Patents by Inventor Osamu Inoue

Osamu Inoue has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11978932
    Abstract: A method of detecting degradation of a membrane electrode assembly in a fuel cell system is provided. In the method, it is possible to detect degradation (cross leakage) of a fuel cell. In the state where variation of a load is suppressed, variation of the gas pressure where a predetermined amount of the fuel gas is supplied from a fuel tank to a fuel cell is measured by a pressure sensor provided in a fuel gas circulation channel extending from the fuel gas outlet to the fuel gas inlet.
    Type: Grant
    Filed: February 15, 2021
    Date of Patent: May 7, 2024
    Assignee: Honda Motor Co., Ltd.
    Inventors: Kazuhide Inoue, Kuniaki Ojima, Tomoyuki Inoue, Osamu Ogami
  • Publication number: 20240084382
    Abstract: An information processing device includes a control unit configured to determine whether to include a regenerative brake in specifications of a proposed vehicle based on regenerative brake operation data acquired while a first vehicle including the regenerative brake is traveling in a predetermined area. The proposed vehicle is a vehicle proposed as a vehicle for a customer to drive in the predetermined area.
    Type: Application
    Filed: November 16, 2023
    Publication date: March 14, 2024
    Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Shunsuke Tanimori, Ryota Nakabayashi, Osamu Izumida, Takeshi Kanou, Naoki Yamada, Kazuyuki Inoue, Shin Sakurada, Hiromitsu Fujii
  • Publication number: 20220401590
    Abstract: The present invention relates to a compound represented by the following General Formula (1) or a salt thereof. In General Formula (1), R1, R2, R3 and R4 each independently represent a hydrogen atom, a linear or branched alkyl group which may have a substituent or the like. R1 and R2 may be bonded to each other to form a ring. R3 and R4 may be bonded to each other to form a ring. R1 and/or R2 may be bonded to a 6-membered ring to which —NR1R2 is bonded to form a ring. R3 and/or R4 may be bonded to a 6-membered ring to which —NR3R4 is bonded to form a ring. R5 represents —11CH3, a linear or branched alkyl group which may have a substituent or the like. R6 represents —F, —18F or the like. X, Y and Z each independently represent a carbon atom, an oxygen atom or the like. n is 0 or 1.
    Type: Application
    Filed: November 4, 2020
    Publication date: December 22, 2022
    Applicants: SHIZUOKA PREFECTURAL UNIVERSITY CORPORATION, MEDICAL CORPORATION KINSHUKAI, HAMAMATSU PHOTONICS K.K.
    Inventors: Kenichiro TODOROKI, Yoshitaka HAMASHIMA, Hiromichi EGAMI, Satoshi NAKAGAWA, Toshihiro SAKAI, Osamu INOUE, Shingo NISHIYAMA, Masakatsu KANAZAWA, Hideo TSUKADA
  • Patent number: 10545017
    Abstract: The purpose of the present invention is to provide an overlay error measuring device which measures an overlay error with high accuracy even when a lower layer pattern is disposed under a thin film and a sufficient signal amount cannot be ensured. The present invention proposes an overlay error measuring device provided with an arithmetic processing unit for measuring a pattern formed on a sample on the basis of a signal waveform obtained by a charged particle beam device. The arithmetic processing unit finds a correlation with the signal waveform using a partial waveform obtained on the basis of partial extraction of the signal waveform, forms a correlation profile indicating the correlation, and measures an overlay error using the correlation profile.
    Type: Grant
    Filed: June 5, 2013
    Date of Patent: January 28, 2020
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Satoru Yamaguchi, Kei Sakai, Osamu Inoue, Kazuyuki Hirao, Osamu Komuro
  • Patent number: 10002743
    Abstract: For scanning electron beams and measuring overlay misalignment between an upper layer pattern and a lower layer pattern with high precision, electron beams are scanned over a region including a first pattern and a second pattern of a sample, the sample having the lower layer pattern (the first pattern) and the upper layer pattern (the second pattern) formed in a step after a step of forming the first pattern. The electron beams are scanned such that scan directions and scan sequences of the electron beams become axial symmetrical or point-symmetrical in a plurality of pattern position measurement regions defined within the scan region for the electron beams, thereby reducing measurement errors resulting from the asymmetry of electric charge.
