe electrically connects a high frequency power supply and the lower electrode and extends from the lower electrode to the outside of the chamber body. Power supply lines supply power from a heater controller to the heaters. Filters partially forming the power supply lines prevent the inflow of high frequency power from the heaters to the heater controller. The power supply lines include wirings which respectively connect the terminals and the filters and extend to the outside of the chamber body through an inner bore of the conductor pipe.Type: GrantFiled: November 4, 2022Date of Patent: February 20, 2024Assignee: TOKYO ELECTRON LIMITEDInventors: Naohiko Okunishi, Nozomu Nagashima, Tomoyuki Takahashi
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Publication number: 20240010658Abstract: A drug is provided, which containing, as an active ingredient, a compound having ABHD6 inhibitory activity in prevention and/or treatment of a disease associated with ABHD6. A compound of formula (I-A) or a pharmaceutically acceptable salt thereof has ABHD6 inhibitory activity and therefore is useful as a pharmaceutical ingredient having potent ABHD6 inhibitory activity in the prevention and/or treatment of a disease associated with ABHD6: in which all symbols represent the same meaning as the symbols described in the specification.Type: ApplicationFiled: September 22, 2023Publication date: January 11, 2024Applicant: ONO PHARMACEUTICAL CO., LTD.Inventors: Atsushi YOSHIDA, Ryuichi HYAKUTAKE, Nozomu NAGASHIMA, Ryosuke MISU, Shohei MORI
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Publication number: 20230103890Abstract: [Problem] The present invention addresses the problem of developing a catalyst compound which has blood-brain barrier penetration properties and enables the oxygenation of amyloids in a body upon being irradiated with light from the outside of the body and providing a prophylactic and therapeutic agent for amyloid-related diseases using the catalyst compound. [Solution] It is found that a compound having such a framework that an azobenzene-like structure and boron together form a complex is useful as a novel biocatalyst which can selectively oxygenate an amyloid and can prevent the aggregation of the amyloid upon being irradiated with light while significantly reducing the molecular weight of the amyloid. It is also found that the compound can exhibit an oxygenation activity upon the irradiation with light having a longer wavelength which has high tissue penetration properties and has excellent blood-brain barrier penetration properties.Type: ApplicationFiled: December 2, 2020Publication date: April 6, 2023Inventors: Youhei Sohma, Motomu Kanai, Nozomu Nagashima, Taisuke Tomita, Yukiko Hori, Shuta Ozawa
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Publication number: 20230071478Abstract: There is a substrate processing apparatus comprising: a chamber including a sidewall having an opening; a substrate support disposed in the chamber; a support member disposed above the substrate support; an inner wall member having a ceiling portion disposed above the substrate support and below the support member; a contact member attached to one of the support member and the inner wall member and configured to detachably fix the inner wall member to the support member by applying a spring reaction force to the other of the support member and the inner wall member in a horizontal direction; and an actuator configured to move the inner wall member downward to release the fixing of the inner wall member to the support member.Type: ApplicationFiled: September 6, 2022Publication date: March 9, 2023Applicant: Tokyo Electron LimitedInventors: Hiroki Endo, Nozomu Nagashima, Suguru Sato, Koei Ito, Taisei Seguchi, Dai Kitagawa
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Publication number: 20230057937Abstract: A plasma processing apparatus includes a stage for supporting a target object in a chamber defined by a chamber body. The stage includes a lower electrode, an electrostatic chuck provided on the lower electrode, heaters provided in the electrostatic chuck, and terminals electrically connected to the heaters. A conductor pipe electrically connects a high frequency power supply and the lower electrode and extends from the lower electrode to the outside of the chamber body. Power supply lines supply power from a heater controller to the heaters. Filters partially forming the power supply lines prevent the inflow of high frequency power from the heaters to the heater controller. The power supply lines include wirings which respectively connect the terminals and the filters and extend to the outside of the chamber body through an inner bore of the conductor pipe.Type: ApplicationFiled: November 4, 2022Publication date: February 23, 2023Applicant: TOKYO ELECTRON LIMITEDInventors: Naohiko OKUNISHI, Nozomu NAGASHIMA, Tomoyuki TAKAHASHI
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Publication number: 20230031368Abstract: Provided is a filter device includes: a first coil group including a plurality of coils arranged along a central axis and spirally wound with a first inner diameter; and a second coil group including a plurality of coils arranged along the central axis and spirally wound with a second inner diameter larger than the first inner diameter. A pitch between respective turns of the plurality of coils of the second coil group is larger than a pitch between respective turns of the plurality of coils of the first coil group.Type: ApplicationFiled: October 11, 2022Publication date: February 2, 2023Applicant: TOKYO ELECTRON LIMITEDInventors: Naohiko OKUNISHI, Nozomu Nagashima
