Patents by Inventor Pascal Antonius Smits

Pascal Antonius Smits has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Imprint lithography
    Patent number: 8319968
    Abstract: A method of determining a position of a substrate relative to an imprint template is described, wherein the imprint template has at least three gratings and the substrate has at least three gratings positioned such that each imprint template grating forms a composite grating with an associated substrate grating, the at least three imprint template gratings and associated substrate gratings having offsets relative to one another. The method includes detecting an intensity of radiation which is reflected by the three composite gratings, and using the detected intensities to determine displacement of the substrate or imprint template from a position.
    Type: Grant
    Filed: September 10, 2009
    Date of Patent: November 27, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Arie Jeffrey Den Boef, Andre Bernardus Jeunink, Johannes Petrus Martinus Bernardus Vermeulen, Pascal Antonius Smits, Sander Frederik Wuister, Yvonne Wendela Kruijt-Stegeman, Catharinus De Schiffart
  • IMPRINT LITHOGRAPHY
    Publication number: 20100065987
    Abstract: A method of determining a position of a substrate relative to an imprint template is described, wherein the imprint template has at least three gratings and the substrate has at least three gratings positioned such that each imprint template grating forms a composite grating with an associated substrate grating, the at least three imprint template gratings and associated substrate gratings having offsets relative to one another. The method includes detecting an intensity of radiation which is reflected by the three composite gratings, and using the detected intensities to determine displacement of the substrate or imprint template from a position.
    Type: Application
    Filed: September 10, 2009
    Publication date: March 18, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Arie Jeffrey DEN BOEF, Andre Bernardus Jeunink, Johannes Petrus Martinus Bernardus Vermeulen, Pascal Antonius Smits, Sander Frederik Wuister, Yvonne Wandela Kruijt-Stegeman, Catharinus De Schiffart
  • Lithographic apparatus and device manufacturing method
    Patent number: 7271873
    Abstract: A lithographic apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and a first support for supporting a patterning device that serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a second support for supporting a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and at least one gas generator for generating a conditioned gas flow. The gas generator includes a guiding element for guiding the gas flow to a lower volume generally located below a lower surface of the projection system and to a volume between the lower surface and the substrate. The guiding element directs the gas flow in a generally downward direction and then in a direction generally parallel to the lower surface.
    Type: Grant
    Filed: May 22, 2006
    Date of Patent: September 18, 2007
    Assignee: ASML Netherlands B.V.
    Inventors: Nicolas Alban Lallemant, Martinus Cornelis Maria Verhagen, Marcel Beckers, Ronald Stultiens, Pascal Antonius Smits, Wladimir Fransiscus Gerardus Maria Hertog, David Theodorus Willy Van Der Plas, Stephan Koelink, Henk Krus
  • Lithographic apparatus and device manufacturing method
    Patent number: 7072021
    Abstract: A lithographic apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and a first support for supporting a patterning device that serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a second support for supporting a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and at least one gas generator for generating a conditioned gas flow. The gas generator includes a guiding element for guiding the gas flow to a lower volume generally located below a lower surface of the projection system and to a volume between the lower surface and the substrate. The guiding element directs the gas flow in a generally downward direction and then in a direction generally parallel to the lower surface.
    Type: Grant
    Filed: June 28, 2004
    Date of Patent: July 4, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Nicolas Alban Lallemant, Martinus Cornelis Maria Verhagen, Marcel Beckers, Ronald Stultiens, Pascal Antonius Smits, Wladimir Franciscus Gerardus Maria Hertog, David Theodorus Willy Van Der Plas, Stephan Koelink, Henk Krus