Patents by Inventor Osami Ohura

Osami Ohura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5155241
    Abstract: Styrene oxide is prepared by reacting styrene and hydrogen peroxide in a heterogenous system in the presence of a bis(tri-n-alkyltinoxy) molybdic acid and an inorganic anion.
    Type: Grant
    Filed: October 7, 1991
    Date of Patent: October 13, 1992
    Assignee: Tokai Denka Kogyo Kabushiki Kaisha
    Inventors: Keiichi Nishibe, Seiichi Rengakuji, Masami Inoue, Osami Ohura, Hirohisa Nitoh
  • Patent number: 5149871
    Abstract: A novel water-soluble produced by contacting thiourea dioxide with an aqueous solution comprising an amino acid having the general formula NH.sub.2 (CH.sub.2).sub.n COOH wherein n is an integer of 1 to 7 and a sodium, potassium or calcium salt of acetic acid.
    Type: Grant
    Filed: November 25, 1991
    Date of Patent: September 22, 1992
    Assignee: Tokai Denka Kogyo Kabushiki Kaisha
    Inventors: Hirohisa Nitoh, Osami Ohura, Morio Suzuki
  • Patent number: 5055286
    Abstract: Metal ions contained in hydrogen peroxide can be removed efficiently, safely and inexpensively by contacting hydrogen peroxide to be purified with an anion exchange resin with a chelating agent adsorbed therein.
    Type: Grant
    Filed: June 15, 1988
    Date of Patent: October 8, 1991
    Assignee: Tokai Denka Kogyo Kabushiki Kaisha
    Inventors: Satoru Watanabe, Osami Ohura
  • Patent number: 5041569
    Abstract: Styrene oxide is prepared by reacting styrene and hydrogen peroxide in a heterogeneous system in the presence of a bis(tri-n-alkyltinoxy)molybdic acid and an amine represented by the following general formula: ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 each independently represent H, CH.sub.3, C.sub.2 H.sub.5, C.sub.3 H.sub.7, C.sub.4 H.sub.9, or HOCH.sub.2 CH.sub.2.
    Type: Grant
    Filed: January 17, 1990
    Date of Patent: August 20, 1991
    Assignee: Tokai Denka Kogyo Kabushiki Kaisha
    Inventors: Saburo Enomoto, Masami Inoue, Osami Ohura, Tutomu Kamiyama, Hirohisa Nitoh
  • Patent number: 4943661
    Abstract: An amine-substituted thiourea dioxide is obtained by reacting thiourea dioxide and an aliphatic or aromatic primary amine in a neutral or acidic pH range.
    Type: Grant
    Filed: March 14, 1989
    Date of Patent: July 24, 1990
    Assignee: Tokai Denka Kogyo Kabushiki Kaisha
    Inventors: Hirohisa Nitoh, Osami Ohura, Morio Suzuki
  • Patent number: 4382147
    Abstract: 4,4'-Dihydroxydiphenyl sulfone is isolated from a mixture of dihydroxydiphenyl sulfone isomers by heat dissolving the mixture in phenol and then cooling the resulting solution thereby allowing 4,4'-dihydroxydiphenyl sulfone to precipitate as an adduct with phenol.
    Type: Grant
    Filed: September 9, 1981
    Date of Patent: May 3, 1983
    Assignee: Tokai Denka Kogyo Kabushiki Kaisha
    Inventors: Hirotsugu Kitamura, Yasumasa Shimizu, Osami Ohura
  • Patent number: 4238411
    Abstract: According to this invention there is provided a method of recovering thiourea dioxide characterized in that in the production of thiourea dioxide by the reaction of thiourea and hydrogen peroxide in an aqueous solvent, the waste liquor after separation of the crystals of thiourea dioxide after reaction is treated with an ion-exchange resin to remove side reaction products and impurities contained therein, and is then concentrated with a reverse-osmotic membrane to crystallize the thiourea dioxide dissolved therein.
    Type: Grant
    Filed: July 9, 1979
    Date of Patent: December 9, 1980
    Assignee: Tokai Denka Kogyo Kabushiki Kaisha
    Inventors: Osami Ohura, Osamu Fujimoto
  • Patent number: 4233238
    Abstract: According to this invention there is provided a process for preparing thiourea dioxide characterized in that in the production of thiourea dioxide by the reaction of thiourea and hydrogen peroxide in an aqueous solvent, the filtrate after separation of the crystals of thiourea dioxide after reaction is treated with an ion-exchange resin to remove side reaction products and impurities contained therein and then is used again as a reaction solvent.
    Type: Grant
    Filed: July 9, 1979
    Date of Patent: November 11, 1980
    Assignee: Tokai Denka Kogyo Kabushiki Kaisha
    Inventors: Osami Ohura, Osamu Fujimoto