Patents by Inventor Osamu Funayama

Osamu Funayama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8549317
    Abstract: When only a fingerprint authentication approach is set, it is displayed that only authentication by the fingerprint authentication approach is accepted, and authentication by the fingerprint authentication approach is performed. Meanwhile, at least a system administrator is enabled to perform authentication by a password authentication approach.
    Type: Grant
    Filed: July 20, 2006
    Date of Patent: October 1, 2013
    Assignee: Fujitsu Limited
    Inventor: Osamu Funayama
  • Patent number: 7396568
    Abstract: An aqueous solution is prepared comprising 5 to 25% by weight of an anionic surfactant, 0.5 to 20% by weight of an amphoteric surfactant, 4 to 6% by weight of a nonionic surfactant and, if necessary, an antiseptic and the aqueous solution is adjusted with an organic acid to pH in the range of 4.5 to 7.0, which is used as an undiluted solution of a hydrophilicity maintaining and promoting agent for a polysilazane-containing coating film. The undiluted solution is diluted with water to from 3 to 15 times and the resulting solution is used as a hydrophilicity promoting agent. While the undiluted solution is diluted with water to from 30 to 70 times and the resulting solution is used as a hydrophilicity maintaining agent. The hydrophilicity promoting agent is applied on an anti-fouling coating film which is formed by applying on a substrate a coating solution comprising polysilazane and, if necessary, silica conversion catalyst, and thereby the coating film is made hydrophilic in an extremely short time.
    Type: Grant
    Filed: May 13, 2003
    Date of Patent: July 8, 2008
    Assignee: Clariant Finance (BVI) Limited
    Inventors: Tadashi Suzuki, Hiroshi Hara, Osamu Funayama, Hideo Takeuchi
  • Publication number: 20070240211
    Abstract: In an authentication method for two programs which are executed when it is confirmed by authentication that a user is a valid user, pre-registered first reference data is acquired when authentication is performed for a first program to be activated earlier, and authentication data inputted by a user when the authentication for the first program is performed is acquired. Authentication for execution of the first program is performed with the use of the first reference data and the authentication data. Pre-registered second reference data is acquired when authentication is performed for a second program to be activated later, and authentication for execution of the second program is performed with the use of the second reference data and the authentication data already acquired at the authentication for the first program.
    Type: Application
    Filed: July 20, 2006
    Publication date: October 11, 2007
    Applicant: FUJITSU LIMITED
    Inventors: Hiroyuki Kosaka, Osamu Funayama
  • Publication number: 20070239980
    Abstract: When only a fingerprint authentication approach is set, it is displayed that only authentication by the fingerprint authentication approach is accepted, and authentication by the fingerprint authentication approach is performed. Meanwhile, at least a system administrator is enabled to perform authentication by a password authentication approach.
    Type: Application
    Filed: July 20, 2006
    Publication date: October 11, 2007
    Applicant: FUJITSU LIMITED
    Inventor: Osamu Funayama
  • Patent number: 7188239
    Abstract: When a personal computer system user carries out an OS shutdown, a BIOS does not turn off power, but reboots the system by a software reset to execute a POST, so that the state of the system immediately before starting the launch of the OS after completion of the POST is held in a volatile memory, and the system is shifted to a power saving mode. Subsequently, when the system is booted, the BIOS performs only restoration processing from the power saving mode while omitting the POST execution, and at once launches the OS, thereby shortening the system boot time by omitting the POST execution when the system is booted. Thus, POST processes are performed after the OS shutdown, a state that the POST has been completed after rebooting is held in the volatile memory, and then the system is placed into a state of power saving mode.
