Patents by Inventor Palaiyur S. Kalyanaraman
Palaiyur S. Kalyanaraman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 5232757Abstract: This invention provides a superior process for optical information storage by providing a mixture of azaannulene compounds in the recording layer. The recording layer exhibits large positive contrast in the recorded areas upon recording with laser radiation. The positive contrast is surprisingly larger than the positive contrasts exhibited by recording layers made from the individual azaannulenes included in the mixture, and because of this large positive contrast the sensitivity of the medium is high and consequently low laser powers are sufficient to effect the recording.Type: GrantFiled: December 6, 1991Date of Patent: August 3, 1993Assignee: Hoechst Celanese Corp.Inventors: Palaiyur S. Kalyanaraman, Harris A. Goldberg, Rachel S. Kohn
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Patent number: 5139837Abstract: Provided is an optical information medium comprised of an organic information layer and a resinous continuous film overcoat layer which is coated over said organic information layer. The resinous overcoat layer is no thicker than, and most preferably thinner than said information layer, and is of a thickness of about 100 angstroms or less. It is most preferred that the overcoat layer is comprised of a water soluble polymer. The resulting optical information medium advantageously exhibits an extremely sharp threshold for marking, as well as improved carrier to noise ratio.Type: GrantFiled: March 8, 1990Date of Patent: August 18, 1992Assignee: Hoechst Celanese Corp.Inventors: Palaiyur S. Kalyanaraman, Harris A. Goldberg, Frank J. Onorato
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Patent number: 5053323Abstract: Provided is an optical information medium containing an information layer comprised of a 1-phenyl substituted naphthalocyanine. Also provided is a method for easily synthesizing the naphthalocyanine chromophore used in the information layer. The use of such naphthalocyanine chromophores in the information layer of an optical information medium provides one with many advantages. In the manufacture of the medium, these advantages arise due to the increased solubility exhibited by the chromophore in conventional organic solvents. As well, the chromophores exhibit excellent and unique optical properties useful in the recording of optical information.Type: GrantFiled: February 27, 1990Date of Patent: October 1, 1991Inventors: James P. Shepherd, Palaiyur S. Kalyanaraman
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Patent number: 5023167Abstract: Provided is an optical information card having a particular structure. The card is comprised of four different layers, i.e., a card substrate, a recording layer which is formed on one side of the card substrate and which comprises a naphthalocyanine compound, a polyvinyl alcohol coating directly over the information layer, and a transparent protective layer over the polyvinyl alcohol layer. This structure offers a very sensitive and useful optical information card which can be easily manufactured while maintaining the integrity of the information layer, and which permits one to realize the advantage of using a naphthalocyanine information layer in a card format.Type: GrantFiled: March 8, 1990Date of Patent: June 11, 1991Assignee: Hoechst Celanese Corp.Inventors: Palaiyur S. Kalyanaraman, Frank J. Onorato
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Patent number: 5021511Abstract: Novel polymers are prepared from at least one cyanoacetamide monomer having the formula: ##STR1## where R.sub.1 is --CH.sub.3, --(CH.sub.2).sub.m CH.sub.3 or --H; R.sub.2 and R.sub.3 independently are --H, (C.sub.1 -C.sub.4) alkyl or aryl; R.sub.4 is --CH.sub.3, --(CH.sub.2).sub.n CH.sub.3 or --H; m is 1 to 10; n is 1 to 10; and x is 1 to 20.These polymers can be readily reacted by a carbon-Michael addition reaction with carbon-Michael acceptors, such as polyfunctional acrylates, methacrylates, fumarates, maleates and aopates to form crosslinked polymer compositions.Type: GrantFiled: December 27, 1988Date of Patent: June 4, 1991Assignee: Rohm and Haas CompanyInventors: Gary R. Larson, William D. Emmons, Palaiyur S. Kalyanaraman
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Patent number: 4997744Abstract: Provided is a process and solvent solution for coating an aza-annulene chromophore containing film directly onto a polycarbonate or polymethylmethacrylate comprising base. In the process, a solution of the chromophore, e.g., phthalocyanine, porphyrin or naphthalocynine, is cast directly onto the polycarbonate or polymethylmethacrylate base, with the solvent used in formulating the solution comprising a C.sub.5 -C.sub.7 cyclic alcohol, or a mixture of solvents including at least one of the aforementioned alcohols. The solvent is then removed, preferably by evaporation, in order to yield a smooth, homogeneous chromophore containing film directly on the polycarbonate or polymethylmethacrylate comprising base.Type: GrantFiled: December 21, 1988Date of Patent: March 5, 1991Assignee: Hoechst Celanese Corp.Inventors: Palaiyur S. Kalyanaraman, David E. Nikles
