Abstract: A cooking appliance includes a cooktop and a burner mounted on the cooktop. At least one coupling member is coupled to the cooktop. A grate, a griddle, or a reversible griddle is selectively coupled to the at least one coupling member and is operable between a raised position and a lowered position when the grate, the griddle, or the reversible griddle, is engaged with the coupling member.

Abstract: The invention provides a method and system to remotely monitor a plasma (3) comprising a magnetic field antenna (2) positioned in the near electromagnetic field of a coupled plasma source wherein the magnetic field antenna is a magnetic loop antenna placed in the near electromagnetic field and measure near field signals emitted from the plasma source. A radio system (1) is utilised to analyse the low power signal levels across a wide frequency band. Plasma paramaters such as series, or geometric, resonance plasma and electron-neutral collision frequencies are evaluated via a fitting of resonant features present on higher harmonics of the driving frequency to identify arcing, pump or matching failure events, common in fabrication plasma systems.

Abstract: The invention provides a method and system to remotely monitor a plasma (3) comprising a magnetic field antenna (2) positioned in the near electromagnetic field of a coupled plasma source wherein the magnetic field antenna is a magnetic loop antenna placed in the near electromagnetic field and measure near field signals emitted from the plasma source. A radio system (1) is utilised to analyse the low power signal levels across a wide frequency band. Plasma paramaters such as series, or geometric, resonance plasma and electron-neutral collision frequencies are evaluated via a fitting of resonant features present on higher harmonics of the driving frequency to identify arcing, pump or matching failure events, common in fabrication plasma systems.

Abstract: The invention provides a method and system to remotely monitor a plasma (3) comprising a magnetic field antenna (2) positioned in the near electromagnetic field of a coupled plasma source wherein the magnetic field antenna is a magnetic loop antenna placed in the near electromagnetic field and measure near field signals emitted from the plasma source. A radio system (1) is utilised to analyse the low power signal levels across a wide frequency band. Plasma paramaters such as series, or geometric, resonance plasma and electron-neutral collision frequencies are evaluated via a fitting of resonant features present on higher harmonics of the driving frequency to identify arcing, pump or matching failure events, common in fabrication plasma systems.

Abstract: An inspection device is provided which comprises a receiving member defining an open cell for receiving a target therein. An optical excitation input is in optical communication with the cell for exciting the target. At least one acoustic pickup is in acoustic communication with the cell for picking up acoustic energy resultant from excitation of the target. A recorder is provided for recording the acoustic energy picked up from the at least one acoustic pickup for facilitating structural analysis of the target.

Abstract: An inspection device is provided which comprises a receiving member defining an open cell for receiving a target therein. An optical excitation input is in optical communication with the cell for exciting the target. At least one acoustic pickup is in acoustic communication with the cell for picking up acoustic energy resultant from excitation of the target. A recorder is provided for recording the acoustic energy picked up from the at least one acoustic pickup for facilitating structural analysis of the target.