Abstract: A substrate includes an opaque chrome coating on a surface of the substrate dry-etched to form an aperture, wherein chrome in the aperture is below detectable limit. A method of forming an opaque chrome coating on a substrate includes depositing an initial thickness of the opaque chrome coating on the substrate without ion-assist or with undetectable ion-assist and depositing the remainder of the opaque chrome coating with or without ion-assist. In one embodiment the invention is directed to an apertured optical element having a substrate transmissive to light and an opaque chrome coating on the substrate defining an aperture. Three- and four-layer opaque coatings of various materials are disclosed, including three-layer chrome/chrome oxide/chrome coatings.

Abstract: A substrate includes an opaque chrome coating on a surface of the substrate dry-etched to form an aperture, wherein chrome in the aperture is below detectable limit. A method of forming an opaque chrome coating on a substrate includes depositing an initial thickness of the opaque chrome coating on the substrate without ion-assist or with undetectable ion-assist and depositing the remainder of the opaque chrome coating with or without ion-assist. In one embodiment the invention is directed to an apertured optical element having a substrate transmissive to light and an opaque chrome coating on the substrate defining an aperture. Three- and four-layer opaque coatings of various materials are disclosed, including three-layer chrome/chrome oxide/chrome coatings.

Abstract: The present invention provides a method of manufacturing optical devices which includes the steps of providing a substrate and forming at least one optical layer on the substrate. The optical layer is formed by a chemical vapor deposition (CVD) process which includes a deuterated source gas. The present invention also provides an optical device which includes a substrate and an optical layer including deuterium.

Abstract: The present invention provides a method of manufacturing optical devices which includes the steps of providing a substrate and forming at least one optical layer on the substrate. The optical layer is formed by a chemical vapor deposition (CVD) process which includes a deuterated source gas. The present invention also provides an optical device which includes a substrate and an optical layer including deuterium.

Abstract: The present invention provides a method of manufacturing optical devices which includes the steps of providing a substrate and forming at least one optical layer on the substrate. The optical layer is formed by a CVD process which includes a deuterated source gas. The present invention also provides an optical device which includes a substrate and an optical layer including deuterium.

Abstract: Polarizing glass having localized regions or patterns of non-polarizing glass is disclosed. The glass is formed by use of reducing gas-blocking material, by local thermal heating of the glass, or by an etching technique.

Abstract: Polarizing glass having localized regions or patterns of non-polarizing glass is disclosed. The glass is formed by use of reducing gas-blocking material, by local thermal heating of the glass, or by an etching technique.

Abstract: A method for producing a glass panel for silicon device fabrication, which method comprises forming a noncrystalline, or mixed-phase, silicon film on a glass substrate, the glass having a strain point greater than 560.degree. C., and subjecting the filmed glass to a heat treatment comprising heating at a temperature of at least 550.degree. C. for a period of time sufficient to convert the silicon film to polycrystalline silicon and to compact the glass.

Abstract: A metod for making a photochromic glass article exhibiting a surface color pattern wherein a silver halide-containing photochromic glass article is treated by exposing at least a portion of the surface thereof to a patterned heat source for a time sufficient to raise the temperature of at least a part of the exposed portion above about 450.degree. C., is described. The glass may be exposed to the patterned heat source either before or after thermal reduction coloring. Patterned heating to a temperature in the transformation range of the glass is used where a post-patterning thermal reduction coloration step is to be used, in order to render the glass resistant to reduction coloration in the patterned area.

Abstract: A method and apparatus for molding precision optical quality glass elements having complex and concave surfaces requires the apportionment of relative movement between two opposing mold surfaces. First and second molds are contained within a floating alignment sleeve, thereby defining a mold cavity within which an essentially arbitrarily-shaped glass preform is placed. The first mold is moved in the alignment sleeve until stopped by a calibrated standoff. Thereafter, pressing is continued with the second mold moving in the alignment sleeve until opposing surfaces are completely formed at substantially the same time.

Abstract: A method for substantially increasing the refractive index change induced in porous glass through metal oxide deposition by photolysis of organometallic compounds present therein, according to which the photolyzed glass is re-impregnated with additional organometallic compounds which undergo decomposition reactions catalyzed by the photolyzed organometallics or oxides resulting from the initial photolysis step. Enhancements of ten times the original refractive index change are attainable.

Abstract: An optical apparatus for focusing at least one image and optionally only one image of an object, said apparatus comprising a receiving surface and an optical imaging device between the image and the object to form an image of the object on the receiving surface. The imaging device comprising at least one glass body, at least a portion of which is a photonucleated opacified glass. The body has opposed surfaces, at least one of the surfaces having raised light focusing transparent optical pattern portions integral therewith and transparent channels connecting the raised transparent pattern portions to the surface opposed to the surface containing the pattern.

Abstract: An integral optical device is disclosed that is composed of a photosensitive glass having an optical pattern developed therein by a refractive index change due to formation of colloidal metal particles and/or crystalline microphases nucleated by such particles. In a specific embodiment the pattern is composed of at least one transparent lens system having a radial gradient refractive index distribution of prescribed nature.

Abstract: An integral optical imaging device is disclosed in which two or more porous glass bodies, embodying arrays of cylindrical gradient index lens systems, are rigidly maintained in a stacked relationship such that the lens systems are in register. This enhances the accumulative lens power and effective thickness of the device.

Abstract: There is disclosed an improved integral optical device of the type produced by creating optical patterns in porous glass bodies, especially patterns involving gradient refractive index distributions. The optical strength of an element, such as a lens, in such an optical pattern is increased by treatment with a polymerizable, organo functional silicone fluid while the matrix glass is sealed.