Patents by Inventor Patrick Lacroix-Desmazes
Patrick Lacroix-Desmazes has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9850364Abstract: Process for the preparation of a vinylidene chloride polymer composite comprising a solid particulate encapsulated in the vinylidene chloride polymer. The process comprises providing a dispersion of a solid particulate material in a liquid phase, said dispersion comprising a RAFT/MADIX agent; providing vinylidene chloride and optionally one or more ethylenically unsaturated monomer copolymerizable therewith to said dispersion; and polymerizing vinylidene chloride and said optionally present one or more ethylenically unsaturated monomer under the control of said RAFT/MADIX agent to form polymer at the surface of said solid particulate material.Type: GrantFiled: December 18, 2012Date of Patent: December 26, 2017Assignees: Solvay SA, Centre National De La Recherche Scientifique, Ecole Nationale Superieure De Chimie De Montpellier, Universite De Montpellier 2Inventors: Jérôme Vinas, Pierre-Emmanuel Dufils, Jérôme Garnier, Patrick Lacroix-Desmazes, Alex Van Herk, Jérôme Warnant, Yves Vanderveken
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Publication number: 20140371370Abstract: Process for the preparation of a vinylidene chloride polymer composite comprising a solid particulate encapsulated in the vinylidene chloride polymer. The process comprises providing a dispersion of a solid particulate material in a liquid phase, said dispersion comprising a RAFT/MADIX agent; providing vinylidene chloride and optionally one or more ethylenically unsaturated monomer copolymerisable therewith to said dispersion; and polymerising vinylidene chloride and said optionally present one or more ethylenically unsaturated monomer under the control of said RAFT/MADIX agent to form polymer at the surface of said solid particulate material.Type: ApplicationFiled: December 18, 2012Publication date: December 18, 2014Inventors: Jérome Vinas, Pierre-Emmanuel Dufils, Jérome Garnier, Patrick Lacroix-Desmazes, Alex Van Herk, Jérome Warnant, Yves Vanderveken
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Patent number: 8541524Abstract: Process of controlled free-radical polymerization in aqueous dispersion for the preparation of a block copolymer at least one block of which is a block of a halogenated polymer using molecular iodine and at least one oxidant whose solubility in water is at least 10 g/l for the synthesis of the first block of the block copolymer.Type: GrantFiled: July 4, 2007Date of Patent: September 24, 2013Assignee: Solvay (Societe Anonyme)Inventors: Christophe Fringant, Yves Vanderveken, Patrick Lacroix-Desmazes, Jeff Tonnar
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Publication number: 20130237640Abstract: A process for preparing a seed latex of an epoxy-containing polymer by radical polymerization in aqueous emulsion of at least one epoxy-containing monomer and optionally at least one comonomer is disclosed. Also disclosed are a process for preparing a vinylidene chloride polymer latex either by radical polymerization in aqueous emulsion of vinylidene chloride and optionally at least one comonomer in the presence of the epoxy-containing polymer seed latex obtained by the process according to the invention; or by mixing the epoxy-containing polymer seed latex with a vinylidene chloride polymer latex obtained separately by radical polymerization in aqueous emulsion.Type: ApplicationFiled: November 10, 2011Publication date: September 12, 2013Inventors: Pierre-Emmanuel Dufils, Patrick Lacroix-Desmazes, Jerome Garnier, Yves Vanderveken, Jerome Vinas
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Patent number: 8324322Abstract: Polymer composition comprising: 1) a polymer (P1) comprising at least 50% by weight of monomeric units derived from an ethylenically unsaturated monomer (M1), and 2) at least one co-oligomer (O1) comprising at least: a) a component (A) comprising at least one monomeric unit identical to that derived from the monomer (M1) on which the polymer (P1) is based, and b) a component (B) comprising at least one monomeric unit (m2), derived from an ethylenically unsaturated monomer, carrying at least one group chosen from the following groups: —CaH2a+1 with a between 6 and 30; —(CH2)b—CcF2c+1 with b between 1 and 11 and c greater than or equal to 5; —(CH2)d—(Si(CH3)2—O)e—Si(CH3)3 with d between 1 and 11 and e between 1 and 1000; —COOH; —SO3H, and the phosphonate groups —PO(OH)(OR1) with R1 being a hydrogen atom or an alkyl radical containing from 1 to 11 carbon atoms.Type: GrantFiled: September 22, 2004Date of Patent: December 4, 2012Assignee: Solvay (Societe Anonyme)Inventors: Christophe Fringant, Vincent Bodart, Berengere Rixens, Romain Severac, Yves Hervaud, Patrick Lacroix-Desmazes, Bernard Boutevin