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Patent number: 11501958Abstract: A plasma processing apparatus includes a stage for supporting a target object in a chamber defined by a chamber body. The stage includes a lower electrode, an electrostatic chuck provided on the lower electrode, heaters provided in the electrostatic chuck, and terminals electrically connected to the heaters. A conductor pipe electrically connects a high frequency power supply and the lower electrode and extends from the lower electrode to the outside of the chamber body. Power supply lines supply power from a heater controller to the heaters. Filters partially forming the power supply lines prevent the inflow of high frequency power from the heaters to the heater controller. The power supply lines include wirings which respectively connect the terminals and the filters and extend to the outside of the chamber body through an inner bore of the conductor pipe.Type: GrantFiled: July 17, 2018Date of Patent: November 15, 2022Assignee: TOKYO ELECTRON LIMITEDInventors: Naohiko Okunishi, Nozomu Nagashima, Tomoyuki Takahashi
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Patent number: 11495443Abstract: Provided is a filter device including a plurality of coils, a plural of capacitors, and a frame. The coils constitute a plurality of coil groups. Each coil group includes two or more coils. The two or more coils in each coil group are provided such that respective windings of the two or more coils extend spirally about a central axis and respective turns of the two or more coils are sequentially and repeatedly arranged in an axial direction in which the central axis extends. The coil groups are provided coaxially with the central axis. A pitch between the respective turns of the two or more coils of any one coil group among the coil groups is larger than a pitch between the respective turns of the two or more coils of the coil group provided inside the one coil group among the coil groups.Type: GrantFiled: April 24, 2018Date of Patent: November 8, 2022Assignee: TOKYO ELECTRON LIMITEDInventors: Naohiko Okunishi, Nozomu Nagashima
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Patent number: 11328908Abstract: An adjustment method for filter units in a plasma processing apparatus includes a first measurement process of measuring a frequency characteristic of a reference filter unit selected among the filter units, and an adjustment process of adjusting a frequency characteristic of each of remaining filter units selected among the filter units excluding the reference filter unit. Further, the adjustment process includes an attachment process of attaching a capacitive member for adjusting a capacitance between wirings in each of the remaining filter units, a second measurement process of measuring a frequency characteristic of each of the remaining filter units to which the capacitive member is attached, and an individual adjustment process of adjusting a capacitance of the capacitive member such that the frequency characteristic of each of the remaining filter unit to which the capacitive member is attached becomes close to the frequency characteristic of the reference filter unit.Type: GrantFiled: September 9, 2019Date of Patent: May 10, 2022Assignee: TOKYO ELECTRON LIMITEDInventors: Nozomu Nagashima, Ryuichi Yui
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Patent number: 11021461Abstract: An artificial catalyst system which can acylate chromosome proteins with high selectivity has successfully been established by using a combination of an acyl CoA activating catalyst having target acylation area binding ability and acyl CoA or a derivative thereof.Type: GrantFiled: August 29, 2016Date of Patent: June 1, 2021Assignee: THE UNIVERSITY OF TOKYOInventors: Motomu Kanai, Shigehiro Kawashima, Kenzo Yamatsugu, Yoshifumi Amamoto, Yuki Aoi, Hiroki Suto, Nozomu Nagashima, Hitoshi Kurumizaka, Akihisa Osakabe, Yasuhiro Arimura
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Patent number: 10897808Abstract: A filter device includes a plurality of coils of which central axes are spaced apart from one another and in parallel to one another and a plurality of ground members spaced apart from one another and extending in parallel to the central axes of the coils outside of the coils. Each of the coils is spaced apart from another coil closest thereto by a first distance. Each of the ground members is spaced apart from a coil closest thereto by a second distance. The number of ground members spaced apart from each of the coils by the second distance is the same.Type: GrantFiled: November 3, 2017Date of Patent: January 19, 2021Assignee: TOKYO ELECTRON LIMITEDInventors: Nozomu Nagashima, Naohiko Okunishi
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Patent number: 10651813Abstract: A method is provided to design a filter. In the method, a difference between a high frequency to be blocked and a resonance frequency of a distributed constant type reference filter is obtained, the reference filter including a reference coil having windings wound at a plurality of pitches having the same length in an axial direction and a capacitor connected in parallel to the reference coil. When the difference is greater than the predetermined value, a split position in the reference coil where the reference coil is divided into a first coil element and a second coil element connected in series and a split distance between the first coil element and the second coil element to reduce the first difference.Type: GrantFiled: June 20, 2017Date of Patent: May 12, 2020Assignee: Tokyo Electron LimitedInventors: Nozomu Nagashima, Naohiko Okunishi, Eiichiro Kikuchi
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Publication number: 20200126772Abstract: An adjustment method for filter units in a plasma processing apparatus includes a first measurement process of measuring a frequency characteristic of a reference filter unit selected among the filter units, and an adjustment process of adjusting a frequency characteristic of each of remaining filter units selected among the filter units excluding the reference filter unit. Further, the adjustment process includes an attachment process of attaching a capacitive member for adjusting a capacitance between wirings in each of the remaining filter units, a second measurement process of measuring a frequency characteristic of each of the remaining filter units to which the capacitive member is attached, and an individual adjustment process of adjusting a capacitance of the capacitive member such that the frequency characteristic of each of the remaining filter unit to which the capacitive member is attached becomes close to the frequency characteristic of the reference filter unit.Type: ApplicationFiled: September 9, 2019Publication date: April 23, 2020Applicant: TOKYO ELECTRON LIMITEDInventors: Nozomu NAGASHIMA, Ryuichi YUI
