Patents by Inventor Olivier Enger
Olivier Enger has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20210333448Abstract: A translucent construction element comprising a layer of translucent substrate, which contains a surface structured with nanoplanes of inclined angle relative to the substrate plane, and coated with an interrupted metallic layer covering at least a part of said nanoplanes, is characterized by a high density of interruptions in the metallic layer of low thickness; the periodicity of interruptions in the metallic layer generally is from the range 50 to 1000 nm and the thickness of the metallic layer typically is from the range 1 to 50 nm. The construction element may be integrated, for example, into windows, plastic films or sheets or glazings, especially for the purpose of light management.Type: ApplicationFiled: July 9, 2021Publication date: October 28, 2021Inventors: Andreas HAFNER, Adrian Von Muehlenen, Olivier Enger, Benjamin Gallinet, Rolando Ferrini, Nenad Marjanovic, Martin Stalder, Fabian Luetolf, Guillaume Basset
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Patent number: 10800940Abstract: The invention relates to a process for producing a patterned transparent conductive film comprising areas with lower conductivity and areas with higher conductivity, comprising following steps: (a) applying an ink comprising electrically conductive nanoobjects with or without a binder on a substrate, forming a first layer, wherein the amount of conductive nanoobjects is such that the first layer has a low conductivity after drying; (b) drying of the first layer; (c) applying an ink comprising a metallo-organic complex in a predetermined pattern on the first layer; (d) decomposing of the ink applied in step (c), thereby forming a pattern having a higher conductivity on the first layer.Type: GrantFiled: April 14, 2016Date of Patent: October 13, 2020Assignee: BASF SEInventors: Rui Zhang, Garo Khanarian, Herve Dietsch, Nikolay A. Grigorenko, Olivier Enger
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Publication number: 20180134908Abstract: The invention relates to a process for producing a patterned transparent conductive film comprising areas with lower conductivity and areas with higher conductivity, comprising following steps: (a) applying an ink comprising electrically conductive nanoobjects with or without a binder on a substrate, forming a first layer, wherein the amount of conductive nanoobjects is such that the first layer has a low conductivity after drying; (b) drying of the first layer; (c) applying an ink comprising a metallo-organic complex in a predetermined pattern on the first layer; (d) decomposing of the ink applied in step (c), thereby forming a pattern having a higher conductivity on the first layer.Type: ApplicationFiled: April 14, 2016Publication date: May 17, 2018Applicant: BASF SEInventors: Rui ZHANG, Garo KHANARIAN, Herve DIETSCH, Nikolay A. GRIGORENKO, Olivier ENGER
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Publication number: 20160170102Abstract: A translucent construction element comprising a layer of translucent substrate, which contains a surface structured with nanoplanes of inclined angle relative to the substrate plane, and coated with an interrupted metallic layer covering at least a part of said nanoplanes, is characterized by a high density of interruptions in the metallic layer of low thickness; the periodicity of interruptions in the metallic layer generally is from the range 50 to 1000 nm and the thickness of the metallic layer typically is from the range 1 to 50 nm. The construction element may be integrated, for example, into windows, plastic films or sheets or glazings, especially for the purpose of light management.Type: ApplicationFiled: July 8, 2014Publication date: June 16, 2016Inventors: Andreas HAFNER, Adrian VON MUEHLENEN, Olivier ENGER, Benjamin GALLINET, Rolando FERRINI, Nenad MARJANOVIC, Martin STALDER, Fabian LUETOLF, Guillaume BASSET
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Patent number: 9222024Abstract: The present invention relates to a process for producing polymerized films with line texture or fingerprint texture or for producing substrates coated with polymerized films with line texture or fingerprint texture, to polymerized films, obtainable by this process, with line texture or fingerprint texture or substrates coated with polymerized films with line texture or fingerprint texture, to pigments obtainable by comminuting such films, to the use of such films, substrates or pigments as or in optical filter(s), polarizers, decorative media, forgeryproof markers, reflective media or for focusing light (in solar cells), to the use of such films as an antibacterial coating, to a forgeryproof marker which comprises such a film, and to a process for detecting forgeryproof markings.Type: GrantFiled: April 20, 2011Date of Patent: December 29, 2015Assignee: BASF SEInventors: Jochen Brill, Ulrich Schalkowsky, Thomas Musiol, Claus Hoffmann, Olivier Enger, Oliver Seeger
