Patents by Inventor Palaiyur S. Kalyanaraman

Palaiyur S. Kalyanaraman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5232757
    Abstract: This invention provides a superior process for optical information storage by providing a mixture of azaannulene compounds in the recording layer. The recording layer exhibits large positive contrast in the recorded areas upon recording with laser radiation. The positive contrast is surprisingly larger than the positive contrasts exhibited by recording layers made from the individual azaannulenes included in the mixture, and because of this large positive contrast the sensitivity of the medium is high and consequently low laser powers are sufficient to effect the recording.
    Type: Grant
    Filed: December 6, 1991
    Date of Patent: August 3, 1993
    Assignee: Hoechst Celanese Corp.
    Inventors: Palaiyur S. Kalyanaraman, Harris A. Goldberg, Rachel S. Kohn
  • Patent number: 5139837
    Abstract: Provided is an optical information medium comprised of an organic information layer and a resinous continuous film overcoat layer which is coated over said organic information layer. The resinous overcoat layer is no thicker than, and most preferably thinner than said information layer, and is of a thickness of about 100 angstroms or less. It is most preferred that the overcoat layer is comprised of a water soluble polymer. The resulting optical information medium advantageously exhibits an extremely sharp threshold for marking, as well as improved carrier to noise ratio.
    Type: Grant
    Filed: March 8, 1990
    Date of Patent: August 18, 1992
    Assignee: Hoechst Celanese Corp.
    Inventors: Palaiyur S. Kalyanaraman, Harris A. Goldberg, Frank J. Onorato
  • Patent number: 5053323
    Abstract: Provided is an optical information medium containing an information layer comprised of a 1-phenyl substituted naphthalocyanine. Also provided is a method for easily synthesizing the naphthalocyanine chromophore used in the information layer. The use of such naphthalocyanine chromophores in the information layer of an optical information medium provides one with many advantages. In the manufacture of the medium, these advantages arise due to the increased solubility exhibited by the chromophore in conventional organic solvents. As well, the chromophores exhibit excellent and unique optical properties useful in the recording of optical information.
    Type: Grant
    Filed: February 27, 1990
    Date of Patent: October 1, 1991
    Inventors: James P. Shepherd, Palaiyur S. Kalyanaraman
  • Patent number: 5023167
    Abstract: Provided is an optical information card having a particular structure. The card is comprised of four different layers, i.e., a card substrate, a recording layer which is formed on one side of the card substrate and which comprises a naphthalocyanine compound, a polyvinyl alcohol coating directly over the information layer, and a transparent protective layer over the polyvinyl alcohol layer. This structure offers a very sensitive and useful optical information card which can be easily manufactured while maintaining the integrity of the information layer, and which permits one to realize the advantage of using a naphthalocyanine information layer in a card format.
    Type: Grant
    Filed: March 8, 1990
    Date of Patent: June 11, 1991
    Assignee: Hoechst Celanese Corp.
    Inventors: Palaiyur S. Kalyanaraman, Frank J. Onorato
  • Patent number: 5021511
    Abstract: Novel polymers are prepared from at least one cyanoacetamide monomer having the formula: ##STR1## where R.sub.1 is --CH.sub.3, --(CH.sub.2).sub.m CH.sub.3 or --H; R.sub.2 and R.sub.3 independently are --H, (C.sub.1 -C.sub.4) alkyl or aryl; R.sub.4 is --CH.sub.3, --(CH.sub.2).sub.n CH.sub.3 or --H; m is 1 to 10; n is 1 to 10; and x is 1 to 20.These polymers can be readily reacted by a carbon-Michael addition reaction with carbon-Michael acceptors, such as polyfunctional acrylates, methacrylates, fumarates, maleates and aopates to form crosslinked polymer compositions.
    Type: Grant
    Filed: December 27, 1988
    Date of Patent: June 4, 1991
    Assignee: Rohm and Haas Company
    Inventors: Gary R. Larson, William D. Emmons, Palaiyur S. Kalyanaraman
  • Patent number: 4997744
    Abstract: Provided is a process and solvent solution for coating an aza-annulene chromophore containing film directly onto a polycarbonate or polymethylmethacrylate comprising base. In the process, a solution of the chromophore, e.g., phthalocyanine, porphyrin or naphthalocynine, is cast directly onto the polycarbonate or polymethylmethacrylate base, with the solvent used in formulating the solution comprising a C.sub.5 -C.sub.7 cyclic alcohol, or a mixture of solvents including at least one of the aforementioned alcohols. The solvent is then removed, preferably by evaporation, in order to yield a smooth, homogeneous chromophore containing film directly on the polycarbonate or polymethylmethacrylate comprising base.
    Type: Grant
    Filed: December 21, 1988
    Date of Patent: March 5, 1991
    Assignee: Hoechst Celanese Corp.
    Inventors: Palaiyur S. Kalyanaraman, David E. Nikles
  • Patent number: 4977068
    Abstract: Provided is a novel aromatic ether capped naphthalocyanine compound containing a central hetero atom having a siloxy group substituent off of said hetero atom, with said siloxy substituent having the formula--OSiR.sub.1 R.sub.2 --ZArwhereinR.sub.1 and R.sub.2 can be the same or different, and can be alkyl having from 1 to about 18 carbons; aryl having from 6 to 10 carbons; cycloalkyl having at least 4 carbons or alkoxy having at least 3 carbons,Z is O or S, andAr is an aromatic moiety.Also provided is a process for preparing a naphthalocyanine compound containing a central hetero atom having a siloxy group substituent off of said hetero atom, with said siloxy group containing a terminal ether function, which process comprises reacting in the presence of a nucleophile in a moisture free environment(i) a naphthalocyanine dihydroxy compound,(ii) a compound of the formula SiR.sub.1 R.sub.2 L.sub.2, wherein R.sub.1 and R.sub.