    Type: Grant
    Filed: April 21, 2015
    Date of Patent: June 19, 2018
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Shoji Hotta, Hiroki Kawada, Osamu Inoue
  • Patent number: 9824938
    Abstract: Provided is a charged particle beam device which can specify a position of an initial core with high accuracy even when fine line and space patterns are formed by an SADP in plural times. The charged particle beam device includes a detector (810) which detects secondary charged particles discharged from a sample (807) when a charged particle beam is emitted to the sample having a plurality of patterns of line shape, a display unit (817) which displays image data of a surface of the sample on the basis of a signal of the secondary charged particles, a calculation unit (812) which calculates an LER value with respect to the plurality of the patterns of line shape from the image data, and a determination unit (816) which compares the values to determine a position of the initial core.
    Type: Grant
    Filed: March 31, 2015
    Date of Patent: November 21, 2017
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Atsuko Yamaguchi, Osamu Inoue, Hiroki Kawada
  • Patent number: 9702695
    Abstract: An object of the present invention is to provide an image processing apparatus that quickly and precisely measures or evaluates a distortion in a field of view and a charged particle beam apparatus. To attain the object, an image processing apparatus or the like is proposed which acquires a first image of a first area of an imaging target and a second image of a second area that is located at a different position than the first area and partially overlaps with the first area and determines the distance between a measurement point in the second image and a second part of the second image that corresponds to a particular area for a plurality of sites in the overlapping area of the first image and the second image.
    Type: Grant
    Filed: May 25, 2011
    Date of Patent: July 11, 2017
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Hiroki Kawada, Osamu Inoue, Miyako Matsui, Takahiro Kawasaki, Naoshi Itabashi, Takashi Takahama, Katsumi Setoguchi, Osamu Komuro
  • Patent number: 9651207
    Abstract: An oxychloride phosphor of the present disclosure includes divalent Eu arranged as an augmenting agent, at part of locations. The locations correspond to site of at least two kinds of predetermined substances included in a host crystal. A rate of the number of the divalent Eu with respect to the sum of the number of moles of the predetermined substance and the number of moles of the divalent Eu is less than 2%. When the predetermined substance is represented by A, the oxychloride phosphor is represented by a general formula of xAO.yEuO.SiO2.zCl. In this formula, A represents Sr and Ca, or Sr, Ca, and Mg, y indicates a value of not less than 0.002 and not more than 0.02, x+y indicates a value of more than 1.00 and not more than 1.30, and z indicates a value of not less than 0.20 and not more than 0.70.
    Type: Grant
    Filed: November 21, 2014
    Date of Patent: May 16, 2017
    Assignee: Panasonic Intellectual Property Management Co., Ltd.
    Inventors: Kojiro Okuyama, Mitsuru Nitta, Osamu Inoue, Seigo Shiraishi
  • Patent number: 9644142
    Abstract: A red phosphor material includes an essential component represented by a formula of A2-2xRxEuySmzLnx-y-zM2O8 as a main component, where A represents at least one selected from Ca and Sr; R represents at least one selected from Li, Na, and K; Ln represents at least one selected from La, Gd, and Y; M represents at least one selected from W and Mo; and x, y, and z are numerical values that satisfy 0.2?x?0.7, 0.2?y+z?0.6, 0.005?z?0.04, and x?y?z?0. A light-emitting device includes an excitation light source and the red phosphor material that absorbs excitation light emitted by the excitation light source and emits red light.
    Type: Grant
    Filed: April 17, 2015
    Date of Patent: May 9, 2017
    Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventors: Osamu Inoue, Kojiro Okuyama, Mitsuru Nitta, Seigo Shiraishi
  • Publication number: 20170047197
    Abstract: For scanning electron beams and measuring overlay misalignment between an upper layer pattern and a lower layer pattern with high precision, electron beams are scanned over a region including a first pattern and a second pattern of a sample, the sample having the lower layer pattern (the first pattern) and the upper layer pattern (the second pattern) formed in a step after a step of forming the first pattern. The electron beams are scanned such that scan directions and scan sequences of the electron beams become axial symmetrical or point-symmetrical in a plurality of pattern position measurement regions defined within the scan region for the electron beams, thereby reducing measurement errors resulting from the asymmetry of electric charge.