    Type: Grant
    Filed: November 18, 2003
    Date of Patent: March 6, 2007
    Assignee: Fujitsu Limited
    Inventor: Osamu Funayama
  • Publication number: 20050279255
    Abstract: A coating solution comprising 0.1 to 35% by weight of an inorganic or organic polysilazane having repeating units represented by the general formula below and soluble in a solvent and 0.1 to 10% by weight of catalyst such as 4,4?-trimethylenebis(1-methylpiperidine) based on a pure polysilazane content. By applying the coating solution onto the surface of base materials such as metals, plastics, glass, ceramic, wood, cement, mortar, bricks, etc., a silica coating strongly adhered to the base materials can be formed excellent in corrosion resistance and anti-scratch properties and simultaneously excellent in characteristics such as abrasion resistant, long-lasting anti-fouling properties, wetting properties to water, sealing properties, chemical resistance, oxidation resistance, physical barrier effect, heat resistance, fire resistance and antistatic properties.
    Type: Application
    Filed: October 21, 2003
    Publication date: December 22, 2005
    Inventors: Tadashi Suzuki, Osamu Funayama, Andreas Dierdorf, Hubert Liebe
  • Publication number: 20050119402
    Abstract: An aqueous solution is prepared comprising 5 to 25% by weight of an anionic surfactant, 0.5 to 20% by weight of an amphoteric surfactant, 4 to 6% by weight of a nonionic surfactant and, if necessary, an antiseptic and the aqueous solution is adjusted with an organic acid to pH in the range of 4.5 to 7.0, which is used as an undiluted solution of a hydrophilicity maintaining and promoting agent for a polysilazane-containing coating film. The undiluted solution is diluted with water to from 3 to 15 times and the resulting solution is used as a hydrophilicity promoting agent. While the undiluted solution is diluted with water to from 30 to 70 times and the resulting solution is used as a hydrophilicity maintaining agent. The hydrophilicity promoting agent is applied on an anti-fouling coating film which is formed by applying on a substrate a coating solution comprising polysilazane and, if necessary, silica conversion catalyst, and thereby the coating film is made hydrophilic in an extremely short time.
    Type: Application
    Filed: May 13, 2003
    Publication date: June 2, 2005
    Inventors: Tadashi Suzuki, Hiroshi Hara, Osamu Funayama, Hideo Takeuchi
  • Publication number: 20040098578
    Abstract: When the shutdown operation of an OS is carried out by a user of a personal computer system, a BIOS does not turn off power at once but reboots the system by a software reset to execute a POST, so that the state of the system immediately before the launch of the OS is started after completion of the POST is held in a volatile memory, and the system is shifted to a power saving mode. Subsequently, when the system is booted, the BIOS performs only restoration processing from the power saving mode while omitting the execution of the POST, and starts the launch of the OS at once. With the above configuration, the boot time of the system can be shortened by omitting the execution of the POST when the system is booted. The processes required by the POST are performed after the shutdown processing of the OS, and the state that the POST is completed after rebooting is held in the volatile memory, and the system is placed into a state of power saving mode.
    Type: Application
    Filed: November 18, 2003
    Publication date: May 20, 2004
    Applicant: FUJITSU LIMITED
    Inventor: Osamu Funayama
  • Patent number: 6310168
    Abstract: An amine residue-containing polysilazane having a number average molecular weight of 100-100,000 and having a molecular chain containing a silazane structure represented by the general formula (I) shown below and/or a silazane structure represented by the general formula (II) shown below: wherein R1 and R2 each stand for hydrogen, a hydrocarbyl group or a hydrocarbyl group-containing silyl group, A and A2 each stand for a divalent hydrocarbyl group, B stands for an N-hydrocarbyl group-substituted amine residue or a cyclic amine residue, B2 stands for a divalent linear amine residue or a divalent cyclic amine residue and p, r and q are each 0 or 1. The above polysilazane may be obtained by reacting a polysilazane with a mono- and/or dihydroxyl compound having an amine residue in an inert organic solvent containing no active hydrogen.
    Type: Grant
    Filed: February 7, 2000
    Date of Patent: October 30, 2001
    Assignee: Tonen Corporation
    Inventors: Yasuo Shimizu, Tomoko Aoki, Osamu Funayama
  • Patent number: 6011167
    Abstract: Polyorganosiloxazane is provided which is capable of being converted into a ceramic material having low dielectric constant. The polymer according to the present invention is characterized by comprising the main repeating units of --(RSiN.sub.3)--, --(RSiN.sub.2 O)--, --(RSiNO.sub.2)-- and --(RSiO.sub.3)--, wherein, R represents an alkyl, alkenyl, cycloalkyl, aryl, alkylamino or alkylsilyl group, and by having a number-average molecular weight ranging from 300 to 100,000. The polyorganosiloxazane of the present invention has superior thermal resistance, and a ceramic material obtainable by firing the same at a predetermined temperature shows very low specific dielectric constant of 2.7 or less, making it useful particularly as a material in electronics.