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Patent number: 8263811Abstract: Process for preparing one or more iodinated organic substances having a molecular mass of less than 2000 (substances (S)) using (A) at least one free-radical-generating substance chosen from peroxides, diazo compounds, dialkyldiphenylalkanes, substances derived from tetraphenylethane, boranes and iniferter substances comprising at least one thiuram disulphide group, (B) an ethylenically unsaturated substance capable of adding a free radical to its ethylenic double bond, (C) molecular iodine, which comprises the steps according to which at least a fraction of (A), at least a fraction of (B) and at least a fraction of (C) are introduced into a reactor, and then the contents of the reactor are caused to react, while introducing therein the possible remainder of (A), the possible remainder of (B) and the possible remainder of (C), until a moment is reached when the content of the reactor is a mixture comprising one or more substances (S).Type: GrantFiled: May 6, 2010Date of Patent: September 11, 2012Assignee: Solvay (Société Anonyme)Inventors: Patrick Lacroix-Desmazes, Romain Severac, Bernard Boutevin, Vincent Bodart, Vincent Kurowski
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Patent number: 8172955Abstract: Process for decontaminating, cleaning a solid organic substrate contaminated by solid radioactive particulate inorganic contaminants, in which: the said solid substrate is brought into contact with an extraction medium, devoid of water, comprising: dense pressurized CO2; at least one nonhalogenated surface-active compound chosen from block copolymers of poly(ethylene oxide) PEO and poly(propylene oxide) PPO, such as (EO)x-(PO)y diblock copolymers, (EO)x-(PO)y-(EO)x triblock copolymers and (PO)x-(EO)y-(PO)x, triblock copolymers, where x and y are integers from 2 to 80 with x other than y; and polydi(1 to 6C)alkylsiloxanes, such as polydimethylsiloxane (PDMS); and at least one complexing agent chosen from tributyl phosphate (TBP), crown ethers, tributylphosphine oxide, triphenylphosphine oxide and tri(n-octyl)phosphine oxide; the solid substrate and/or the extraction medium is/are subjected, simultaneously with the contacting operation, to a mechanical action.Type: GrantFiled: February 23, 2007Date of Patent: May 8, 2012Assignees: Commissariat a l'Energie Atomique, Areva NCInventors: Bruno Fournel, Julien Galy, Frédéric Barth, Patrick Lacroix-Desmazes, Serge Lagerge, Sophie Dussolliet, Jérôme Blancher
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Publication number: 20100240850Abstract: Process for preparing one or more iodinated organic substances having a molecular mass of less than 2000 (substances (S)) using (A) at least one free-radical-generating substance chosen from peroxides, diazo compounds, dialkyldiphenylalkanes, substances derived from tetraphenylethane, boranes and iniferter substances comprising at least one thiuram disulphide group, (B) an ethylenically unsaturated substance capable of adding a free radical to its ethylenic double bond, (C) molecular iodine, which comprises the steps according to which at least a fraction of (A), at least a fraction of (B) and at least a fraction of (C) are introduced into a reactor, and then the contents of the reactor are caused to react, while introducing therein the possible remainder of (A), the possible remainder of (B) and the possible remainder of (C), until a moment is reached when the content of the reactor is a mixture comprising one or more substances (S).Type: ApplicationFiled: May 6, 2010Publication date: September 23, 2010Applicant: SOLVAY (SOCIETE ANONYME)Inventors: Patrick LACROIX-DESMAZES, Romain Severac, Bernard Boutevin, Vincent Bodart, Vincent Kurowski
