Abstract: A sputtering target comprising a substrate and a target material formed on the substrate, wherein the target material comprises a metal oxide of the chemical formula MOx as the main component, wherein MOx is a metal oxide which is deficient in oxygen as compared with the stoichiometric composition, and M is at least one metal selected from the group consisting of Ti, Nb, Ta, Mo, W, Zr and Hf, a process for its production, and a method for forming a film having a high refractive index.

Abstract: A sputtering target comprising a substrate and a target material formed on the substrate, wherein the target material comprises a metal oxide of the chemical formula MOx as the main component, wherein MOx is a metal oxide which is deficient in oxygen as compared with the stoichiometric composition, and M is at least one metal selected from the group consisting of Ti, Nb, Ta, Mo, W, Zr and Hf, a process for its production, and a method for forming a film having a high refractive index.

Abstract: A sputtering target comprising a substrate and a target material formed on the substrate, wherein the target material comprises a metal oxide of the chemical formula MOx as the main component, wherein MOx is a metal oxide which is deficient in oxygen as compared with the stoichiometric composition, and M is at least one metal selected from the group consisting of Ti, Nb, Ta, Mo, W, Zr and Hf, a process for its production, and a method for forming a film having a high refractive index.

Abstract: A sputtering target comprising a substrate and a target material formed on the substrate, wherein the target material comprises a metal oxide of the chemical formula MOx as the main component, wherein MOx is a metal oxide which is deficient in oxygen as compared with the stoichiometric composition, and M is at least one metal selected from the group consisting of Ti, Nb, Ta, Mo, W, Zr and Hf, a process for its production, and a method for forming a film having a high refractive index.

Abstract: A sputtering target comprising a substrate and a target material formed on the substrate, wherein the target material comprises a metal oxide of the chemical formula MOx as the main component, wherein MOx is a metal oxide which is deficient in oxygen as compared with the stoichiometric composition, and M is at least one metal selected from the group consisting of Ti, Nb, Ta, Mo, W, Zr and Hf, a process for its production, and a method for forming a film having a high refractive index.

Abstract: A sputtering target comprising a substrate and a target material formed on the substrate, wherein the target material comprises a metal oxide of the chemical formula MOx as the main component, wherein MOx is a metal oxide which is deficient in oxygen as compared with the stoichiometric composition, and M is at least one metal selected from the group consisting of Ti, Nb, Ta, Mo, W Zr and Hf, a process for its production, and a method for forming a film having a high refractive index.

Abstract: A sputtering target comprising a substrate and a target material formed on the substrate, wherein the target material comprises a metal oxide of the chemical formula MOx as the main component, wherein MOx is a metal oxide which is deficient in oxygen as compared with the stoichiometric composition, and M is at least one metal selected from the group consisting of Ti, Nb, Ta, Mo, W, Zr and Hf, a process for its production, and a method for forming a film having a high refractive index.

Abstract: A monolithic refractory composition, which can be rapidly dried after being mixed with water and applied to a desired portion by casting or spraying to form a furnace wall, and which comprises refractory aggregates, a refractory powder, an aluminum alloy powder and a dispersant, wherein the aluminum alloy powder is contained in an amount of from 0.04 to 5 parts by weight per 100 parts by weight of the total amount of the refractory aggregates and the refractory powder.

Abstract: A monolithic refractory composition, which can be rapidly dried after being mixed with water and applied to a desired portion by casting or spraying to form a furnace wall, and which comprises refractory aggregates, a refractory powder, an aluminum alloy powder and a dispersant, wherein the aluminum alloy powder is contained in an amount of from 0.04 to 5 parts by weight per 100 parts by weight of the total amount of the refractory aggregates and the refractory powder.

Abstract: An electrification removing component comprising:a ceramics for removing electrification of which surface resistivity is in a range of 2.times.10.sup.6 through 10.sup.10 .OMEGA./cm.sup.2 ; and an electric conductive material connected to the ground; said ceramics for removing electrification being electrically connected to the electric conductive material with an area by contact or bonding on surfaces of the ceramics for removing electrification and the electric conductive material.

Abstract: A flat cathode-ray tube in which a ceramics film or a glass film is formed by thermal spray on the coupled surface of a metal case. This assembly and a glass screen are coupled through crystallized frit glass or by glass fusion. The coupling between the metal case and the glass screen has a coupling strength sufficient to resist the vacuum stress. The metal case, which is not exposed for a long time to high temperatures during thermal spraying, can be made of a metal for realizing a lightweight without any thermal deformation or dimensional variations, thereby attaining satisfactory mechanical properties.