    Type: Grant
    Filed: August 26, 1998
    Date of Patent: January 4, 2000
    Assignee: Tonen Corporation
    Inventors: Yuuji Tashiro, Osamu Funayama
  • Patent number: 5905130
    Abstract: Disclosed is a process for the production of a polysilazane containing Si--N linkages in the main chain thereof. According to the present invention, the polysilazane is produced by reacting a polyaminosilane compound with a polyhydrogenated nitrogen-containing compound in the presence of a basic catalyst or by reacting a polyhydrogenated silicon compound with a polyhydrogenated nitrogen-containing compound in the presence of a basic solid oxide catalyst.
    Type: Grant
    Filed: August 25, 1997
    Date of Patent: May 18, 1999
    Assignee: Tonen Corporation
    Inventors: Hirohiko Nakahara, Osamu Funayama, Takeshi Isoda
  • Patent number: 5436398
    Abstract: A preceramic polymetalosilazane substantially free of Si-O groups is produced by reacting a polysilazane with a metal alkoxide in the presence of an alkylsilazane or alkylsilane. The preceramic polymer gives a high strength and heat resistant ceramic body which remains amorphous when calcined at 1,600.degree. C. for 10 hours in the atmosphere of nitrogen.
    Type: Grant
    Filed: April 6, 1994
    Date of Patent: July 25, 1995
    Assignee: Tonen Corporation
    Inventors: Yasuo Shimizu, Hirohiko Nakahara, Tomoko Aoki, Osamu Funayama, Takeshi Isoda
  • Patent number: 5292830
    Abstract: A thermoplastic silicon-containing polymer, which may be a precursor of SiC, and which can be transformed to a thermosetting polymer by copolymerizing it with a thermosetting perhydropolysilazane or polyborosilazane.
    Type: Grant
    Filed: June 18, 1992
    Date of Patent: March 8, 1994
    Assignee: Tonen Corporation
    Inventors: Osamu Funayama, Tomohiro Kato, Rika Takatsu, Yuuji Tashiro, Toshihide Kishi, Takayuki Date, Takeshi Isoda
  • Patent number: 5166104
    Abstract: Novel polysiloxazanes comprising [SiH.sub.2).sub.n NH-- and [SiH.sub.2).sub.m O-- as the main repeating units are provided. The polysiloxazanes are produced by reacting a dihalosilane or an adduct thereof with a Lewis base, with ammonia and water vapor or oxygen. From the polysiloxazane, novel silicon oxynitride shapes can be produced and the silicon oxynitride shapes are essentially composed of silicon, nitride (5 mol % or more) and oxygen (5 mol % or more).
    Type: Grant
    Filed: September 6, 1991
    Date of Patent: November 24, 1992
    Assignee: Toa Nenryo Kogyo Kabushiki Kaisha
    Inventors: Osamu Funayama, Mikiro Arai, Hayato Nishii, Takeshi Isoda
  • Patent number: 5145812
    Abstract: A molded body formed of a silicon nitride-based ceramic containing Si and N and optionally O, C and/or a metal. The ceramic is formed from a polysilazane. A molded body may be a composite body which is composed of a matrix of the ceramic and a reinforcing material such as powder or fiber embedded within the matrix or which is composed of ceramic powder bound with a binder formed of the silicon nitride-based ceramic.
