Patents by Inventor Paul Deaton
Paul Deaton has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11927321Abstract: The present disclosure sets forth a motion sensing outdoor security light with the flexibility of being mounted to either a wall structure or to an eave or ceiling structure. An adjustable spherical motion sensor housing may be provided with the rotationally adjustable outdoor security light, allowing easy adjustment of motion detection ranges under different mounting schemes without comprising the aesthetic design of the light. The adjustable spherical motion sensor housing may also provide an enlarged horizontal field of view for better performance. Sensitivity of a motion sensor may be adjusted via a control circuit based on adjustment of the spherical motion sensor housing.Type: GrantFiled: November 21, 2022Date of Patent: March 12, 2024Assignee: HEATHCO LLCInventors: Miles William McDonald, Kushagra Dixit, Scott Blaise Tylicki, Apollo Paul Paredes, Lionel V. Luu, John Colvin Deaton
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Patent number: 11913622Abstract: The present disclosure sets forth a motion sensing outdoor security light with the flexibility of being mounted to either a wall structure or to an eave or ceiling structure. An adjustable spherical motion sensor housing may be provided with the rotationally adjustable outdoor security light, allowing easy adjustment of motion detection ranges under different mounting schemes without comprising the aesthetic design of the light. The adjustable spherical motion sensor housing may also provide an enlarged horizontal field of view for better performance.Type: GrantFiled: January 25, 2023Date of Patent: February 27, 2024Assignee: HEATHCO LLCInventors: Miles William McDonald, Kushagra Dixit, Scott Blaise Tylicki, Apollo Paul Paredes, Lionel V. Luu, John Colvin Deaton
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Publication number: 20230260652Abstract: Systems and methods can perform self-supervised machine learning for improved medical image analysis. As one example, self-supervised learning on ImageNet, followed by additional self-supervised learning on unlabeled medical images from the target domain of interest, followed by fine-tuning on labeled medical images from the target domain significantly improves the accuracy of medical image classifiers such as, for example diagnostic models. Another example aspect of the present disclosure is directed to a novel Multi-Instance Contrastive Learning (MICLe) method that uses multiple different medical images that share one or more attributes (e.g., multiple images that depict the same underlying pathology and/or the same patient) to construct more informative positive pairs for self-supervised learning.Type: ApplicationFiled: December 10, 2021Publication date: August 17, 2023Inventors: Shekoofeh Azizi, Wen Yau Aaron Loh, Zachary William Beaver, Ting Chen, Jonathan Paul Deaton, Jan Freyberg, Alan Prasana Karthikesalingam, Simon Kornblith, Basil Mustafa, Mohammad Norouzi, Vivek Natarajan, Fiona Keleher Ryan
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Patent number: 11685265Abstract: A trailer can be configured to selectively provide powered wheels, energy recovery, and/or parasitic power source charging. A trailer-related trigger (drive activation trigger, an energy recovery trigger, or a parasitic charging trigger) can be detected. When a drive activation trigger is detected, one or more motors can be activated to power one or more wheels of the trailer, thereby providing extra pushing power. When an energy recovery trigger is detected, one or more power sources of the trailer can be charged by recovering energy from the trailer. When a parasitic charging trigger is detected, one or more power sources of the trailer can be charged using a portion of the power generated by a main vehicle operatively connected to the trailer.Type: GrantFiled: November 19, 2019Date of Patent: June 27, 2023Inventors: Paul Deaton, Larry Deaton
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Publication number: 20200276904Abstract: A trailer can be configured to selectively provide powered wheels, energy recovery, and/or parasitic power source charging. A trailer-related trigger (drive activation trigger, an energy recovery trigger, or a parasitic charging trigger) can be detected. When a drive activation trigger is detected, one or more motors can be activated to power one or more wheels of the trailer, thereby providing extra pushing power. When an energy recovery trigger is detected, one or more power sources of the trailer can be charged by recovering energy from the trailer. When a parasitic charging trigger is detected, one or more power sources of the trailer can be charged using a portion of the power generated by a main vehicle operatively connected to the trailer.Type: ApplicationFiled: November 19, 2019Publication date: September 3, 2020Inventors: Paul Deaton, Larry Deaton
