Abstract: The present invention relates to ignition circuitry for a plasma generator. A discharge is created by application of a high frequency or high voltage dc ignition pulse between an electrode and a first nozzle. Following ignition, the discharge is redirected to a second nozzle for the purpose of moving the plasma flow from the ignition zone into the zone of application to the workpiece. The present invention is directed to plasma ignition circuitry for improving this performance. Positive thermal coefficient ("PTC") resistance is shown to be useful in reliably and reproducibly switching the arc. Alternative embodiments of the present invention relate to switching the plasma from a first nozzle to a second nozzle then sequentially to additional nozzles downstream in the flow of plasma gas in which PTC resistance is used to reliably and reproducibly effect the switching.

Abstract: An apparatus for processing substrates with a plasma jet with increased throughput is described. The apparatus comprises at least two carrousels for holding a plurality of substrates. Each of the carrousels includes a rotatable angle drive having a rotation axis Da, a plurality of arms extending radially from the angle drive and a plurality of rotatable substrate holders. Each of the substrate holders is connected to one of the arms, each of the rotatable substrate holders has a rotation axis Ha positioned at a distance R from the rotation axis Da of the rotatable angle drive. The carousel angle drive provides programmable motion of the substrates being treated relative to a plasma jet generator. The plasma jet generator is movable from a first position Z.sub.1 adjacent to the first carousel to a second position Z.sub.2 adjacent to the second carousel. While the substrates on the first carousel are being treated by the plasma jet, the substrates on the second carousel can be loaded or unloaded.

Abstract: A holder for wafer-like articles is formed by providing a platform having a wafer-like article facing surface that includes at least one annular groove therein. The annular groove has a ceiling surface therein which is provided with an opening. A gas conducting conduit is connected to the opening. A gas, which introduced into the conduit, exits the conduit through the opening. By choosing a particular orientation of the conduit relative to the annular groove, the gas exiting the opening can be caused to circulate in a clockwise or counter clockwise fashion. The circular flow of gas causes the formation of a vortex adjacent to the article facing surface. A wafer-like article may be held in a suspended state adjacent to the wafer-like article facing surface without contact by the vortex and the gas flowing between the wafer-like article and the article facing surface.

Abstract: An article holder generates a gas flow (for example, a vortex) to hold the article at a predetermined distance from the body of the holder. Pins extend from the body of the holder and physically contact an article surface to impede the article movement along the surface. As a result, the article is prevented from bumping against the locator pins surrounding the article when the holder accelerates.

Abstract: A plasma jet generator apparatus enabling effective deflection of the generated plasma jet is described. The apparatus has an electrode chamber having a gas inlet and an outlet and an electrode positioned therein defining an electrode axis. A pair of magnetic deflection systems for deflecting the direction of the plasma flowing from the electrode axis are provided. The magnetic deflection systems are formed from pole pairs which are distributed about the electrode axis such that two magnetic fields that are substantially perpendicular to each other can be generated to deflect the plasma away from the electrode axis.

Abstract: A plasma generation system includes one or more pairs of electrode units. Each electrode unit emits a plasma carrying gas along a respective axis. Each pair of electrode units is connected to an electric power supply that creates an electric discharge through the gas jets emitted by the two units. The axes of the two units define a "basic" plane. Each unit is associated with a magnetic circuit having two poles on the opposite sides of the basic plane. Each of these circuits is used to move the plasma gas jet emitted by the respective unit towards or away from the plasma jet emitted by the other unit of the pair of units. Therefore, these circuits control the angle at which the plasma jets meet. In addition, for each pair of the electrode units, a three-pole magnetic circuit is provided to move the plasma jets perpendicularly to the basic plane. The three poles of the magnetic circuit extend substantially along the basic plane.