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Patent number: 4977068Abstract: Provided is a novel aromatic ether capped naphthalocyanine compound containing a central hetero atom having a siloxy group substituent off of said hetero atom, with said siloxy substituent having the formula--OSiR.sub.1 R.sub.2 --ZArwhereinR.sub.1 and R.sub.2 can be the same or different, and can be alkyl having from 1 to about 18 carbons; aryl having from 6 to 10 carbons; cycloalkyl having at least 4 carbons or alkoxy having at least 3 carbons,Z is O or S, andAr is an aromatic moiety.Also provided is a process for preparing a naphthalocyanine compound containing a central hetero atom having a siloxy group substituent off of said hetero atom, with said siloxy group containing a terminal ether function, which process comprises reacting in the presence of a nucleophile in a moisture free environment(i) a naphthalocyanine dihydroxy compound,(ii) a compound of the formula SiR.sub.1 R.sub.2 L.sub.2, wherein R.sub.1 and R.sub.Type: GrantFiled: March 9, 1990Date of Patent: December 11, 1990Assignee: Hoechst Celanese Corp.Inventor: Palaiyur S. Kalyanaraman
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Patent number: 4929537Abstract: Negative photoresist compositions are made from copolymers of 4-hydroxystyrene and dialkyl muconates, alkyl sorbates, alkadiene monomers or allyl esters of ethylenically unsaturated acids plus a photosensitizer. Such compositions are useful in photolithographic and photomasking operations in fabricating microelectronic devices, printed circuits, semiconductors, printing plates, dies and the like.Type: GrantFiled: July 27, 1989Date of Patent: May 29, 1990Assignee: Hoechst Celanese Corp.Inventors: Balaram Gupta, Palaiyur S. Kalyanaraman
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Patent number: 4854676Abstract: In one embodiment this invention provides a bistable optical device comprising a Fabry-Perot etalon which has an optical cavity containing a naphthalocyanine dye medium as a nonlinear optical component.Type: GrantFiled: April 19, 1988Date of Patent: August 8, 1989Assignee: Hoechst Celanese Corp.Inventors: Palaiyur S. Kalyanaraman, Anthony F. Garito
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Patent number: 4631249Abstract: This invention relates to negative photoresist systems containing thermally stable polyglutarimide polymers dissolved in suitable solvents. The negative resists are useful for producing high resolution images on surfaces by exposing the resist to a wide range of exposing radiation wavelengths and by subsequently developing the unexposed resist with an organic solvent or an aqueous base developer. The polyglutarimide polymers can be formulated so that they are partially soluble in an aqueous base, compatible with aqueous base soluble photosensitizers, and developable in aqueous base solutions, thereby eliminating the need for the use of any organic solvent.Type: GrantFiled: November 14, 1985Date of Patent: December 23, 1986Assignee: Rohm & Haas CompanyInventor: Palaiyur S. Kalyanaraman
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Patent number: 4569897Abstract: This invention relates to negative photoresist compositions containing thermally stable polyglutarimide polymers dissolved in suitable solvents. The negative resists are useful for producing high resolution images on surfaces by exposing the resist to a wide range of exposing radiation wavelengths and by subsequently developing the unexposed resist with an organic solvent or an aqueous base developer. The polyglutarimide polymers can be formulated so that they are partially soluble in an aqueous base, compatible with aqueous base soluble photosensitizers, and developable in aqueous base solutions, thereby eliminating the need for the use of any organic solvent.Type: GrantFiled: January 16, 1984Date of Patent: February 11, 1986Assignee: Rohm and Haas CompanyInventor: Palaiyur S. Kalyanaraman
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Patent number: 4503248Abstract: A class of polyamides comprising recurring units having substituted-quaterphenylene radicals is disclosed. The polymers comprise recurring units of the formula ##STR1## wherein each of A and B is a divalent radical, except that B can represent a single bond; R and R.sup.1 are each hydrogen, alkyl, aryl, alkaryl or aralkyl; and c is zero or one; and wherein, when c is one, at least one of A and B is a substituted-quaterphenylene radical having the formula ##STR2## where each U is a substituent other than hydrogen, each W is hydrogen or a substituent other than hydrogen, each p is an integer from 1 to 3, each X is hydrogen or a substituent other than hydrogen and each r is an integer from 1 to 4, the U, W.sub.p and X.sub.r substitution being sufficient to provide the radical with a non-coplanar molecular configuration; and wherein, when c is zero, A is a substituted-quaterphenylene radical as aforedescribed.Type: GrantFiled: May 27, 1983Date of Patent: March 5, 1985Assignee: Polaroid CorporationInventors: Russell A. Gaudiana, Palaiyur S. Kalyanaraman
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Patent number: 4393194Abstract: A class of polyamides comprising recurring units having substituted-quaterphenylene radicals is disclosed. The polymers comprise recurring units of the formula ##STR1## wherein each of A and B is a divalent radical, except that B can represent a single bond; R and R.sup.1 are each hydrogen, alkyl, aryl, alkaryl or aralkyl; and c is zero or one; and wherein, when c is one, at least one of A and B is a substituted-quaterphenylene radical having the formula ##STR2## where each U is a substituent other than hydrogen, each W is hydrogen or a substituent other than hydrogen, each p is an integer from 1 to 3, each X is hydrogen or a substituent other than hydrogen and each r is an integer from 1 to 4, the U, W.sub.p and X.sub.r substitution being sufficient to provide the radical with a non-coplanar molecular configuration; and wherein, when c is zero, A is a substituted-quaterphenylene radical as aforedescribed.Type: GrantFiled: March 2, 1981Date of Patent: July 12, 1983Assignee: Polaroid CorporationInventors: Russell A. Gaudiana, Palaiyur S. Kalyanaraman