Abstract: A method and structure for forming a capacitor in a semiconductor device using a high dielectric constant, yttrium barium copper oxide layer as the capacitor dielectric layer. The process begins by providing a semiconductor structure having a conductive plug therein and having an opening, with sidewalls, over the conductive plug. The opening is shaped to accomodate a capacitor structure as is known in the art. A first conductive layer is formed on the conductive plug and on the sidewalls of the opening. A yttrium barium copper oxide layer is deposited on the first conductive layer using a sputtering process with a YBa2Cu3O7 target. The yttrium barium copper oxide layer can be annealed to control the oxygen content. For example, YBa2Cu3O6+X can be controlled at between X=0.2 and X=0.5.

Abstract: A method and structure for forming a capacitor in a semiconductor device using a high dielectric constant, yttrium barium copper oxide layer as the capacitor dielectric layer. The process begins by providing a semiconductor structure having a conductive plug therein and having an opening, with sidewalls, over the conductive plug. The opening is shaped to accomodate a capacitor structure as is known in the art. A first conductive layer is formed on the conductive plug and on the sidewalls of the opening. A yttrium barium copper oxide layer is deposited on the first conductive layer using a sputtering process with a YBa2Cu3O7 target. The yttrium barium copper oxide layer can be annealed to control the oxygen content. For example, YBa2Cu3O6+X can be controlled at between X=0.2 and X=0.5.

Abstract: A thermal detector includes a transducer layer of semiconducting yttrium barium copper oxide which is sensitive at room temperature to radiation and provides detection of infrared radiation. In a gate-insulated transistor embodiment, a layer of ferroelectric semiconducting yttrium barium copper oxide forms a gate insulator layer and increases capacitance of the transistor or latches the transistor according to the polarization direction of the ferroelectric layer. The transducer layer may be formed as an amorphous semiconductor and deposited at room temperature by simple sputtering. The sensitive element can be incorporated into a thermal isolation structure as part of an integrated circuit.

Abstract: A thermal detector includes a transducer layer of semiconducting yttrium barium copper oxide which is sensitive at room temperature to radiation and provides detection of infrared radiation. In a gate-insulated transistor embodiment, a layer of ferroelectric semiconducting yttrium barium copper oxide forms a gate insulator layer and increases capacitance of the transistor or latches the transistor according to the polarization direction of the ferroelectric layer. The transducer layer may be formed as an amorphous semiconductor and deposited at room temperature by simple sputtering. The sensitive element can be incorporated into a thermal isolation structure as part of an integrated circuit.

Abstract: A thermal detector includes a transducer layer of semiconducting yttrium barium copper oxide which is sensitive at room temperature to radiation and provides detection of infrared radiation. In a gate-insulated transistor embodiment, a layer of ferroelectric semiconducting yttrium barium copper oxide forms a gate insulator layer and increases capacitance of the transistor or latches the transistor according to the polarization direction of the ferroelectric layer.

Abstract: A thermal detector includes a transducer layer of semiconducting yttrium barium copper oxide which is sensitive at room temperature to radiation and provides detection of infrared radiation. In a gate-insulated transistor embodiment, a layer of ferroelectric semiconducting yttrium barium copper oxide forms a gate insulator layer and increases capacitance of the transistor or latches the transistor according to the polarization direction of the ferroelectric layer.