Abstract: A lithographic system comprises a radiation source and a lithographic apparatus. The radiation source provides radiation to the lithographic apparatus. The lithographic apparatus uses the radiation for imaging a pattern onto multiple target areas on a layer of photo-resist on a semiconductor substrate. The imaging requires a pre-determined dose of radiation. The system is controlled so as to set a level of a power of the radiation in dependence on a magnitude of the pre-determined dose.

Abstract: A faceted reflector (32, 32?) for receiving an incident radiation beam (2) and directing a reflected radiation beam at a target. The faceted reflector comprises a plurality of facets, each of the plurality of facets comprising a reflective surface. The reflective surfaces of each of a first subset of the plurality of facets define respective parts of a first continuous surface and are arranged to reflect respective first portions of the incident radiation beam in a first direction to provide a first portion of the reflected radiation beam. The reflective surfaces of each of a second subset of the plurality of facets define respective parts of a second continuous surface and are arranged to reflect respective second portions of the incident radiation beam in a second direction to provide a second portion of the reflected radiation beam.

Abstract: A radiation source includes a nozzle configured to direct a stream of fuel droplets along a droplet path towards a plasma formation location, and is configured to receive a gaussian radiation beam having gaussian intensity distribution, having a predetermined wavelength and propagating along a predetermined trajectory, and further configured to focus the radiation beam on a fuel droplet at the plasma formation location. The radiation source includes a phase plate structure including one or more phase plates. The phase plate structure has a first zone and a second zone. The zones are arranged such that radiation having the predetermined wavelength passing through the first zone and radiation having the predetermined wavelength passing through the second zone propagate along respective optical paths having different optical path lengths. A difference between the optical path lengths is an odd number of times half the predetermined wavelength.

Abstract: A faceted reflector (32, 32?) for receiving an incident radiation beam (2) and directing a reflected radiation beam at a target. The faceted reflector comprises a plurality of facets, each of the plurality of facets comprising a reflective surface. The reflective surfaces of each of a first subset of the plurality of facets define respective parts of a first continuous surface and are arranged to reflect respective first portions of the incident radiation beam in a first direction to provide a first portion of the reflected radiation beam. The reflective surfaces of each of a second subset of the plurality of facets define respective parts of a second continuous surface and are arranged to reflect respective second portions of the incident radiation beam in a second direction to provide a second portion of the reflected radiation beam.

Abstract: A radiation source includes a nozzle configured to direct a stream of fuel droplets along a droplet path towards a plasma formation location, and is configured to receive a gaussian radiation beam having gaussian intensity distribution, having a predetermined wavelength and propagating along a predetermined trajectory, and further configured to focus the radiation beam on a fuel droplet at the plasma formation location. The radiation source includes a phase plate structure including one or more phase plates. The phase plate structure has a first zone and a second zone. The zones are arranged such that radiation having the predetermined wavelength passing through the first zone and radiation having the predetermined wavelength passing through the second zone propagate along respective optical paths having different optical path lengths. A difference between the optical path lengths is an odd number of times half the predetermined wavelength.

Abstract: A beam modifying unit increases both temporal pulse length and Etendue of an illumination beam. The pulse modifying unit receives an input pulse of radiation and emits one or more corresponding output pulses of radiation. A beam splitter divides the incoming pulse into a first and a second pulse portion, and directs the first pulse portion along a second optical path and the second portion along a first optical path as a portion of an output beam. The second optical path includes a divergence optical element. A first and a second mirror, each with a radius of curvature, are disposed facing each other with a predetermined separation, and receive the second pulse portion to redirect the second portion, such that the optical path of the second portion through the pulse modifier is longer than that of the first portion, and the separation is less than radius of curvature.

Abstract: Apparatus and methods are used to control a polarization state of a radiation beam. A polarization control unit is configured to modulate a polarization state of at least a part of a radiation beam. A determination arrangement is configured to subsequently determine the polarization state of the at least a part of the radiation beam. A feedback unit is configured to provide signals to the polarization control arrangement based on at least the determined polarization state in order to correct for deviation in the polarization state of the part of the radiation beam from a desired polarization state. For example, the correction may ensure that the polarization state of the part of the radiation beam is at, or returns to, the desired polarization state.

Abstract: A beam modifying unit increases both temporal pulse length and Etendue of an illumination beam. The pulse modifying unit receives an input pulse of radiation and emits one or more corresponding output pulses of radiation. A beam splitter divides the incoming pulse into a first and a second pulse portion, and directs the first pulse portion along a second optical path and the second portion along a first optical path as a portion of an output beam. The second optical path includes a divergence optical element. A first and a second mirror, each with a radius of curvature, are disposed facing each other with a predetermined separation, and receive the second pulse portion to redirect the second portion, such that the optical path of the second portion through the pulse modifier is longer than that of the first portion, and the separation is less than radius of curvature.