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Patent number: 8608977Abstract: The present invention relates to compounds of the general formula I in which the variables are each defined as follows: W is a (Y4-T2-)s(Y3-A2-)tY2—Z2 moiety, Z1, Z2 are each independently unreactive radicals as defined more specifically in the description or reactive radicals through which polymerization can be brought about, A1, A2 are each independently spacers as defined more specifically in the description, Y1 to Y5 are linking units as defined more specifically in the description, Y6 is a chemical single bond or —CO—, T1, T2 are each independently, as defined more specifically in the description, divalent saturated or unsaturated, optionally substituted and optionally fused iso- or heterocyclic radicals, Q is substituents as defined more specifically in the description, r, t are each independently 0 or 1, s is 0, 1, 2 or 3 and q is 0, 1, 2, 3 or 4.Type: GrantFiled: June 4, 2009Date of Patent: December 17, 2013Assignee: BASF SEInventors: Olivier Enger, Markus Hoffmann, Jochen Brill, Stephan Maurer, Bernd Ziegler
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Publication number: 20110255073Abstract: The present invention relates to a process for producing polymerized films with line texture or fingerprint texture or for producing substrates coated with polymerized films with line texture or fingerprint texture, to polymerized films, obtainable by this process, with line texture or fingerprint texture or substrates coated with polymerized films with line texture or fingerprint texture, to pigments obtainable by comminuting such films, to the use of such films, substrates or pigments as or in optical filter(s), polarizers, decorative media, forgeryproof markers, reflective media or for focusing light (in solar cells), to the use of such films as an antibacterial coating, to a forgeryproof marker which comprises such a film, and to a process for detecting forgeryproof markings.Type: ApplicationFiled: April 20, 2011Publication date: October 20, 2011Applicant: BASF SEInventors: Jochen BRILL, Ulrich Schalkowsky, Thomas Musiol, Claus Hoffmann, Olivier Enger, Oliver Seeger
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Publication number: 20110097562Abstract: The present invention relates to films and laminates which shield thermal radiation and are based on IR-reflective liquid-crystalline layers, to a process for the production thereof, to pigments comprising them and to a composition which comprises a particular chiral dopant.Type: ApplicationFiled: June 17, 2009Publication date: April 28, 2011Applicant: BASF SEInventors: Jochen Brill, Thomas Musiol, Ulrich Schalkowsky, Olivier Enger, Bernd Ziegler
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Publication number: 20110092718Abstract: The present invention relates to compounds of the general formula I in which the variables are each defined as follows: W is a (Y4-T2-)s(Y3-A2-)tY2—Z2 moiety, Z1, Z2 are each independently unreactive radicals as defined more specifically in the description or reactive radicals through which polymerization can be brought about, A1, A2 are each independently spacers as defined more specifically in the description, Y1 to Y5 are linking units as defined more specifically in the description, Y6 is a chemical single bond or —CO—, T1, T2 are each independently, as defined more specifically in the description, divalent saturated or unsaturated, optionally substituted and optionally fused iso- or heterocyclic radicals, Q is substituents as defined more specifically in the description, r, t are each independently 0 or 1, s is 0, 1, 2 or 3 and q is 0, 1, 2, 3 or 4.Type: ApplicationFiled: June 4, 2009Publication date: April 21, 2011Applicant: Basf SEInventors: Olivier Enger, Markus Hoffmann, Jochen Brill, Stephan Maurer, Bernd Ziegler
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Patent number: 7670505Abstract: Compounds of the general formula I (variables defined herein) and processes for making compounds including 2,6 -naphthyl radicals are provided. Polymerizable or nonpolymerizable liquid-crystalline compositions including one or more compounds including 2,6 -naphthyl radicals, and products and processes employing such compositions, are also provided.Type: GrantFiled: May 10, 2006Date of Patent: March 2, 2010Assignee: BASF AktiengesellschaftInventors: Olivier Enger, Ruediger Sens, Christian Lennartz, Robert Parker
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Publication number: 20080221289Abstract: The present invention relates to compounds of the general formula I in which the variables are each defined as follows: Z1, Z2 are each independently hydrogen, optionally substituted C1-C20-alkyl in which the carbon chain may be interrupted by oxygen atoms in ether function, sulfur atoms in thioether function or by nonadjacent imino or C1-C4-alkylimino groups, or reactive radicals by means of which polymerization can be brought about, A1, A2 are each independently spacers having from 1 to 30 carbon atoms, in which the carbon chain may be interrupted by oxygen atoms in ether function, sulfur atoms in thioether function or by nonadjacent imino or C1-C4-alkylimino groups, Y1, Y2 are each independently a chemical single bond, oxygen, sulfur, —CO—, —O—CO—, —CO—O—, —S—CO—, —CO—S—, —NR—CO— or —CO—NR—, Y3, Y4 are each independently a chemical single bond, oxygen, sulfur, —CR?CR—, —C?C—, —CR?CR—CO—O—, —O—CO—CR?CR—, —C?C—O—, —O—C?C—, —CH2—CH2—, —CH2—O—, —O—CH2—, —CH2—S—, —S—CH2—, —CO—, —O—CO—, —CO—O—, —S—CO—, —CType: ApplicationFiled: May 10, 2006Publication date: September 11, 2008Applicant: BASF AKTIENGESELLSCHAFTInventors: Olivier Enger, Rudiger Sens, Christian Lennartz, Robert Parker