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Patent number: 7741524Abstract: Process for preparing one or more iodinated organic substances having a molecular mass of less than 2000 (substances (S)) using (A) at least one free-radical-generating substance chosen from peroxides, diazo compounds, dialkyldiphenylalkanes, substances derived from tetraphenylethane, boranes and iniferter substances comprising at least one thiuram disulphide group, (B) an ethylenically unsaturated substance capable of adding a free radical to its ethylenic double bond, (C) molecular iodine, which comprises the steps according to which at least a fraction of (A), at least a fraction of (B) and at least a fraction of (C) are introduced into a reactor, and then the contents of the reactor are caused to react, while introducing therein the possible remainder of (A), the possible remainder of (B) and the possible remainder of (C), until a moment is reached when the content of the reactor is a mixture comprising one or more substances (S).Type: GrantFiled: April 22, 2004Date of Patent: June 22, 2010Assignee: Solvay (Societe Anonyme)Inventors: Patrick Lacroix-Desmazes, Romain Severac, Bernard Boutevin, Vincent Bodart, Vincent Kurowski
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Publication number: 20090306302Abstract: Process of free-radical polymerization in aqueous dispersion for the preparation of polymers, employing (A) at least one ethylenically unsaturated monomer, one of which is employed as the principal monomer and is selected from styrene and its derivatives, acrylic acid and its derivatives, methacrylic acid and its derivatives, dienes, vinyl esters, vinyl ethers, vinylic pyridine derivatives, vinylsulphonic acid and its derivatives, vinylphosphonic acid and its derivatives, and N-vinyl monomers, (B) at least one free-radical initiator selected from diazo compounds, peroxides and dialkyldiphenylalkanes, (C) molecular iodine, and (D) at least one oxidizing agent whose solubility in water is at least 10 g/l, of which at least one may be the one (B); said process comprising the steps whereby (1) at least one fraction of each of compounds (A), (B), (C) and (D) is introduced into a reactor, and (2) the contents of the reactor are reacted while introducing into the reactor the remainder, where appropriate, of each ofType: ApplicationFiled: July 4, 2007Publication date: December 10, 2009Inventors: Patrick Lacroix-Desmazes, Jeff Tonnar
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Publication number: 20090292071Abstract: Process of controlled free-radical polymerization in aqueous dispersion for the preparation of a block copolymer at least one block of which is a block of a halogenated polymer using molecular iodine and at least one oxidant whose solubility in water is at least 10 g/l for the synthesis of the first block of the block copolymer.Type: ApplicationFiled: July 4, 2007Publication date: November 26, 2009Applicant: SOLVAY (Societe Anonyme)Inventors: Christophe Fringant, Yves Vanderveken, Patrick Lacroix-Desmazes, Jeff Tonnar
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Publication number: 20090191135Abstract: A method for encapsulating an active principle by dispersing the active principle in a supercritical fluid by adding a surfactant to the fluid. The surfactant is a block copolymer having at least one CO2-philic block and at least one nonionic hydrophilic block.Type: ApplicationFiled: January 16, 2009Publication date: July 30, 2009Inventors: Joel RICHARD, Frantz Deschamps, Patrick Lacroix-Desmazes, Bernard Boutevin
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Publication number: 20090056742Abstract: Process for decontaminating, cleaning a solid organic substrate contaminated by solid radioactive particulate inorganic contaminants, in which: the said solid substrate is brought into contact with an extraction medium, devoid of water, comprising: dense pressurized CO2; at least one nonhalogenated surface-active compound chosen from block copolymers of poly(ethylene oxide) PEO and poly(propylene oxide) PPO, such as (EO)x-(PO)y diblock copolymers, (EO)x-(PO)y-(EO)x triblock copolymers and (PO)x-(EO)y-(PO), triblock copolymers, where x and y are integers from 2 to 80 with x other than y; and polydi(1 to 6C)alkylsiloxanes, such as polydimethylsiloxane (PDMS); and at least one complexing agent chosen from tributyl phosphate (TBP), crown ethers, tributylphosphine oxide, triphenylphosphine oxide and tri(n-octyl)phosphine oxide; the solid substrate and/or the extraction medium is/are subjected, simultaneously with the contacting operation, to a mechanical action.Type: ApplicationFiled: February 23, 2007Publication date: March 5, 2009Inventors: Bruno Fournel, Julien Galy, Frederic Barth, Patrick Lacroix-Desmazes, Serge Lagerge, Sophie Dussolliet, Jerome Blancher
