Patents by Inventor Olaf Gawer
Olaf Gawer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10590528Abstract: A device for coating sheet-type substrates, in particular glass panes, in a vacuum coating system is described. The system includes a) a series connection of chambers, through which each substrate sheet passes and which are arranged on the entry side, namely a load lock chamber, a buffer chamber and a transfer chamber, each of which is vacuum-sealable by a check valve. An area of process chambers follows the transfer chamber and the process chamber is followed by a transfer chamber, buffer chamber and load lock chamber. The system also includes b) a conveyor device; c) a vacuum pump with an adapter flange in the region of the buffer chamber; d) at least two flow baffles in the buffer chamber; e) a system for the longitudinal and height displacement of the flow baffles; and f) an assembly for controlling the dynamic processes.Type: GrantFiled: October 20, 2016Date of Patent: March 17, 2020Assignee: GRENZEBACH MASCHINENBAU GMBHInventors: Olaf Gawer, Holger Richert, Jens Ellrich
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Publication number: 20180305808Abstract: The invention relates to a device and a method for coating extra-long sheet-type substrates, in particular glass panes, in a vacuum coating system, said system having the following features: a) a series connection of chambers, through which each substrate sheet (9) passes and which are arranged on the entry side, namely a load lock chamber (1), a buffer chamber (2) and a transfer chamber (3), the entry side of each of said chambers being vacuum-sealable by a check valve (8, 11, 15), wherein an area of process chambers (4) follows the transfer chamber (3) and an exit-side series connection of a transfer chamber (5), buffer chamber (7) and load lock chamber (8) follows the process chambers (4); b) a conveyor device (10) constructed on rollers; c) a single high-power vacuum pump (13) with an adapter flange (14) in the region of the buffer chamber (2); d) at least two flow baffles (12) in the region of the buffer chamber (2); e) a system (16) for the longitudinal displacement of the flow baffles (12) and a systemType: ApplicationFiled: October 20, 2016Publication date: October 25, 2018Applicant: GRENZEBACH MASCHINENBAU GMBHInventors: Olaf GAWER, Holger RICHERT, Jens ELLRICH
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Method and apparatus for saving energy while increasing the conveying speed in vacuum coating plants
Patent number: 9960020Abstract: Disclosed are an apparatus and a method for saving energy while increasing the conveying speed in vacuum coating plants consisting of a series of sputtering segments (3) and gas separation segments (2) along with a continuous substrate plane (1).Type: GrantFiled: August 5, 2015Date of Patent: May 1, 2018Assignee: GRENZEBACH MASCHINENBAU GMBHInventors: Gerd Kleideiter, Thomas Krisch, Joerg Fiukowski, Olaf Gawer -
METHOD AND APPARATUS FOR SAVING ENERGY WHILE INCREASING THE CONVEYING SPEED IN VACUUM COATING PLANTS
Publication number: 20170213708Abstract: Disclosed are an apparatus and a method for saving energy while increasing the conveying speed in vacuum coating plants consisting of a series of sputtering segments (3) and gas separation segments (2) along with a continuous substrate plane (1).Type: ApplicationFiled: August 5, 2015Publication date: July 27, 2017Applicant: GRENZEBACH MASCHINENBAU GMBHInventors: Gerd KLEIDETER, Thomas KRISCH, Joerg FIUKOWSKI, Olaf GAWER -
Patent number: 9437403Abstract: An arrangement is provided for feeding in HF current for rotatable tubular cathodes in a vacuum chamber of a plasma coating system as well as a high frequency current source. Located inside the tubular cathode is a magnet arrangement that extends along said tubular cathode for generating a magnetic field. The arrangement enables a low loss infeed of HF current, so that a particularly homogeneous sputter removal from the tubular cathode is guaranteed. The HF current source is coupled to the tubular cathode inside the vacuum chamber by a capacitive infeed of HF current in the form of a coupling capacitor. The coupling capacitor includes a part of the surface of the tubular cathode and a metal plate or metal film that surrounds the tubular cathode, at least partially, at a specified distance.Type: GrantFiled: November 9, 2012Date of Patent: September 6, 2016Assignee: FHR ANLAGENBAU GMBHInventors: Olaf Gawer, Sascha Kreher
