Abstract: The invention concerns a plasma source including a quarter wave antenna (204) located in a cylindrical enclosure (202) provided with an opening (208) opposite the end of the antenna (204). The diameter (d) of the antenna (204) is in the range from one third to one quarter of the inner diameter (d1) of the enclosure (202). The distance (l) between the end of the antenna (204) and the opening (208) is in the range from ? to 5/3 of the diameter (d) of the antenna (204).

Abstract: The invention concerns a plasma source including a quarter wave antenna (204) located in a cylindrical enclosure (202) provided with an opening (208) opposite the end of the antenna (204). The diameter (d) of the antenna (204) is in the range from one third to one quarter of the inner diameter (d1) of the enclosure (202). The distance (l) between the end of the antenna (204) and the opening (208) is in the range from ? to 5/3 of the diameter (d) of the antenna (204).

Abstract: The invention relates to a device for depositing a selected material on a substrate by means of ion beam sputtering, which include a plurality of targets of a selected material, each of which is bombarded by an ion beam, the lateral dimensions of each of the ion beams being less than one tenth of the lateral dimensions of the substrate.

Abstract: A plasma source includes a first rod forming a quarterwave antenna, surrounded by at least one parallel rod forming a coupler and which is substantially the same length as the first rod, set to a reference potential, the coupler rods being evenly distributed radially about the first rod, at a distance of around one-fifth to one-twentieth of the quarter of the wavelength.

Abstract: A plasma source includes a first rod forming a quarterwave antenna, surrounded by at least one parallel rod forming a coupler and which is substantially the same length as the first rod, set to a reference potential, the coupler rods being evenly distributed radially about the first rod, at a distance of around one-fifth to one-twentieth of the quarter of the wavelength.

Abstract: The light source comprises an emitter (4) which, by means of at least one antenna (3), creates an ultra high-frequency electromagnetic wave in a sealed chamber (1) and which provides the lamp with power. The chamber (1) has a wall that is transparent to light and contains a gas at low pressure. A permanent magnet (2) creates a static magnetic field inside the chamber (1). The respective values of the static magnetic field and of the frequency of the electromagnetic wave are determined such as to cause an electron cyclotron resonance inside the chamber (1). The emitter (4), antenna (3) and magnet (2) are disposed in relation to the chamber (1) in such a way as to free a solid angle of at least 2? steradians for the light. The antenna (3) can be disposed inside the chamber (1) and can, optionally, be formed by the magnet (2). The magnet is substantially enveloped by the chamber (1).