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Patent number: 7285597Abstract: Radical polymerization process for the preparation of halogenated polymers employing one or more ethylenically unsaturated monomers, at least one of which is chosen from halogenated monomers, molecular iodine and one or more radical-generating agents chosen from diazo compounds, peroxides and dialkyl diphenylalkanes Radical polymerization process for the preparation, starting from the halogenated polymers prepared by the process as described above, of block copolymers, at least one block of which is a halogenated polymer block. Halogenated polymers which have a number-average molecular mass Mn of greater than 1.0×104 and an Mz/Mw ratio of less than 1.65. Block copolymers, at least one block of which is a block of halogenated polymer identical to the halogenated polymers described above. Block copolymers comprising at least one halogenated polymer block which have a number-average molecular mass Mn of greater than 1.5×104 and a polydispersity index Mw/Mn of less than 1.60.Type: GrantFiled: March 16, 2007Date of Patent: October 23, 2007Assignee: Solvay (Societe Anonyme)Inventors: Patrick Lacroix-Desmazes, Romain Severac, Bernard Boutevin, Vincent Bodart, Vincent Kurowski
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Publication number: 20070218207Abstract: Polymer composition comprising: 1) a polymer (P1) comprising at least 50% by weight of monomeric units derived from an ethylenically unsaturated monomer (M1), and 2) at least one co-oligomer (01) comprising at least: a) a component (A) comprising at least one monomeric unit identical to that derived from the monomer (Ml) on which the polymer (P1) is based, and b) a component (B) comprising at least one monomeric unit (m2), derived from an ethylenically unsaturated monomer, carrying at least one group chosen from the following groups: —CaH2a+1 with a between 6 and 30; —(CH2)b—CeF26+1 with b between 1 and 11 and c greater than or equal to 5; —(CH2)d—(Si(CH3)2—O)e—Si(CH3)3 with d between 1 and 11 and e between 1 and 1000; —COOH; —SO3H, and the phosphonate groups —PO(OH)(OR1) with RI being a hydrogen atom or an alkyl radical containing from 1 to 11 carbon atoms.Type: ApplicationFiled: September 22, 2004Publication date: September 20, 2007Applicant: Solvay (Societe Anonyme)Inventors: Christophe Fringant, Vincent Bodart, Berengere Rixens, Romain Severac, Yves Hervaud, Patrick Lacroix-Desmazes, Bernard Boutevin
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Publication number: 20070155929Abstract: Radical polymerization process for the preparation of halogenated polymers employing one or more ethylenically unsaturated monomers, at least one of which is chosen from halogenated monomers, molecular iodine and one or more radical-generating agents chosen from diazo compounds, peroxides and dialkyl diphenylalkanes Radical polymerization process for the preparation, starting from the halogenated polymers prepared by the process as described above, of block copolymers, at least one block of which is a halogenated polymer block. Halogenated polymers which have a number-average molecular mass Mn of greater than 1.0×104 and an Mz/Mw ratio of less than 1.65. Block copolymers, at least one block of which is a block of halogenated polymer identical to the halogenated polymers described above. Block copolymers comprising at least one halogenated polymer block which have a number-average molecular mass Mn of greater than 1.5×104 and a polydispersity index Mw/Mn of less than 1.60.Type: ApplicationFiled: March 16, 2007Publication date: July 5, 2007Applicant: SOLVAY (SOCIETE ANONYME)Inventors: Patrick LACROIX-DESMAZES, Romain Severac, Bernard Boutevin, Vincent Bodart, Vincent Kurowski
