Abstract: A low refractive index composition that forms a low refractive index layer on an optical display is formed having a co-crosslinked interpenetrating polymer network of a fluoropolymer phase and an acrylate phase. The fluoropolymer phase is preferably formed from fluoropolymers based on THV or FKM and having either a degree of unsaturation and/or containing a reactive cure site monomer in its polymer backbone. The acrylate phase includes a multifunctional acrylate crosslinker, and more preferably includes a perfluoropolyether acrylate crosslinker. The formed low refractive index layer has improved interfacial adhesion to other layers or substrates contained in the optical display. Further, the mechanical strength and scratch resistance of the either of above low refractive index compositions can be further enhanced through the incorporation of surface functionalized inorganic particle into the formed layer.

Abstract: Described are anionic N-substituted fluorinated sulfonamide surfactants, and use thereof in cleaning and in acid etch solutions. The cleaning and etch solutions are used with a wide variety of substrates, for example, in the cleaning and etching of silicon oxide-containing substrates.

Abstract: The present invention provides polyoxyalkylene ammonium imide or methide salts and their use as antistatic agents. Another embodiment provides articles comprising these salts, and processes for making and using these salts.

Abstract: The present invention provides polyoxyalkylene ammonium imide or methide salts and their use as antistatic agents. Another embodiment provides articles comprising these salts, and processes for making and using these salts.

Abstract: The disclosure pertains to compositions and methods for modifying or refining the surface of a wafer suited for semiconductor fabrication. The compositions include working liquids useful in modifying a surface of a wafer suited for fabrication of a semiconductor device. In some embodiments, the working liquids are aqueous solutions of initial components substantially free of loose abrasive particles, the components including water, a surfactant, and a pH buffer exhibiting at least one pKa greater than 7. In certain embodiments, the pH buffer includes a basic pH adjusting agent and an acidic complexing agent, and the working liquid exhibits a pH from about 7 to about 12. In further embodiments, the disclosure provides a fixed abrasive article comprising a surfactant suitable for modifying the surface of a wafer, and a method of making the fixed abrasive article. Additional embodiments describe methods that may be used to modify a wafer surface.

Abstract: A coatable composition that comprises water, a film-forming organic polymer, and a leveling agent comprising an anionic species represented by the formula wherein Rf represents a perfluoroalkyl group having from 4 to 6 carbon atoms, and R represents H or an alkyl group having from 1 to 18 carbon atoms.

Abstract: A low refractive index composition that forms a low refractive index layer on an optical display is formed having a co-crosslinked interpenetrating polymer network of a fluoropolymer phase and an acrylate phase. The fluoropolymer phase is preferably formed from fluoropolymers based on THV or FKM and having either a degree of unsaturation and/or containing a reactive cure site monomer in its polymer backbone. The acrylate phase includes a multifunctional acrylate crosslinker, and more preferably includes a perfluoropolyether acrylate crosslinker. The formed low refractive index layer has improved interfacial adhesion to other layers or substrates contained in the optical display. Further, the mechanical strength and scratch resistance of the either of above low refractive index compositions can be further enhanced through the incorporation of surface functionalized inorganic particle into the formed layer.

Abstract: Described are anionic N-substituted fluorinated sulfonamide surfactants, and use thereof in cleaning and in acid etch solutions. The cleaning and etch solutions are used with a wide variety of substrates, for example, in the cleaning and etching of silicon oxide-containing substrates.

Abstract: Novel aqueous, acid etch solutions comprising a fluorinated surfactant are provided. The etch solutions are used with a wide variety of substrates, for example, in the etching of silicon oxide-containing substrates.

Abstract: A composition having at least about 10 percent perfluoroalkylsulfonamideoethyl acrylate; at least about 5 percent aliphatic urethane acrylate oligomer; at least about 1 percent acrylate monomer; and less than about 84 percent other reactive and non-reactive components. The composition, with the addition of a light absorbing pigment, is particularly useful as a light absorbing adhesive in an optical element such as a rear projection screen that incorporates totally internally reflecting structures to disperse the light passing through the screen.

Abstract: A latex paint composition comprises (a) a polymer having interpolymerized units that comprise units derived from styrene, methyl styrene, vinyl, or combinations thereof and units derived from one or more acrylates, methacrylates, acrylonitrile, or combinations thereof, (b) hiding pigment, (c) non-cellulosic thickener, and (d) at least about 0.01 weight per volume percent fluorochemical acrylic polymer additive comprising: (1) at least one perfluoroalkyl moiety selected from the group consisting of heptafluoropropanesulfonamido, nonafluorobutanesulfonamido, undecafluoropentanesulfonamido, and tridecafluorohexanesulfonamido moieties, (2) at least one polyoxyalkylene block comprising at least one (a) alkyleneoxy moiety or (b) alkylene group interrupted by a carboxyester moiety, e.g., a caprolactone acrylate, and (3) at least one water-solubilizing group. Also, methods for providing paint coatings with such compositions.

Abstract: Described are fluorochemical surfactants derived from nonafluorobutanesulfonyl fluoride that contain polyalkyleneoxy side chains and may be copolymerized with acrylic acid or methacrylic acid to form polyacrylates or polymethacrylates. The surfactants surprisingly lower the surface tension of water and other liquids in the same or similar low values achieved by premier surfactants such as those derived from perfluorooctane sulfonyl fluoride.

Abstract: A composition having at least about 10 percent perfluoroalkylsulfonamideoethyl acrylate; at least about 5 percent aliphatic urethane acrylate oligomer; at least about 1 percent acrylate monomer; and less than about 84 percent other reactive and non-reactive components. The composition, with the addition of a light absorbing pigment, is particularly useful as a light absorbing adhesive in an optical element such as a rear projection screen that incorporates totally internally reflecting structures to disperse the light passing through the screen.