    Type: Application
    Filed: April 21, 2015
    Publication date: February 16, 2017
    Inventors: Shoji HOTTA, Hiroki KAWADA, Osamu INOUE
  • Publication number: 20170040230
    Abstract: Provided is a charged particle beam device which can specify a position of an initial core with high accuracy even when fine line and space patterns are formed by an SADP in plural times. The charged particle beam device includes a detector (810) which detects secondary charged particles discharged from a sample (807) when a charged particle beam is emitted to the sample having a plurality of patterns of line shape, a display unit (817) which displays image data of a surface of the sample on the basis of a signal of the secondary charged particles, a calculation unit (812) which calculates an LER value with respect to the plurality of the patterns of line shape from the image data, and a determination unit (816) which compares the values to determine a position of the initial core.
    Type: Application
    Filed: March 31, 2015
    Publication date: February 9, 2017
    Inventors: Atsuko Yamaguchi, Osamu Inoue, Hiroki Kawada
  • Patent number: 9518220
    Abstract: A red phosphor material comprising an essential component represented by a formula of ALn1-x-yEuxSmyM2O8 as a main component, where A represents at least one selected from Li, Na, and K; Ln represents at least one selected from La and Gd; M represents at least one selected from W and Mo; and x and y are numerical values that satisfy 0.1?x+y?0.7 and 0.005?y?0.08. A light-emitting device includes an excitation light source and the red phosphor material that absorbs excitation light emitted by the excitation light source and emits red light.
    Type: Grant
    Filed: April 17, 2015
    Date of Patent: December 13, 2016
    Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventors: Osamu Inoue, Kojiro Okuyama, Mitsuru Nitta, Seigo Shiraishi
  • Patent number: 9514528
    Abstract: Image processing apparatus includes: interpolation process image acquisition means for acquiring an interpolation process image of prescribed size which includes an interpolation point of an inputted image; Fourier transform means for subjecting the interpolation process image which is acquired with the interpolation process image acquisition means to Fourier transform; phase change means for changing, a phase of each value of the transformed interpolation process image which has been subjected to Fourier transform by the Fourier transform means, such that the interpolation point migrates to a desired nearby integer coordinate position; inverse Fourier transform means for subjecting the interpolation process image whose phase has been changed by the phase change means, to inverse Fourier transform; interpolation value determination means for adopting an interpolation point, a value of a pixel at the integer coordinate position, from the transformed interpolation process image subjected to inverse Fourier tran
    Type: Grant
    Filed: October 3, 2012
    Date of Patent: December 6, 2016
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Junichi Taguchi, Mitsuji Ikeda, Yuichi Abe, Osamu Inoue, Takahiro Kawasaki
  • Patent number: 9416313
    Abstract: The present invention provides an oxynitride silicate fluorescent substance capable of output a light having a high luminance even when irradiated by an exciting light having a high energy density. The present invention is a yellow fluorescent substance represented by a chemical formula (Ba1-x-y-z,Srx)aSibOcNd:Eu2+y,Y3+z (0.9?a?1.1, 1.9?b?2.1, 1.9?c?2.1, 1.9?d?2.1, 0?x?1, 0<y<0.01, and 0?z<0.01).
    Type: Grant
    Filed: August 15, 2014
    Date of Patent: August 16, 2016
    Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventors: Mitsuru Nitta, Seigo Shiraishi, Osamu Inoue, Kojiro Okuyama, Yoshihisa Nagasaki, Takashi Ohbayashi
  • Patent number: 9376617
    Abstract: A fluorescent material according to an aspect of the present disclosure mainly comprises a compound represented by AB0.5-w-x-y-zCwEuxSmyLnzW0.5O3. A is one or more elements selected from the group consisting of alkaline earth metals and mainly contains Ca. B is one or more elements selected from the group consisting of divalent metals and mainly contains Mg. C is one or more elements selected from the group consisting of alkali metals and mainly contains Li, Na, or Li and Na. Ln is one or more elements selected from the group consisting of rare earth elements excluding Eu and Sm. w, x, y, and z meet the following conditions: 0.05?w?0.25, 0.05?x+y?0.25, 0.0?y?0.02, and w=x+y+z.
    Type: Grant
    Filed: September 15, 2015
    Date of Patent: June 28, 2016
    Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventors: Osamu Inoue, Kojiro Okuyama, Mitsuru Nitta, Seigo Shiraishi
  • Patent number: 9328877
    Abstract: The present disclosure provides a (Ba1?z,Srz)3MgSi2O8:Eu2+ based phosphor with high emission quantum efficiency. Specifically, the present disclosure provides a blue light emitting phosphor including: a (Ba1?z,Srz)3MgSi2O8 based crystal where z satisfies 0?z<1 and a (Ba1?z,Srz)MgSiO4 based crystal where z satisfies 0?z<1 as a host crystal; and Eu2+ as a luminescent center.