Abstract: A beam modifying unit increases both temporal pulse length and Etendue of an illumination beam. The pulse modifying unit receives an input pulse of radiation and emits one or more corresponding output pulses of radiation. A beam splitter divides the incoming pulse into a first and a second pulse portion, and directs the first pulse portion along a second optical path and the second portion along a first optical path as a portion of an output beam. The second optical path includes a divergence optical element. A first and a second mirror, each with a radius of curvature, are disposed facing each other with a predetermined separation, and receive the second pulse portion to redirect the second portion, such that the optical path of the second portion through the pulse modifier is longer than that of the first portion, and the separation is less than radius of curvature.

Abstract: An illuminator for a lithographic apparatus includes a first illuminator channel, a second illuminator channel, a first switch device, an additional illuminator part and a second switch device. Each of the first and the second illuminator channel includes elements which are adjustable to provide a radiation beam with at least one desired property. The first switch device is configured to receive the radiation beam and arranged to direct the radiation beam between the first and second illuminator channels. The second switch device is arranged to receive the radiation beam from the first and second illuminator channels and direct the radiation beam through the additional illuminator part. The additional illuminator part includes elements which apply at least one additional desired property to the radiation beam.

Abstract: A system and method provides high speed variable attenuators. The attenuators can be used within a lithographic apparatus to control intensity of radiation in one or more correction pulses used to correct a dose of the radiation following an initial pulse of radiation.

Abstract: A system is used to perform fast and slow applications, for example fast application can be pulse trimming. The system includes a radiation source, an electro-optical modulator, and a beam splitter. The radiation source is configured to generate a polarized beam of radiation. The electro-optical modulator, formed of crystalline quartz, is configured to modulate the beam of radiation. The beam splitter is configured to direct a first portion of the beam to a beam dump and to form an output beam from a second portion of the beam.

Abstract: A system is used to perform fast and slow applications, for example fast application can be pulse trimming. The system includes a radiation source, an electro-optical modulator, and a beam splitter. The radiation source is configured to generate a polarized beam of radiation. The electro-optical modulator, formed of crystalline quartz, is configured to modulate the beam of radiation. The beam splitter is configured to direct a first portion of the beam to a beam dump and to form an output beam from a second portion of the beam.

Abstract: A system and method provides high speed variable attenuators. The attenuators can be used within a lithographic apparatus to control intensity of radiation in one or more correction pulses used to correct a dose of the radiation following an initial pulse of radiation.

Abstract: A lithographic apparatus includes a masking device that includes a first masking part configured to obscure a first part of a first patterning device before the pattern of the first patterning device is impinged by a radiation beam, a second masking part having an adjustable length, the second masking part configured to obscure a second part of the first patterning device after the pattern of the first patterning device is impinged by the radiation beam and to obscure a first part of a second patterning device before the pattern of the second patterning device is impinged by the radiation beam, and a third masking part configured to obscure a second part of the second patterning device after the pattern of the second patterning device is impinged by the radiation beam.

Abstract: A system for controlling the energy of radiation pulses. A detector monitors energy of the pulses and an optical shutter trims the radiation pulses after a suitable optical delay line. The accuracy of the control of the energy of the radiation pulses can be improved by matching a rate of response of the radiation detector to a rate of response of the optical shutter.

Abstract: Apparatus and methods are used to control a polarization state of a radiation beam. A polarization control unit is configured to modulate a polarization state of at least a part of a radiation beam. A determination arrangement is configured to subsequently determine the polarization state of the at least a part of the radiation beam. A feedback unit is configured to provide signals to the polarization control arrangement based on at least the determined polarization state in order to correct for deviation in the polarization state of the part of the radiation beam from a desired polarization state. For example, the correction may ensure that the polarization state of the part of the radiation beam is at, or returns to, the desired polarization state.

Abstract: A system is used to substantially reduce divergence of a beam traveling between master and power oscillators, for example in a laser beam source. The system comprises the first and second oscillators and a beam conditioning device. The first oscillator is configured to generate a radiation beam. The beam conditioning device is configured to stabilize a position, a direction, a size, or a divergence of the radiation beam to produce a conditioned beam. The second oscillator configured to amplify the conditioned beam to produce an amplified beam.

Abstract: A system and method provides high speed variable attenuators. The attenuators can be used within a lithographic apparatus to control intensity of radiation in one or more correction pulses used to correct a dose of the radiation following an initial pulse of radiation.

Abstract: A system is used to perform fast and slow applications, for example fast application can be pulse trimming. The system includes a radiation source, an electro-optical modulator, and a beam splitter. The radiation source is configured to generate a polarized beam of radiation. The electro-optical modulator, formed of crystalline quartz, is configured to modulate the beam of radiation. The beam splitter is configured to direct a first portion of the beam to a beam dump and to form an output beam from a second portion of the beam.