Patents by Inventor Osman Levent Eryilmaz

Osman Levent Eryilmaz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6548173
    Abstract: A method and article of manufacture of amorphous diamond-like carbon. The method involves providing a substrate in a chamber, providing a mixture of a carbon containing gas and hydrogen gas with the mixture adjusted such that the atomic molar ratio of carbon to hydrogen is less than 0.3, including all carbon atoms and all hydrogen atoms in the mixture. A plasma is formed of the mixture and the amorphous diamond-like carbon film is deposited on the substrate. To achieve optimum bonding an intervening bonding layer, such as Si or SiO2, can be formed from SiH4 with or without oxidation of the layer formed.
    Type: Grant
    Filed: March 14, 2001
    Date of Patent: April 15, 2003
    Assignee: Argonne National Laboratory
    Inventors: Ali Erdemir, George R. Fenske, Osman Levent Eryilmaz, Richard H. Lee
  • Publication number: 20020041930
    Abstract: A method and article of manufacture of amorphous diamond-like carbon. The method involves providing a substrate in a chamber, providing a mixture of a carbon containing gas and hydrogen gas with the mixture adjusted such that the atomic molar ratio of carbon to hydrogen is less than 0.3, including all carbon atoms and all hydrogen atoms in the mixture. A plasma is formed of the mixture and the amorphous diamond-like carbon film is deposited on the substrate. To achieve optimum bonding an intervening bonding layer, such as Si or SiO2, can be formed from SiH4 with or without oxidation of the layer formed.
    Type: Application
    Filed: March 14, 2001
    Publication date: April 11, 2002
    Inventors: Ali Erdemir, George R. Fenske, Osman Levent Eryilmaz, Richard H. Lee