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Patent number: 9829805Abstract: A photoresist vapor deposition system includes: a vacuum chamber having a heating element and cooled chuck for holding a substrate, the vacuum chamber having a heated inlet; and a vapor deposition system connected to the heated inlet for volatilizing a precursor into the vacuum chamber for condensing a photoresist over the substrate cooled by the cooled chuck. The deposition system creates a semiconductor wafer system that includes: a semiconductor wafer; and a vapor deposited photoresist over the semiconductor wafer. An extreme ultraviolet lithography system requiring the semiconductor wafer system includes: an extreme ultraviolet light source; a mirror for directing light from the extreme ultraviolet light source; a reticle stage for imaging the light from the extreme ultraviolet light source; and a wafer stage for placing a semiconductor wafer with a vapor deposited photoresist.Type: GrantFiled: November 21, 2016Date of Patent: November 28, 2017Assignee: APPLIED MATERIALS, INC.Inventors: Timothy Michaelson, Timothy W. Weidman, Barry Lee Chin, Majeed Foad, Paul Deaton
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Patent number: 9632411Abstract: A photoresist vapor deposition system includes: a vacuum chamber having a heating element and cooled chuck for holding a substrate, the vacuum chamber having a heated inlet; and a vapor deposition system connected to the heated inlet for volatilizing a precursor into the vacuum chamber for condensing a photoresist over the substrate cooled by the cooled chuck. The deposition system creates a semiconductor wafer system that includes: a semiconductor wafer; and a vapor deposited photoresist over the semiconductor wafer. An extreme ultraviolet lithography system requiring the semiconductor wafer system includes: an extreme ultraviolet light source; a mirror for directing light from the extreme ultraviolet light source; a reticle stage for imaging the light from the extreme ultraviolet light source; and a wafer stage for placing a semiconductor wafer with a vapor deposited photoresist.Type: GrantFiled: December 23, 2013Date of Patent: April 25, 2017Assignee: Applied Materials, Inc.Inventors: Timothy Michaelson, Timothy W. Weidman, Barry Lee Chin, Majeed Foad, Paul Deaton
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Publication number: 20170068174Abstract: A photoresist vapor deposition system includes: a vacuum chamber having a heating element and cooled chuck for holding a substrate, the vacuum chamber having a heated inlet; and a vapor deposition system connected to the heated inlet for volatilizing a precursor into the vacuum chamber for condensing a photoresist over the substrate cooled by the cooled chuck. The deposition system creates a semiconductor wafer system that includes: a semiconductor wafer; and a vapor deposited photoresist over the semiconductor wafer. An extreme ultraviolet lithography system requiring the semiconductor wafer system includes: an extreme ultraviolet light source; a mirror for directing light from the extreme ultraviolet light source; a reticle stage for imaging the light from the extreme ultraviolet light source; and a wafer stage for placing a semiconductor wafer with a vapor deposited photoresist.Type: ApplicationFiled: November 21, 2016Publication date: March 9, 2017Inventors: Timothy Michaelson, Timothy W. Weidman, Barry Lee Chin, Majeed Foad, Paul Deaton
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Patent number: 9236467Abstract: Provided are methods of depositing hafnium or zirconium containing metal alloy films. Certain methods comprise sequentially exposing a substrate surface to alternating flows of an organometallic precursor and a reductant comprising M(BH4)4 to produce a metal alloy film on the substrate surface, wherein M is selected from hafnium and zirconium, and the organometallic precursor contains a metal N. Gate stacks are described comprising a copper barrier layer comprising boron, a first metal M selected from Hf and Zr, and a second metal N selected from tantalum, tungsten, copper, ruthenium, rhodium, cobalt and nickel; and a copper layer overlying the copper barrier seed layer.Type: GrantFiled: February 19, 2014Date of Patent: January 12, 2016Assignee: Applied Materials, Inc.Inventors: Timothy W. Weidman, Timothy Michaelson, Paul F. Ma, Paul Deaton