    Type: Grant
    Filed: March 9, 1990
    Date of Patent: December 11, 1990
    Assignee: Hoechst Celanese Corp.
    Inventor: Palaiyur S. Kalyanaraman
  • Patent number: 4929537
    Abstract: Negative photoresist compositions are made from copolymers of 4-hydroxystyrene and dialkyl muconates, alkyl sorbates, alkadiene monomers or allyl esters of ethylenically unsaturated acids plus a photosensitizer. Such compositions are useful in photolithographic and photomasking operations in fabricating microelectronic devices, printed circuits, semiconductors, printing plates, dies and the like.
    Type: Grant
    Filed: July 27, 1989
    Date of Patent: May 29, 1990
    Assignee: Hoechst Celanese Corp.
    Inventors: Balaram Gupta, Palaiyur S. Kalyanaraman
  • Patent number: 4854676
    Abstract: In one embodiment this invention provides a bistable optical device comprising a Fabry-Perot etalon which has an optical cavity containing a naphthalocyanine dye medium as a nonlinear optical component.
    Type: Grant
    Filed: April 19, 1988
    Date of Patent: August 8, 1989
    Assignee: Hoechst Celanese Corp.
    Inventors: Palaiyur S. Kalyanaraman, Anthony F. Garito
  • Patent number: 4631249
    Abstract: This invention relates to negative photoresist systems containing thermally stable polyglutarimide polymers dissolved in suitable solvents. The negative resists are useful for producing high resolution images on surfaces by exposing the resist to a wide range of exposing radiation wavelengths and by subsequently developing the unexposed resist with an organic solvent or an aqueous base developer. The polyglutarimide polymers can be formulated so that they are partially soluble in an aqueous base, compatible with aqueous base soluble photosensitizers, and developable in aqueous base solutions, thereby eliminating the need for the use of any organic solvent.
    Type: Grant
    Filed: November 14, 1985
    Date of Patent: December 23, 1986
    Assignee: Rohm & Haas Company
    Inventor: Palaiyur S. Kalyanaraman
  • Patent number: 4569897
    Abstract: This invention relates to negative photoresist compositions containing thermally stable polyglutarimide polymers dissolved in suitable solvents. The negative resists are useful for producing high resolution images on surfaces by exposing the resist to a wide range of exposing radiation wavelengths and by subsequently developing the unexposed resist with an organic solvent or an aqueous base developer. The polyglutarimide polymers can be formulated so that they are partially soluble in an aqueous base, compatible with aqueous base soluble photosensitizers, and developable in aqueous base solutions, thereby eliminating the need for the use of any organic solvent.
    Type: Grant
    Filed: January 16, 1984
    Date of Patent: February 11, 1986
    Assignee: Rohm and Haas Company
    Inventor: Palaiyur S. Kalyanaraman
  • Patent number: 4503248
    Abstract: A class of polyamides comprising recurring units having substituted-quaterphenylene radicals is disclosed. The polymers comprise recurring units of the formula ##STR1## wherein each of A and B is a divalent radical, except that B can represent a single bond; R and R.sup.1 are each hydrogen, alkyl, aryl, alkaryl or aralkyl; and c is zero or one; and wherein, when c is one, at least one of A and B is a substituted-quaterphenylene radical having the formula ##STR2## where each U is a substituent other than hydrogen, each W is hydrogen or a substituent other than hydrogen, each p is an integer from 1 to 3, each X is hydrogen or a substituent other than hydrogen and each r is an integer from 1 to 4, the U, W.sub.p and X.sub.r substitution being sufficient to provide the radical with a non-coplanar molecular configuration; and wherein, when c is zero, A is a substituted-quaterphenylene radical as aforedescribed.
    Type: Grant
    Filed: May 27, 1983
    Date of Patent: March 5, 1985
    Assignee: Polaroid Corporation
    Inventors: Russell A. Gaudiana, Palaiyur S. Kalyanaraman
  • Patent number: 4393194
    Abstract: A class of polyamides comprising recurring units having substituted-quaterphenylene radicals is disclosed. The polymers comprise recurring units of the formula ##STR1## wherein each of A and B is a divalent radical, except that B can represent a single bond; R and R.sup.1 are each hydrogen, alkyl, aryl, alkaryl or aralkyl; and c is zero or one; and wherein, when c is one, at least one of A and B is a substituted-quaterphenylene radical having the formula ##STR2## where each U is a substituent other than hydrogen, each W is hydrogen or a substituent other than hydrogen, each p is an integer from 1 to 3, each X is hydrogen or a substituent other than hydrogen and each r is an integer from 1 to 4, the U, W.sub.p and X.sub.r substitution being sufficient to provide the radical with a non-coplanar molecular configuration; and wherein, when c is zero, A is a substituted-quaterphenylene radical as aforedescribed.
    Type: Grant
    Filed: March 2, 1981
    Date of Patent: July 12, 1983
    Assignee: Polaroid Corporation
    Inventors: Russell A. Gaudiana, Palaiyur S. Kalyanaraman