Abstract: High zirconia fused cast refractories which include as chemical components of refractories in weight %, 85 through 91% of ZrO.sub.2, 7.0 through 11.2% of SiO.sub.2, 0.85 through 3.0% of Al.sub.2 O.sub.3, 0.05 through 1.0% of P.sub.2 O.sub.5, 0.05 through 1.0% of B.sub.2 O.sub.3 and 0.01 through 0.12% of a summed amount of K.sub.2 O and Na.sub.2 O, wherein the weight % of K.sub.2 O is not smaller than the weight % of Na.sub.2 O.

Abstract: A ceramics rotatable magnetron sputtering cathode target comprising a cylindrical target holder and a ceramics layer as a target to be sputtered, formed on the outer surface of the target holder, wherein at least one layer selected from the group consisting of a layer of a metal or alloy having a thermal expansion coefficient of an intermediate level between the thermal expansion coefficients of the ceramics layer and the target holder, and a layer of a metal or alloy having a thermal expansion coefficient approximating to the thermal expansion coefficient of the ceramics layer, is formed as an undercoat between the ceramics layer and the target holder.

Abstract: A high zirconia fused cast refractory which comprises from 90 to 95% by weight of ZrO.sub.2, from 3.5 to 7% by weight of SiO.sub.2, from 1.2 to 3% by weight of Al.sub.2 O.sub.3 and from 0.1 to 0.35% by weight in a total amount of Na.sub.2 O and/or K.sub.2 O, and which does not substantially contain any one of P.sub.2 O.sub.5, B.sub.2 O.sub.3 and CuO.

Abstract: A thermocouple temperature sensor employs a protecting tube made of metal-boride-based ceramics, and a platinum -rhodium-based thermocouple. To prevent a deterioration of the thermocouple due to a reducing gas generated in the protecting when used at a high service temperature, the thermocouple is placed in an insulation tube, which is placed inside the protecting tube. In addition, a front end portion of the insulation tube is covered with a noble-metal cap mainly composed of platinum group metal, to prevent the reducing gas generated in the protecting tube from reaching a connection point of the thermocouple. The top end of the protecting tube is open, and a terminal box with a ventilation means to smoothly discharge the reducing gas in provided. This arrangement remarkably prolongs the service life of the thermocouple, and thus it is able to continuously measure the temperature of molten pig iron and molten steel for a long interval.

Abstract: The service life of a bottom electrode for a direct current arc furnace for producing steel is prolonged by using ZrB.sub.2 type sintered bodies for a contacting pins which constitutes a major part of the bottom electrode wherein the ZrB.sub.2 type sintered bodies have a corrosion-resistance to molten steel and slag. Further, the number of contacting pins to be used is reduced by forming each of the pins into a form of pillar with a through hole at the axis, or by assembling a plurality of longitudinally divided pin portions to form a contacting pin, whereby the diameter of the contacting pin can be made large. Then the space between contacting pins is made broad, and brick having good corrosion-resistance are filled in the space so that the service life of the bottom electrode is brought closer to that of the refractory lining of the direct current arc furnace.

Abstract: A ZrB.sub.2 composite sintered material consisting essentially of at least 1% by weight of SiC, at least 1% by weight of BN, at most 20% by weight of AlN, at most 20% by weight of B.sub.4 C, the rest being substantially ZrB.sub.2, provided that the total amount of SiC and BN is from 2 to 50% by weight.

Abstract: A ZrB.sub.2 composite sintered material consisting essentially of at least 1% by weight of SiC, at least 1% by weight of BN, at most 20% by weight of AlN, at most 20% by weight of B.sub.4 C, the rest being substantially ZrB.sub.2, provided that the total amount of SiC and BN is from 2 to 50% by weight.

Abstract: A ZrB.sub.2 composite sintered material consisting essentially of at least 1% by weight of SiC, at least 1% by weight of B.sub.4 C, at most 15% by weight of TiC, at most 35% by weight of TiN, at most 40% by weight of AlN, the rest being substantially ZrB.sub.2, provided that the total amount of SiC and B.sub.4 C is from 2 to 50% by weight.