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Publication number: 20150059646Abstract: A vapor-deposition device for coating two-dimensional substrates with an organic material. The substrates can be positioned within a vacuum chamber above a process chamber or can be moved past the latter by a transport device. A vaporizer for an organic coating material is arranged within the process chamber and opposite the substrates. The process chamber is delimited laterally by shields which, opposite the substrates, extend as far as a feed device for the coating material. The vaporizer includes the feed device for the coating material and radiant heaters underneath the same. This arrangement can achieve, with a high vaporization rate, good homogeneity of the layer thickness and of the layer stoichiometry.Type: ApplicationFiled: September 4, 2014Publication date: March 5, 2015Inventors: Reinhard Fendler, Torsten Winkler, Olaf Gawer, Roland König, Sascha Kreher
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Publication number: 20140332375Abstract: An arrangement is provided for feeding in HF current for rotatable tubular cathodes in a vacuum chamber of a plasma coating system as well as a high frequency current source. Located inside the tubular cathode is a magnet arrangement that extends along said tubular cathode for generating a magnetic field. The arrangement enables a low loss infeed of HF current, so that a particularly homogeneous sputter removal from the tubular cathode is guaranteed. The HF current source is coupled to the tubular cathode inside the vacuum chamber by a capacitive infeed of HF current in the form of a coupling capacitor. The coupling capacitor includes a part of the surface of the tubular cathode and a metal plate or metal film that surrounds the tubular cathode, at least partially, at a specified distance.Type: ApplicationFiled: November 9, 2012Publication date: November 13, 2014Inventors: Olaf Gawer, Sascha Kreher
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Patent number: 8136549Abstract: A sluice system for a vacuum coating facility for coating substrates that can be moved through the vacuum coating in a direction of conveyance comprises a prevacuum slice chamber and a transfer chamber adjoining a coating chamber, wherein a fine vacuum can be regulated before the transfer chamber on the input side in the direction of conveyance and after the transfer device on the output side in the direction of conveyance. The prevacuum sluice chamber is directly adjacent to the transfer chamber and the fine vacuum can be regulated in the prevacuum sluice chamber. A high-vacuum pump system can also alternatively and selectively be connected to the prevacuum sluice chamber.Type: GrantFiled: April 2, 2010Date of Patent: March 20, 2012Assignee: Von Ardenne Anlagentechnik GmbHInventors: Olaf Gawer, Jens Melcher, Dietmar Schulze, Hans-Christian Hecht
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Publication number: 20100206407Abstract: A sluice system for a vacuum coating facility for coating substrates that can be moved through the vacuum coating in a direction of conveyance comprises a prevacuum slice chamber and a transfer chamber adjoining a coating chamber, wherein a fine vacuum can be regulated before the transfer chamber on the input side in the direction of conveyance and after the transfer device on the output side in the direction of conveyance. The prevacuum sluice chamber is directly adjacent to the transfer chamber and the fine vacuum can be regulated in the prevacuum sluice chamber. A high-vacuum pump system can also alternatively and selectively be connected to the prevacuum sluice chamber.Type: ApplicationFiled: April 2, 2010Publication date: August 19, 2010Applicant: VON ARDENNE ANLAGENTECHNIK GMBHInventors: Olaf GAWER, Jens MELCHER, Dietmar SCHULZE, Hans-Christian HECHT
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Patent number: 7776192Abstract: An elongate vacuum system for coating one or both sides of a flat substrate which can be displaced by the system, comprises at least one magnetron provided with a magnetron surrounding area and is subdivided into successive compartments in the direction of transportation of the substrate by separating walls having closeable suction openings. The compartments can be evacuated either directly by a vacuum connection provided on the compartment or indirectly via a suction opening in the separating wall. At least one compartment comprises an upper partial compartment which is arranged above the substrate. The partial compartment comprises a closeable upper opening in at least one of the outer walls thereof. The aim is to produce an elongate coating system which is flexible to use according to the requirements of various one and two-sided coating processes and ensures a stable, differential and process-optimized sputter atmosphere.Type: GrantFiled: November 4, 2004Date of Patent: August 17, 2010Assignee: Von Ardenne Anlagentechnik GmbHInventors: Wolfgang Erbkamm, Dietmar Schulze, Jens Melcher, Olaf Gawer