    Type: Grant
    Filed: August 19, 1991
    Date of Patent: September 8, 1992
    Assignee: Toa Nenryo Kogyo Kabushiki Kaisha
    Inventors: Mikiro Arai, Osamu Funayama, Hayato Nishii, Tamio Ishiyama, Hiroshi Kaya, Takeshi Isoda, Kouichi Yasuda, Atsuro Takazawa, Tadashi Suzuki, Ichiro Kohshi, Masaaki Ichiyama, Tomohiro Kato
  • Patent number: 5128286
    Abstract: A shaped body is disclosed which comprises substantially amorphous, silicon nitride-based ceramic containing Si, N and B as essential components and O, C and H as optional components in amounts providing the following atomic ratios:N/Si: 0.05 to 2.5,B/Si: 0.01-3,O/Si: 2.0 or less,C/Si: 1.5 or less, andH/Si: 0.1 or less.
    Type: Grant
    Filed: June 18, 1990
    Date of Patent: July 7, 1992
    Assignee: Tonen Corporation
    Inventors: Osamu Funayama, Mikiro Arai, Hiroyuki Aoki, Yuuji Tashiro, Toshio Katahata, Kiyoshi Sato, Takeshi Isoda, Tadashi Suzuki, Ichiro Kohshi
  • Patent number: 5079323
    Abstract: Novel polysiloxazanes comprising --SiH.sub.2).sub.n NH] and --SiH.sub.2).sub.m O] as the main repeating units are provided. The polysiloxazanes are produced by reacting a dihalosilane or an adduct thereof with a Lewis base, with ammonia and water vapor or oxygen. From the polysiloxazane, novel silicon oxynitride shapes can be produced and the silicon oxynitride shapes are essentially composed of silicon, nitride (5 mol % or more) and oxygen (5 mol % or more).
    Type: Grant
    Filed: July 18, 1990
    Date of Patent: January 7, 1992
    Assignee: Toa Nenro Kogyo Kabushiki Kaisha
    Inventors: Osamu Funayama, Mikiro Arai, Hayato Nishii, Takeshi Isoda
  • Patent number: 5032551
    Abstract: Silicon nitride based ceramic fibers containing Si, N, O and at least one metal M in amounts providing the atomic ratios N/Si of 0.3 to 3, O/Si of 0.0001 to 15 and M/Si of 0.001 to 5 and exhibiting an X-ray small angle scattering such that the ratio of the intensity of the small angle scattering of the fibers to that of air is 1 to 20. The ceramic fibers are produced by spinning of a polymetallosilazane into fibers and calcining the spun fibers and are useful as reinforcing fibers for composite artices having a metal or resin matrix.
    Type: Grant
    Filed: March 2, 1989
    Date of Patent: July 16, 1991
    Assignee: Toa Nenryo Kogyo Kabushiki Kaisha
    Inventors: Yuuji Tashiro, Osamu Funayama, Mikiro Arai, Hiroyuki Aoki, Takeshi Isoda, Hiroshihi Kaya, Tadashi Suzuki, Toshio Katahata, Mutsuo Haino, Genshiro Nishimura
  • Patent number: 5030744
    Abstract: Disclosed is a polyborosilazane having a B/Si atomic ratio of 0.01 to 3 and a number-average molecular weight of about 200 to about 500,000 which can be pyrolyzed to give ceramics. The polyborosilazane is produced by reacting a polysilazane having a number-average molecular weight of about 100 to about 50,000 with a boron compound.
    Type: Grant
    Filed: January 18, 1990
    Date of Patent: July 9, 1991
    Assignee: Tonen Corporation
    Inventors: Osamu Funayama, Mikiro Arai, Yuuji Tashiro, Takeshi Isoda, Kiyoshi Sato
  • Patent number: 4975512
    Abstract: A novel, reformed polysilazane obtained by reacting a polysilazane with a compound selected from ammonia, primary and secondary amines, hydrazine and mono-, di- and tri-substituted hydrazines to cross-link the polysilazane with the compound serving as a cross-linking agent or to link the compound to the polysilazane.
    Type: Grant
    Filed: August 10, 1988
    Date of Patent: December 4, 1990
    Assignees: Petroleum Energy Center, Toa Nenryo Kogyo Kabushiki Kaisha
    Inventors: Osamu Funayama, Mikiro Arai, Takeshi Isoda