Abstract: The addition of 0.5 to 30 ppm boron and 0.5 to 20 ppm calcium to iridium and the Zr- and Hf-free alloys thereof and rhodium and the Zr- and Hf-free alloys thereof surprisingly increases the creep rupture strength at high temperatures, in particular around 1,800° C.

Abstract: The addition of 0.5 to 30 ppm boron and 0.5 to 20 ppm calcium to iridium and the Zr- and Hf-free alloys thereof and rhodium and the Zr- and Hf-free alloys thereof surprisingly increases the creep rupture strength at high temperatures, in particular around 1,800° C.

Abstract: An alloy based on silver is provided, which can be used for reflective layers with a reflection factor of >90% in the visible spectral range of daylight and which exhibits a high resistance to corrosion in sulfur-containing atmospheres. The alloy contains about 0.01 to 5 wt % indium and/or tin and/or antimony and/or bismuth and the remainder silver.

Abstract: An alloy based on silver is provided, which can be used for reflective layers with a reflection factor of >90% in the visible spectral range of daylight and which exhibits a high resistance to corrosion in sulfur-containing atmospheres. The alloy contains about 0.01 to 5 wt % indium and/or tin and/or antimony and/or bismuth and the remainder silver.

Abstract: Alloys and reflector layers are provided which are based on silver and which contain at least three different chemical elements. The alloys and reflector layers are used for reflective layers with a reflection factor of over 90% in the visible spectral range of daylight and exhibit a high resistance to atmospheric corrosion relative to chlorine and sulfur.

Abstract: A hollow cylindrical target for a cathode sputtering unit with a hollow cylindrical sputtering material and a target holder is disclosed. The sputtering material has an annular cross section and concentrically surrounds a longitudinal segment of the target holder. The target holder extends out of the sputtering material at least at one end of the target to allow connection to the cathode sputtering unit. The at least one part of the target holder that extends from the sputtering material is a single part that can be detached from the target by at least one screw fitting.

Abstract: A hollow cylindrical target for a cathode sputtering unit with a hollow cylindrical sputtering material and a target holder is disclosed. The sputtering material has an annular cross section and concentrically surrounds a longitudinal segment of the target holder. The target holder extends out of the sputtering material at least at one end of the target to allow connection to the cathode sputtering unit. The at least one part of the target holder that extends from the sputtering material is a single part that can be detached from the target by at least one screw fitting.

Abstract: A bushing for drawing glass fibers and its use.

Abstract: A hollow cylindrical target for a cathode sputtering unit with a hollow cylindrical sputtering material and a target holder. The sputtering material has an annular cross section and concentrically surrounds a longitudinal segment of the target holder. The target holder extends out of the sputtering material at least at one end of the target to allow connection to the cathode sputtering unit. The at least one part of the target holder that extends from the sputtering material is a single part that can be detached from the target by at least one screw fitting.

Abstract: A hollow cylindrical target for a cathode sputtering unit with a hollow cylindrical sputtering material and a target holder. The sputtering material has an annular cross section and concentrically surrounds a longitudinal segment of the target holder. The target holder extends out of the sputtering material at least at one end of the target to allow connection to the cathode sputtering unit. The at least one part of the target holder that extends from the sputtering material is a single part that can be detached from the target by at least one screw fitting.