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Publication number: 20140268082Abstract: A photoresist vapor deposition system includes: a vacuum chamber having a heating element and cooled chuck for holding a substrate, the vacuum chamber having a heated inlet; and a vapor deposition system connected to the heated inlet for volatilizing a precursor into the vacuum chamber for condensing a photoresist over the substrate cooled by the cooled chuck. The deposition system creates a semiconductor wafer system that includes: a semiconductor wafer; and a vapor deposited photoresist over the semiconductor wafer. An extreme ultraviolet lithography system requiring the semiconductor wafer system includes: an extreme ultraviolet light source; a mirror for directing light from the extreme ultraviolet light source; a reticle stage for imaging the light from the extreme ultraviolet light source; and a wafer stage for placing a semiconductor wafer with a vapor deposited photoresist.Type: ApplicationFiled: December 23, 2013Publication date: September 18, 2014Applicant: Applied Materials, Inc.Inventors: Timothy Michaelson, Timothy W. Weidman, Barry Lee Chin, Majeed Foad, Paul Deaton
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Publication number: 20140231930Abstract: Provided are methods of depositing hafnium or zirconium containing metal alloy films. Certain methods comprise sequentially exposing a substrate surface to alternating flows of an organometallic precursor and a reductant comprising M(BH4)4 to produce a metal alloy film on the substrate surface, wherein M is selected from hafnium and zirconium, and the organometallic precursor contains a metal N. Gate stacks are described comprising a copper barrier layer comprising boron, a first metal M selected from Hf and Zr, and a second metal N selected from tantalum, tungsten, copper, ruthenium, rhodium, cobalt and nickel; and a copper layer overlying the copper barrier seed layer.Type: ApplicationFiled: February 19, 2014Publication date: August 21, 2014Inventors: Timothy W. Weidman, Timothy Michaelson, Paul F. Ma, Paul Deaton
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Patent number: 8536068Abstract: Methods for forming photoresists sensitive to radiation on substrate are provided. Atomic layer deposition methods of forming films (e.g., silicon-containing films) photoresists are described. The process can be repeated multiple times to deposit a plurality of silicon photoresist layers. Process of depositing photoresist and forming patterns in photoresist are also disclosed which utilize carbon containing underlayers such as amorphous carbon layers.Type: GrantFiled: October 6, 2011Date of Patent: September 17, 2013Assignee: Applied Materials, Inc.Inventors: Timothy W. Weidman, Timothy Michaelson, Paul Deaton
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Patent number: 8465903Abstract: Methods for forming photoresists sensitive to radiation on a substrate are provided. Described are chemical vapor deposition methods of forming films (e.g., silicon-containing films) as photoresists using a plasma which may be exposed to radiation to form a pattern. The deposition methods utilize precursors with cross-linkable moieties that will cross-link upon exposure to radiation. Radiation may be carried out in the with or without the presence of oxygen. Exposed or unexposed areas may then be developed in an aqueous base developer.Type: GrantFiled: October 6, 2011Date of Patent: June 18, 2013Assignee: Applied Materials, Inc.Inventors: Timothy W. Weidman, Timothy Michaelson, Paul Deaton, Nitin K. Ingle, Abhijit Basu Mallick, Amit Chatterjee
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Publication number: 20130113085Abstract: Provided are low temperature methods of depositing hafnium or zirconium containing films using a Hf(BH4)4 precursor, or Zr(BH4)4 precursor, respectively, as well as a co-reactant. The co-reactant can be selected to obtain certain film compositions. Co-reactants comprising an oxidant can be used to deposit oxygen into the film. Accordingly, also provided are films comprising a metal, boron and oxygen, wherein the metal comprises hafnium where a Hf(BH4)4 precursor is used, or zirconium, where a Zr(BH4)4 precursor is used.Type: ApplicationFiled: November 4, 2011Publication date: May 9, 2013Applicant: Applied Materials, Inc.Inventors: Timothy Michaelson, Timothy W. Weidman, Paul Deaton