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Publication number: 20080283393Abstract: An elongate vacuum system for coating one or both sides of a flat substrate which can be displaced by the system, comprises at least one magnetron provided with a magnetron surrounding area and is subdivided into successive compartments in the direction of transportation of the substrate by separating walls having closeable suction openings. The compartments can be evacuated either directly by a vacuum connection provided on the compartment or indirectly via a suction opening in the separating wall. At least one compartment comprises an upper partial compartment which is arranged above the substrate. The partial compartment comprises a closeable upper opening in at least one of the outer walls thereof. The aim is to produce an elongate coating system which is flexible to use according to the requirements of various one and two-sided coating processes and ensures a stable, differential and process-optimized sputter atmosphere.Type: ApplicationFiled: November 4, 2004Publication date: November 20, 2008Inventors: Wolfgang Erbkamm, Dietmar Schulze, Jens Melcher, Olaf Gawer
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Publication number: 20080035477Abstract: A vacuum coating system for coating elongate substrates includes one or several coating sections and one or several pump sections, at lease one magnetron in an arrangement as a sputter-down-variant above the substrate which has a target surface opposite the upper side of the substrate and/or in an arrangement as a sputter-up-variant below the substrate which has a target surface opposite the lower side of the substrate, and a transport device. The aim is to form an inline coating system for the two lateral coatings of elongate substrates, wherein construction costs and space required are reduced. The aim is achieved by use of a transport device arranged in a divided manner on a drive plane and on a transport plane. In sputter-up-variants, the underside of a magnetron body containing the magnetron lies above the drive plane.Type: ApplicationFiled: November 4, 2004Publication date: February 14, 2008Inventors: Olaf Gawer, Jens Melcher, Steffen Lessmann, Erwin Zschieschang
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Publication number: 20070209973Abstract: A sluice system for a vacuum coating facility for coating substrates that can be moved through the vacuum coating in a direction of conveyance comprises a prevacuum slice chamber and a transfer chamber adjoining a coating chamber, wherein a fine vacuum can be regulated before the transfer chamber on the input side in the direction of conveyance and after the transfer device on the output side in the direction of conveyance. The prevacuum sluice chamber is directly adjacent to the transfer chamber and the fine vacuum can be regulated in the prevacuum sluice chamber. A high-vacuum pump system can also alternatively and selectively be connected to the prevacuum sluice chamber.Type: ApplicationFiled: October 12, 2004Publication date: September 13, 2007Applicant: VON ARDENNE Anlagentechnik GmbHInventors: Olaf Gawer, Jens Melcher, Dietmar Schulze, Hans-Christian Hecht
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Publication number: 20060278519Abstract: A circular groove formed in the end of a cylindrical target allows a retaining ring and flange ring to be attached to the target. The target can then be clamped to an endblock. Targets configured for screw-on affixation may be converted for clamped affixation in this way. Endblocks configured for screw-on targets are modified to clamp targets by modifying or replacing spindles and adding clamp rings.Type: ApplicationFiled: June 10, 2005Publication date: December 14, 2006Inventors: Leszek Malaszewski, Olaf Gawer
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Patent number: 5623148Abstract: The invention which relates to a device for the generating of electron beams with a vacuum chamber, in which a massive cathode (10) is arranged with a wire cathode (14) arranged above and a aperture anode (17) below the massive cathode (10) and whom below the aperture anode (17) focusing and/or deflecting magnet arrangements are provided which direct an electron beam (23) emitted by the massive cathode (10) and accelerated by the aperture anode (17) to a processing location (22), has the basic task to make the power of such devices variable over a large range using simple mechanical means. According to the invention the task is solved by arranging the aperture anode (17) rigidly and the massive cathode (10) and the wire cathode (14) axially movable within the vacuum chamber (1). For the movements of the massive cathode (10) and the wire cathode (14) contact means are provided which follow their movements and lead to the outside of the vacuum chamber (1).Type: GrantFiled: December 11, 1995Date of Patent: April 22, 1997Assignee: von Ardenne Anlagentechnik GmbHInventors: Bernd-Dieter Wenzel, Wolfgang Erbkamm, Olaf Gawer