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Patent number: 7208558Abstract: Radical polymerization process for the preparation of halogenated polymers employing one or more ethylenically unsaturated monomers, at least one of which is chosen from halogenated monomers, molecular iodine and one or more radical-generating agents chosen from diazo compounds, peroxides and dialkyl diphenylalkanes Radical polymerization process for the preparation, starting from the halogenated polymers prepared by the process as described above, of block copolymers, at least one block of which is a halogenated polymer block. Halogenated polymers which have a number-average molecular mass Mn of greater than 1.0×104 and an Mz/Mw ratio of less than 1.65. Block copolymers, at least one block of which is a block of halogenated polymer identical to the halogenated polymers described above. Block copolymers comprising at least one halogenated polymer block which have a number-average molecular mass Mn of greater than 1.5×104 and a polydispersity index Mw/Mn of less than 1.60.Type: GrantFiled: May 11, 2006Date of Patent: April 24, 2007Assignee: Solvay (Societe Anonyme)Inventors: Patrick Lacroix-Desmazes, Romain Severac, Bernard Boutevin, Vincent Bodart, Vincent Kurowski
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Publication number: 20070066781Abstract: Process for preparing one or more iodinated organic substances having a molecular mass of less than 2000 (substances (S)) using (A) at least one free-radical-generating substance chosen from peroxides, diazo compounds, dialkyldiphenylalkanes, substances derived from tetraphenylethane, boranes and iniferter substances comprising at least one thiuram disulphide group, (B) an ethylenically unsaturated substance capable of adding a free radical to its ethylenic double bond, (C) molecular iodine, which comprises the steps according to which at least a fraction of (A), at least a fraction of (B) and at least a fraction of (C) are introduced into a reactor, and then the contents of the reactor are caused to react, while introducing therein the possible remainder of (A), the possible remainder of (B) and the possible remainder of (C), until a moment is reached when the content of the reactor is a mixture comprising one or more substances (S).Type: ApplicationFiled: April 22, 2004Publication date: March 22, 2007Applicant: SOLVAY (SOCIETE ANONYME)Inventors: Patrick Lacroix-Desmazes, Romain Severac, Bernard Boutevin, Vincent Bodart, Vincent Kurowski
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Publication number: 20060258798Abstract: A method for the dispersion of water-soluble or hydrophilic substances in a supercritically pressurized fluid by adding a surfactant said surfactant being a block copolymer comprising at least one CO2-philic block and at least one nonionic hydrophilic block.Type: ApplicationFiled: April 23, 2004Publication date: November 16, 2006Inventors: Joel Richard, Frantz Deschamps, Patrick Lacroix-Desmazes, Bernard Boutevin
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Publication number: 20060205906Abstract: Radical polymerization process for the preparation of halogenated polymers employing one or more ethylenically unsaturated monomers, at least one of which is chosen from halogenated monomers, molecular iodine and one or more radical-generating agents chosen from diazo compounds, peroxides and dialkyl diphenylalkanes Radical polymerization process for the preparation, starting from the halogenated polymers prepared by the process as described above, of block copolymers, at least one block of which is a halogenated polymer block. Halogenated polymers which have a number-average molecular mass Mn of greater than 1.0×104 and an Mz/Mw ratio of less than 1.65. Block copolymers, at least one block of which is a block of halogenated polymer identical to the halogenated polymers described above. Block copolymers comprising at least one halogenated polymer block which have a number-average molecular mass Mn of greater than 1.5×104 and a polydispersity index Mw/Mn of less than 1.60.Type: ApplicationFiled: May 11, 2006Publication date: September 14, 2006Applicant: SOLVAY (SOCIETE ANONYME)Inventors: Patrick Lacroix-Desmazes, Romain Severac, Bernard Boutevin, Vincent Bodart, Vincent Kurowski