    Type: Grant
    Filed: June 9, 2014
    Date of Patent: May 3, 2016
    Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventors: Mitsuru Nitta, Seigo Shiraishi, Osamu Inoue, Kojiro Okuyama, Yoshihisa Nagasaki, Takashi Ohbayashi
  • Publication number: 20160115386
    Abstract: A fluorescent material according to an aspect of the present disclosure mainly comprises a compound represented by AB0.5-w-x-y-zCwEuxSmyLnzW0.5O3. A is one or more elements selected from the group consisting of alkaline earth metals and mainly contains Ca. B is one or more elements selected from the group consisting of divalent metals and mainly contains Mg. C is one or more elements selected from the group consisting of alkali metals and mainly contains Li, Na, or Li and Na. Ln is one or more elements selected from the group consisting of rare earth elements excluding Eu and Sm. w, x, y, and z meet the following conditions: 0.05?w?0.25, 0.05?x+y?0.25, 0.0?y?0.02, and w=x+y+z.
    Type: Application
    Filed: September 15, 2015
    Publication date: April 28, 2016
    Inventors: OSAMU INOUE, KOJIRO OKUYAMA, MITSURU NITTA, SEIGO SHIRAISHI
  • Patent number: 9206531
    Abstract: A method for producing an amylose-containing rayon fiber, comprising the steps of: mixing an aqueous alkaline solution of amylose with viscose to obtain a mixed liquid, spinning the mixed liquid to obtain an amylose-containing rayon fiber, and bringing the amylose-containing rayon fiber into contact with iodine or polyiodide ions, thereby allowing an amylose in the amylose-containing rayon fiber to make a clathrate including the iodine or polyiodide ions, wherein the amylose is an enzymatically synthesized amylose having a weight average molecular weight of 3×104 or more and 2×105 or less. A method for collecting iodine from brackish water with high efficiency utilizing the amylase-containing rayon fibers.
    Type: Grant
    Filed: June 17, 2010
    Date of Patent: December 8, 2015
    Assignees: Kanto Natural Gas Development Co., Ltd., Omikenshi Co., Ltd., Ezaki Glico Co., Ltd.
    Inventors: Osamu Inoue, Masatoshi Yoshikawa, Mieko Takaku, Tatsuo Kaiho, Mitsuru Taguchi, Haruyo Sambe, Yoshinobu Terada, Takeshi Takaha
  • Publication number: 20150285627
    Abstract: The purpose of the present invention is to provide an overlay error measuring device which measures an overlay error with high accuracy even when a lower layer pattern is disposed under a thin film and a sufficient signal amount cannot be ensured. The present invention proposes an overlay error measuring device provided with an arithmetic processing unit for measuring a pattern formed on a sample on the basis of a signal waveform obtained by a charged particle beam device. The arithmetic processing unit finds a correlation with the signal waveform using a partial waveform obtained on the basis of partial extraction of the signal waveform, forms a correlation profile indicating the correlation, and measures an overlay error using the correlation profile.
    Type: Application
    Filed: June 5, 2013
    Publication date: October 8, 2015
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Satoru Yamaguchi, Kei Sakai, Osamu Inoue, Kazuyuki Hirao, Osamu Komuro
  • Patent number: 9142733
    Abstract: A light source device is provided. The light source device comprises a semiconductor light-emitting element; and a wavelength conversion member for converting a wavelength of a light emitted from the semiconductor light-emitting element. The semiconductor light-emitting element has a light-emitting peak wavelength of not less than 380 nanometers and not more than 420 nanometers. The light emitted from the semiconductor light-emitting element has a light energy density of not less than 0.2 kW/cm2. The wavelength conversion member contains at least one fluorescent substance selected from the group consisting of a (Sr1-x,Bax)3MgSi2O8:Eu2+ (0?x?1) fluorescent substance, a (Y1-y,Gdy)3(Al1-z,Gaz)5O12:Ce3+ (0?y?1, 0?z?1) fluorescent substance, and an Eu3+-activated fluorescent substance. The light source device has a high output and a high light-emitting efficiency.
    Type: Grant
    Filed: July 18, 2014
    Date of Patent: September 22, 2015
    Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventors: Yoshihisa Nagasaki, Takashi Ohbayashi, Osamu Inoue, Kojiro Okuyama, Mitsuru Nitta, Seigo Shiraishi