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Publication number: 20130115778Abstract: Provided methods of etching and/or patterning films. Certain methods comprise exposing at least part of a film on a substrate, the film comprising one or more of HfO2, HfBxOy, ZrO2, ZrBxOy, to a plasma comprising BCl3 and argon to etch away said at least part of the film. Certain other methods relate to patterning substrates using said methods of etching films.Type: ApplicationFiled: August 22, 2012Publication date: May 9, 2013Applicant: Applied Materials, Inc.Inventors: Jun Xue, Jie Liu, Yongmei Chen, Timothy Michaelson, Paul Deaton, Timothy W. Weidman, Christopher S. Ngai
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Publication number: 20120088193Abstract: Methods for forming photoresists sensitive to radiation on a substrate are provided. Described are chemical vapor deposition methods of forming films (e.g., silicon-containing films) as photoresists using a plasma which may be exposed to radiation to form a pattern. The deposition methods utilize precursors with cross-linkable moieties that will cross-link upon exposure to radiation. Radiation may be carried out in the with or without the presence of oxygen. Exposed or unexposed areas may then be developed in an aqueous base developer.Type: ApplicationFiled: October 6, 2011Publication date: April 12, 2012Applicant: Applied Materials, Inc.Inventors: Timothy W. Weidman, Timothy Michaelson, Paul Deaton, Nitin K. Ingle, Abhijit Basu Mallick, Amit Chatterjee
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Publication number: 20120088369Abstract: Methods for forming photoresists sensitive to radiation on substrate are provided. Atomic layer deposition methods of forming films (e.g., silicon-containing films) photoresists are described. The process can be repeated multiple times to deposit a plurality of silicon photoresist layers. Process of depositing photoresist and forming patterns in photoresist are also disclosed which utilize carbon containing underlayers such as amorphous carbon layers.Type: ApplicationFiled: October 6, 2011Publication date: April 12, 2012Applicant: Applied Materials, Inc.Inventors: Timothy W. Weidman, Timothy Michaelson, Paul Deaton
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Patent number: 7794544Abstract: The embodiments of the invention describe a process chamber, such as an ALD chamber, that has gas delivery conduits with gradually increasing diameters to reduce Joule-Thompson effect during gas delivery, a ring-shaped gas liner leveled with the substrate support to sustain gas temperature and to reduce gas flow to the substrate support backside, and a gas reservoir to allow controlled delivery of process gas. The gas conduits with gradually increasing diameters, the ring-shaped gas liner, and the gas reservoir help keep the gas temperature stable and reduce the creation of particles.Type: GrantFiled: October 26, 2007Date of Patent: September 14, 2010Assignee: Applied Materials, Inc.Inventors: Son T. Nguyen, Kedarnath Sangam, Miriam Schwartz, Kenric Choi, Sanjay Bhat, Pravin K. Narwankar, Shreyas Kher, Rahul Sharangapani, Shankar Muthukrishnan, Paul Deaton
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Patent number: 7775508Abstract: A method and apparatus for providing a precursor to a process chamber is described. The apparatus comprises an ampoule capable of receiving either a liquid precursor source material or a solid precursor source material. The ampoule is capable of delivering either a liquid precursor material to a vaporizer coupled to the process chamber, or a vaporized or gaseous precursor material to the process chamber. The ampoule also includes a continuous level sensor to accurately monitor the level of precursor source material within the ampoule.Type: GrantFiled: October 31, 2006Date of Patent: August 17, 2010Assignee: Applied Materials, Inc.Inventors: Kenric T. Choi, Pravin K. Narwankar, Shreyas S. Kher, Son T. Nguyen, Paul Deaton, Khai Ngo, Paul Chhabra, Alan H. Ouye, Dien-Yeh (Daniel) Wu
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Publication number: 20080099933Abstract: A method and apparatus for providing a precursor to a process chamber is described. The apparatus comprises an ampoule capable of receiving either a liquid precursor source material or a solid precursor source material. The ampoule is capable of delivering either a liquid precursor material to a vaporizer coupled to the process chamber, or a vaporized or gaseous precursor material to the process chamber. The ampoule also includes a continuous level sensor to accurately monitor the level of precursor source material within the ampoule.Type: ApplicationFiled: October 31, 2006Publication date: May 1, 2008Inventors: Kenric T. Choi, Pravin K. Narwankar, Shreyas S. Kher, Son T. Nguyen, Paul Deaton, Khai Ngo, Paul Chhabra, Alan H. Ouye, Dien-Yeh (Daniel) Wu