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Publication number: 20190047985Abstract: An artificial catalyst system which can acylate chromosome proteins with high selectivity has successfully been established by using a combination of an acyl CoA activating catalyst having target acylation area binding ability and acyl CoA or a derivative thereof.Type: ApplicationFiled: August 29, 2016Publication date: February 14, 2019Applicant: THE UNIVERSITY OF TOKYOInventors: Motomu KANAI, Shigehiro KAWASHIMA, Kenzo YAMATSUGU, Yoshifumi AMAMOTO, Yuki AOI, Hiroki SUTO, Nozomu NAGASHIMA, Hitoshi KURUMIZAKA, Akihisa OSAKABE, Yasuhiro ARIMURA
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Publication number: 20190027344Abstract: A plasma processing apparatus includes a stage for supporting a target object in a chamber defined by a chamber body. The stage includes a lower electrode, an electrostatic chuck provided on the lower electrode, heaters provided in the electrostatic chuck, and terminals electrically connected to the heaters. A conductor pipe electrically connects a high frequency power supply and the lower electrode and extends from the lower electrode to the outside of the chamber body. Power supply lines supply power from a heater controller to the heaters. Filters partially forming the power supply lines prevent the inflow of high frequency power from the heaters to the heater controller. The power supply lines include wirings which respectively connect the terminals and the filters and extend to the outside of the chamber body through an inner bore of the conductor pipe.Type: ApplicationFiled: July 17, 2018Publication date: January 24, 2019Applicant: TOKYO ELECTRON LIMITEDInventors: Naohiko OKUNISHI, Nozomu NAGASHIMA, Tomoyuki TAKAHASHI
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Publication number: 20180309423Abstract: Provided is a filter device including a plurality of coils, a plural of capacitors, and a frame. The coils constitute a plurality of coil groups. Each coil group includes two or more coils. The two or more coils in each coil group are provided such that respective windings of the two or more coils extend spirally about a central axis and respective turns of the two or more coils are sequentially and repeatedly arranged in an axial direction in which the central axis extends. The coil groups are provided coaxially with the central axis. A pitch between the respective turns of the two or more coils of any one coil group among the coil groups is larger than a pitch between the respective turns of the two or more coils of the coil group provided inside the one coil group among the coil groups.Type: ApplicationFiled: April 24, 2018Publication date: October 25, 2018Applicant: TOKYO ELECTRON LIMITEDInventors: Naohiko OKUNISHI, Nozomu NAGASHIMA
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Patent number: 10096454Abstract: A resonance frequency can be adjusted by shifting the resonance frequency without reducing an impedance function or a withstanding voltage characteristic against a high frequency noise, when blocking, by using a multiple parallel resonance characteristic of a distributed constant line, the high frequency noise introduced into a power feed line from an electrical member other than a high frequency electrode within a processing vessel. Comb teeth M of a comb-teeth member 114 are inserted into winding gaps of air core coils 104(1) and 104(2). For example, first comb teeth M? having a thickness m? smaller than a standard thickness ts are mainly inserted in an effective zone A in a central portion of the air core coils. Further, in non-effective zones B at both sides or both end portions thereof, second comb teeth M+ having a thickness m+ equal to or larger than the standard thickness ts are arranged.Type: GrantFiled: March 10, 2015Date of Patent: October 9, 2018Assignee: TOKYO ELECTRON LIMITEDInventors: Naohiko Okunishi, Nozomu Nagashima
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Publication number: 20180139834Abstract: A filter device includes a plurality of coils of which central axes are spaced apart from one another and in parallel to one another and a plurality of ground members spaced apart from one another and extending in parallel to the central axes of the coils outside of the coils. Each of the coils is spaced apart from another coil closest thereto by a first distance. Each of the ground members is spaced apart from a coil closest thereto by a second distance. The number of ground members spaced apart from each of the coils by the second distance is the same.Type: ApplicationFiled: November 3, 2017Publication date: May 17, 2018Applicant: TOKYO ELECTRON LIMITEDInventors: Nozomu NAGASHIMA, Naohiko OKUNISHI
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Publication number: 20170373659Abstract: A method is provided to design a filter. In the method, a difference between a high frequency to be blocked and a resonance frequency of a distributed constant type reference filter is obtained, the reference filter including a reference coil having windings wound at a plurality of pitches having the same length in an axial direction and a capacitor connected in parallel to the reference coil. When the difference is greater than the predetermined value, a split position in the reference coil where the reference coil is divided into a first coil element and a second coil element connected in series and a split distance between the first coil element and the second coil element to reduce the first difference.Type: ApplicationFiled: June 20, 2017Publication date: December 28, 2017Applicant: TOKYO ELECTRON LIMITEDInventors: Nozomu NAGASHIMA, Naohiko OKUNISHI, Eiichiro KIKUCHI