Patents by Inventor Olga V. Makarova

Olga V. Makarova has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11613115
    Abstract: A microfilter comprising a polymer layer formed from epoxy-based photo-definable dry film, and a plurality of apertures each extending through the polymer layer. A method of forming a microfilter is also disclosed. The method includes providing a first layer of epoxy-based photo-definable dry film disposed on a substrate, exposing the first layer to energy through a mask to form a pattern, defined by the mask, in the first layer of dry film, forming, from the exposed first layer of dry film, a polymer layer having a plurality of apertures extending therethrough, the plurality of apertures having a distribution defined by the pattern, and removing the polymer layer from the substrate.
    Type: Grant
    Filed: April 1, 2011
    Date of Patent: March 28, 2023
    Assignee: CREATV MICROTECH, INC.
    Inventors: Olga V. Makarova, Cha-Mei Tang, Platte T Amstutz
  • Publication number: 20130059308
    Abstract: A microfilter comprising a polymer layer formed from epoxy-based photo-definable dry film, and a plurality of apertures each extending through the polymer layer. A method of forming a microfilter is also disclosed. The method includes providing a first layer of epoxy-based photo-definable dry film disposed on a substrate, exposing the first layer to energy through a mask to form a pattern, defmed by the mask, in the first layer of dry film, forming, from the exposed first layer of dry film, a polymer layer having a plurality of apertures extending therethrough, the plurality of apertures having a distribution defined by the pattern, and removing the polymer layer from the substrate.
    Type: Application
    Filed: April 1, 2011
    Publication date: March 7, 2013
    Inventors: Olga V. Makarova, Cha-Mei Tang, Platte T. Amstutz
  • Patent number: 7922923
    Abstract: Grids and collimators, for use with electromagnetic energy emitting devices, include at least a metal layer that is formed, for example, by electroplating/electroforming or casting. The metal layer includes top and bottom surfaces, and a plurality of solid integrated walls. Each of the solid integrated walls extends from the top to bottom surface and has a plurality of side surfaces. The side surfaces of the solid integrated walls are arranged to define a plurality of openings extending entirely through the layer. At least some of the walls also can include projections extending into the respective openings formed by the walls.
    Type: Grant
    Filed: November 20, 2007
    Date of Patent: April 12, 2011
    Assignee: Creatv Microtech, Inc.
    Inventors: Cha-Mei Tang, Olga V. Makarova, Platte T. Amstutz, III, Guohua Yang
  • Publication number: 20100181288
    Abstract: Micro- and nanofilters have a wide range of applications in many fields, including medical diagnostics, drug delivery, medical implants, and hemodialysis. Some issues that limit commercial application of current nanofilters in medicine are low pore density, non-uniform pore size, and the use of materials that are not biocompatible. A method is described to fabricate high porosity polymer and diamond micro- and nanofilters producing smooth, uniform and straight pores of high aspect ratio. Pore size, density, and shape can be predetermined with a high degree of precision by masks and controlled etch. The method combines energetic neutral atom beam lithography and a mask. This technology allows etching polymeric materials in a clean, well-controlled, and charge-free environment, making it very suitable for fabricating nanofilters and other components for biomedical applications.
    Type: Application
    Filed: January 21, 2010
    Publication date: July 22, 2010
    Applicant: CREATV MICROTECH, INC.
    Inventors: Cha-Mei Tang, Olga V. Makarova, Mark A. Hoffbauer, Todd L. Williamson, Platte T. Amstutz
  • Patent number: 7310411
    Abstract: Grids and collimators, for use with electromagnetic energy emitting devices, include at least a metal layer that is formed, for example, by electroplating/electroforming or casting. The metal layer includes top and bottom surfaces, and a plurality of solid integrated walls. Each of the solid integrated walls extends from the top to bottom surface and has a plurality of side surfaces. The side surfaces of the solid integrated walls are arranged to define a plurality of openings extending entirely through the layer. At least some of the walls also can include projections extending into the respective openings formed by the walls.
    Type: Grant
    Filed: July 25, 2005
    Date of Patent: December 18, 2007
    Assignee: Creatv Micro Tech, Inc.
    Inventors: Cha-Mei Tang, Olga V. Makarova
  • Patent number: 6987836
    Abstract: Grids and collimators, for use with electromagnetic energy emitting devices, include at least a metal layer that is formed, for example, by electroplating/electroforming or casting. The metal layer includes top and bottom surfaces, and a plurality of solid integrated walls. Each of the solid integrated walls extends from the top to bottom surface and has a plurality of side surfaces. The side surfaces of the solid integrated walls are arranged to define a plurality of openings extending entirely through the layer. At least some of the walls also can include projections extending into the respective openings formed by the walls.
    Type: Grant
    Filed: February 1, 2002
    Date of Patent: January 17, 2006
    Assignee: Creatv Microtech, Inc.
    Inventors: Cha-Mei Tang, Olga V. Makarova
  • Publication number: 20030026386
    Abstract: Grids and collimators, for use with electromagnetic energy emitting devices, include at least a metal layer that is formed, for example, by electroplating/electroforming or casting. The metal layer includes top and bottom surfaces, and a plurality of solid integrated walls. Each of the solid integrated walls extends from the top to bottom surface and has a plurality of side surfaces. The side surfaces of the solid integrated walls are arranged to define a plurality of openings extending entirely through the layer. At least some of the walls also can include projections extending into the respective openings formed by the walls.
    Type: Application
    Filed: February 1, 2002
    Publication date: February 6, 2003
    Inventors: Cha-Mei Tang, Olga V. Makarova