Patents by Inventor Paul Alan Stockman

Paul Alan Stockman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190094715
    Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photo-lithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.
    Type: Application
    Filed: November 28, 2018
    Publication date: March 28, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Andrew John HARPHAM, Paul John Shechter, Paul Alan Stockman
  • Patent number: 10168624
    Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photolithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.
    Type: Grant
    Filed: December 28, 2017
    Date of Patent: January 1, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Andrew John Harpham, Paul John Shechter, Paul Alan Stockman
  • Publication number: 20180120715
    Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photolithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.
    Type: Application
    Filed: December 28, 2017
    Publication date: May 3, 2018
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Andrew John HARPHAM, Paul John SHECHTER, Paul Alan STOCKMAN
  • Patent number: 9857699
    Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photo-lithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.
    Type: Grant
    Filed: November 28, 2016
    Date of Patent: January 2, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Andrew John Harpham, Paul John Shechter, Paul Alan Stockman
  • Publication number: 20170075233
    Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photo-lithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.
    Type: Application
    Filed: November 28, 2016
    Publication date: March 16, 2017
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Andrew John HARPHAM, Paul John SHECHTER, Paul Alan STOCKMAN
  • Patent number: 9507270
    Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photo-lithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.
    Type: Grant
    Filed: August 26, 2014
    Date of Patent: November 29, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Andrew John Harpham, Paul John Shechter, Paul Alan Stockman
  • Publication number: 20140362358
    Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photo-lithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.
    Type: Application
    Filed: August 26, 2014
    Publication date: December 11, 2014
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Andrew John HARPHAM, Paul John SHECHTER, Paul Alan STOCKMAN
  • Patent number: 8830440
    Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photolithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.
    Type: Grant
    Filed: July 20, 2011
    Date of Patent: September 9, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Andrew John Harpham, Paul John Shechter, Paul Alan Stockman
  • Publication number: 20130276820
    Abstract: Methods and apparatus for the cleaning PECVD chambers that utilize molecular fluorine as the cleaning material.
    Type: Application
    Filed: August 10, 2011
    Publication date: October 24, 2013
    Inventors: Jean-Charles Cigal, Ying-Siang Hwang, Paul Alan Stockman, Richard Hogle, Stefan Petri
  • Publication number: 20130239988
    Abstract: Methods and apparatus for the cleaning reaction chambers using molecular fluorine as the cleaning material. The molecular fluorine is dissociated in-situ in the reaction chamber using the chamber RF power source.
    Type: Application
    Filed: August 18, 2011
    Publication date: September 19, 2013
    Inventors: Jean-Charles Cigal, Ying-siang Hwang, Paul Alan Stockman, Stefan Petri
  • Publication number: 20130220364
    Abstract: Methods and apparatus for the cleaning reactor box chambers using molecular fluorine as the cleaning material. The molecular fluorine is dissociated in-situ in the chamber using the chamber RF power source.
    Type: Application
    Filed: August 11, 2011
    Publication date: August 29, 2013
    Inventors: Jean-Charles Cigal, Stefan Petri, Paul Alan Stockman, Oliver Knieling
  • Patent number: 8164734
    Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photo-lithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.
    Type: Grant
    Filed: December 19, 2008
    Date of Patent: April 24, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Andrew John Harpham, Paul John Shechter, Paul Alan Stockman
  • Publication number: 20120092950
    Abstract: A system and method for consistent and highly accurate blending of fluids; e.g. gases or liquids, without significant pressure drop. The system uses a flow meter to measure the amount of primary fluid being provided for mixing with the amount of diluent fluid controlled based on such measurement of the primary fluid amount.
    Type: Application
    Filed: October 15, 2010
    Publication date: April 19, 2012
    Inventors: Bertrand Michel Jean-Claude Colomb, Dennis Precourt, David L. Ruppert, Paul Alan Stockman
  • Publication number: 20110273681
    Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photo-lithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.
    Type: Application
    Filed: July 20, 2011
    Publication date: November 10, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Andrew John HARPHAM, Paul John Shechter, Paul Alan Stockman
  • Publication number: 20110041872
    Abstract: A system and method for performing rapid chamber cleaning is described. The use of F2 as the source gas for an RPS to form fluorine radicals used in the chamber cleaning operation allows chamber cleaning to proceed at an initial rapid rate without requiring ramp up of the cleaning gas flow. This results in more rapid cleaning and significantly shorter cleaning cycles. This is useful in semiconductor manufacturing, particular, for flat panel displays and solar photo voltaic devices.
    Type: Application
    Filed: February 19, 2009
    Publication date: February 24, 2011
    Inventors: Richard Allen Hogle, Paul Alan Stockman, Partick Helly
  • Publication number: 20090201471
    Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photo-lithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.
    Type: Application
    Filed: December 19, 2008
    Publication date: August 13, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Andrew John HARPHAM, Paul John Shechter, Paul Alan Stockman
  • Patent number: 7481867
    Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photolithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.
    Type: Grant
    Filed: June 16, 2004
    Date of Patent: January 27, 2009
    Assignee: Edwards Limited
    Inventors: Andrew John Harpham, Paul John Shechter, Paul Alan Stockman
  • Patent number: 7368000
    Abstract: A method is described for recovering a noble gas, such as xenon or krypton, from a first gas mixture comprising a plurality of components, one of which is the noble gas and the others are typically helium and/or nitrogen, argon, and relatively light fluorocarbons. The gas mixture is first conveyed to a gas chromatography column for separating the noble gas from the other components of the gas mixture. As the noble gas travels relatively slowly through the column, the other components are exhausted from the column before the relatively slow noble gas. Following the exhaust of these other components, a purge gas is supplied to the column to flush the noble gas therefrom. A second gas mixture comprising the noble gas and the purge gas is conveyed from the column to a membrane separator to separate the second gas mixture into a noble gas-rich gas stream and a purge gas-rich gas stream, which may be recirculated back to the column for re-use.
    Type: Grant
    Filed: December 22, 2004
    Date of Patent: May 6, 2008
    Assignee: The BOC Group plc
    Inventors: Ravi Jain, Julian Richard Dean, Robert Bruce Grant, Naum Perelman, Paul Alan Stockman, Neil Condon, Andrew John Harpham, William R. Gerristead, Jr.
  • Publication number: 20060130649
    Abstract: A method is described for recovering a noble gas, such as xenon or krypton, from a first gas mixture comprising a plurality of components, one of which is the noble gas and the others are typically helium and/or nitrogen, argon, and relatively light fluorocarbons. The gas mixture is first conveyed to a gas chromatography column for separating the noble gas from the other components of the gas mixture. As the noble gas travels relatively slowly through the column, the other components are exhaust from the column before the relatively slow noble gas. Following the exhaust of these other components, a purge gas is supplied to the column to flush the noble gas therefrom. A second gas mixture comprising the noble gas and the purge gas is conveyed from the column to a membrane separator to separate the second gas mixture into a noble gas-rich gas stream and a purge gas-rich gas stream, which may be recirculated back to the column for re-use.
    Type: Application
    Filed: December 22, 2004
    Publication date: June 22, 2006
    Inventors: Ravi Jain, Julian Richard Dean, Robert Bruce Grant, Naum Perelman, Paul Alan Stockman, Neil Condon, Andrew John Harpham