Patents by Inventor Paul Alan Stockman
Paul Alan Stockman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20190094715Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photo-lithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.Type: ApplicationFiled: November 28, 2018Publication date: March 28, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Andrew John HARPHAM, Paul John Shechter, Paul Alan Stockman
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Patent number: 10168624Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photolithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.Type: GrantFiled: December 28, 2017Date of Patent: January 1, 2019Assignee: ASML Netherlands B.V.Inventors: Andrew John Harpham, Paul John Shechter, Paul Alan Stockman
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Publication number: 20180120715Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photolithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.Type: ApplicationFiled: December 28, 2017Publication date: May 3, 2018Applicant: ASML NETHERLANDS B.V.Inventors: Andrew John HARPHAM, Paul John SHECHTER, Paul Alan STOCKMAN
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Patent number: 9857699Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photo-lithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.Type: GrantFiled: November 28, 2016Date of Patent: January 2, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Andrew John Harpham, Paul John Shechter, Paul Alan Stockman
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Publication number: 20170075233Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photo-lithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.Type: ApplicationFiled: November 28, 2016Publication date: March 16, 2017Applicant: ASML NETHERLANDS B.V.Inventors: Andrew John HARPHAM, Paul John SHECHTER, Paul Alan STOCKMAN
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Patent number: 9507270Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photo-lithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.Type: GrantFiled: August 26, 2014Date of Patent: November 29, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Andrew John Harpham, Paul John Shechter, Paul Alan Stockman
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Publication number: 20140362358Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photo-lithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.Type: ApplicationFiled: August 26, 2014Publication date: December 11, 2014Applicant: ASML NETHERLANDS B.V.Inventors: Andrew John HARPHAM, Paul John SHECHTER, Paul Alan STOCKMAN
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Patent number: 8830440Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photolithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.Type: GrantFiled: July 20, 2011Date of Patent: September 9, 2014Assignee: ASML Netherlands B.V.Inventors: Andrew John Harpham, Paul John Shechter, Paul Alan Stockman
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Publication number: 20130276820Abstract: Methods and apparatus for the cleaning PECVD chambers that utilize molecular fluorine as the cleaning material.Type: ApplicationFiled: August 10, 2011Publication date: October 24, 2013Inventors: Jean-Charles Cigal, Ying-Siang Hwang, Paul Alan Stockman, Richard Hogle, Stefan Petri
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Publication number: 20130239988Abstract: Methods and apparatus for the cleaning reaction chambers using molecular fluorine as the cleaning material. The molecular fluorine is dissociated in-situ in the reaction chamber using the chamber RF power source.Type: ApplicationFiled: August 18, 2011Publication date: September 19, 2013Inventors: Jean-Charles Cigal, Ying-siang Hwang, Paul Alan Stockman, Stefan Petri
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Publication number: 20130220364Abstract: Methods and apparatus for the cleaning reactor box chambers using molecular fluorine as the cleaning material. The molecular fluorine is dissociated in-situ in the chamber using the chamber RF power source.Type: ApplicationFiled: August 11, 2011Publication date: August 29, 2013Inventors: Jean-Charles Cigal, Stefan Petri, Paul Alan Stockman, Oliver Knieling
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Patent number: 8164734Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photo-lithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.Type: GrantFiled: December 19, 2008Date of Patent: April 24, 2012Assignee: ASML Netherlands B.V.Inventors: Andrew John Harpham, Paul John Shechter, Paul Alan Stockman
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Publication number: 20120092950Abstract: A system and method for consistent and highly accurate blending of fluids; e.g. gases or liquids, without significant pressure drop. The system uses a flow meter to measure the amount of primary fluid being provided for mixing with the amount of diluent fluid controlled based on such measurement of the primary fluid amount.Type: ApplicationFiled: October 15, 2010Publication date: April 19, 2012Inventors: Bertrand Michel Jean-Claude Colomb, Dennis Precourt, David L. Ruppert, Paul Alan Stockman
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Publication number: 20110273681Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photo-lithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.Type: ApplicationFiled: July 20, 2011Publication date: November 10, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Andrew John HARPHAM, Paul John Shechter, Paul Alan Stockman
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Publication number: 20110041872Abstract: A system and method for performing rapid chamber cleaning is described. The use of F2 as the source gas for an RPS to form fluorine radicals used in the chamber cleaning operation allows chamber cleaning to proceed at an initial rapid rate without requiring ramp up of the cleaning gas flow. This results in more rapid cleaning and significantly shorter cleaning cycles. This is useful in semiconductor manufacturing, particular, for flat panel displays and solar photo voltaic devices.Type: ApplicationFiled: February 19, 2009Publication date: February 24, 2011Inventors: Richard Allen Hogle, Paul Alan Stockman, Partick Helly
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Publication number: 20090201471Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photo-lithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.Type: ApplicationFiled: December 19, 2008Publication date: August 13, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Andrew John HARPHAM, Paul John Shechter, Paul Alan Stockman
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Patent number: 7481867Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photolithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.Type: GrantFiled: June 16, 2004Date of Patent: January 27, 2009Assignee: Edwards LimitedInventors: Andrew John Harpham, Paul John Shechter, Paul Alan Stockman
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Patent number: 7368000Abstract: A method is described for recovering a noble gas, such as xenon or krypton, from a first gas mixture comprising a plurality of components, one of which is the noble gas and the others are typically helium and/or nitrogen, argon, and relatively light fluorocarbons. The gas mixture is first conveyed to a gas chromatography column for separating the noble gas from the other components of the gas mixture. As the noble gas travels relatively slowly through the column, the other components are exhausted from the column before the relatively slow noble gas. Following the exhaust of these other components, a purge gas is supplied to the column to flush the noble gas therefrom. A second gas mixture comprising the noble gas and the purge gas is conveyed from the column to a membrane separator to separate the second gas mixture into a noble gas-rich gas stream and a purge gas-rich gas stream, which may be recirculated back to the column for re-use.Type: GrantFiled: December 22, 2004Date of Patent: May 6, 2008Assignee: The BOC Group plcInventors: Ravi Jain, Julian Richard Dean, Robert Bruce Grant, Naum Perelman, Paul Alan Stockman, Neil Condon, Andrew John Harpham, William R. Gerristead, Jr.
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Publication number: 20060130649Abstract: A method is described for recovering a noble gas, such as xenon or krypton, from a first gas mixture comprising a plurality of components, one of which is the noble gas and the others are typically helium and/or nitrogen, argon, and relatively light fluorocarbons. The gas mixture is first conveyed to a gas chromatography column for separating the noble gas from the other components of the gas mixture. As the noble gas travels relatively slowly through the column, the other components are exhaust from the column before the relatively slow noble gas. Following the exhaust of these other components, a purge gas is supplied to the column to flush the noble gas therefrom. A second gas mixture comprising the noble gas and the purge gas is conveyed from the column to a membrane separator to separate the second gas mixture into a noble gas-rich gas stream and a purge gas-rich gas stream, which may be recirculated back to the column for re-use.Type: ApplicationFiled: December 22, 2004Publication date: June 22, 2006Inventors: Ravi Jain, Julian Richard Dean, Robert Bruce Grant, Naum Perelman, Paul Alan Stockman, Neil Condon, Andrew John Harpham