Abstract: A device for injecting a medicament is provided. The device has a housing with a container within it which can hold a medicament. At its proximal end the container has a needle and a stopper. The device includes a plunger which at one end can engage the stopper. At the opposite end, the plunger can engage a first resilient member to move the stopper within the container to inject the medicament from the container. The device includes a collar with distal and proximal ends, the distal end engaging with a carriage and causing its rotation and the proximal end engaging with a second resilient member. The second resilient member can engage with a skin sensor which has distal and proximal ends. At the proximal end, the skin sensor can contact an injection site. The housing has a cap which can reduce or prevent movement of the skin sensor.

Abstract: A device for injecting a medicament is provided. The device has a housing with a container within it which can hold a medicament. At its proximal end the container has a needle and a stopper. The device includes a plunger which at one end can engage the stopper. At the opposite end, the plunger can engage a first resilient member to move the stopper within the container to inject the medicament from the container. The device includes a collar with distal and proximal ends, the distal end engaging with a carriage and causing its rotation and the proximal end engaging with a second resilient member. The second resilient member can engage with a skin sensor which has distal and proximal ends. At the proximal end, the skin sensor can contact an injection site. The housing has a cap which can reduce or prevent movement of the skin sensor.

Abstract: The invention relates to apparatus for polishing a running base that comprises a blade with two opposing blade edges separated one from the other by an intermediate section; the polishing apparatus comprising: a support body, and blade alignment guide means; wherein the support body is capable of carrying a polishing surface which comprises: a profile which is adapted to conform with one or more portions of the intermediate section; and wherein the blade alignment guide means comprise one or more pairs of first and second blade alignment guides, which first and second blade alignment guides in each pair are separated from each other by the polishing surface, and further wherein the blade alignment guide means is adapted to receive and/or guide and/or constrain a running base so that when the intermediate section between the two edges of the running base is brought into contact with the polishing surface, there is no contact between the polishing surface and any part of the two opposing blade edges of the runn

Abstract: The present invention relates to inhaler devices (701), and in particular to devices provided with medicament carriers containing individual pockets or blisters of powdered medicament covered by a lidding sheet such as a lidding foil. A common actuator (710) is provided for controlling movement of an indexing system (712,714) for advancing/indexing a dose and an opening system (790,791) for opening a dose such that progression of the opening system (790,791) is disproportional to progression of the indexing system (712,714) during movement of the common actuator (710).

Abstract: The invention relates to apparatus for polishing a running base that comprises a blade with two opposing blade edges separated one from the other by an intermediate section; the polishing apparatus comprising: a support body, and blade alignment guide means; wherein the support body is capable of carrying a polishing surface which comprises: a profile which is adapted to conform with one or more portions of the intermediate section; and wherein the blade alignment guide means comprise one or more pairs of first and second blade alignment guides, which first and second blade alignment guides in each pair are separated from each other by the polishing surface, and further wherein the blade alignment guide means is adapted to receive and/or guide and/or constrain a running base so that when the intermediate section between the two edges of the running base is brought into contact with the polishing surface, there is no contact between the polishing surface and any part of the two opposing blade edges of the runn