Abstract: A system and method to perform calibrated assays in reusable microplates, the method including steps of illuminating a microplate having wells and a microplate identifier, with a probe signal, detecting an uncalibrated return signal, reading the microplate identifier, retrieving, from a database by use of the microplate identifier, a calibration factor for each well in the microplate, calibrating the return signal for each well by use of the respective calibration factor for said well, and outputting the calibrated return signal as said calibrated assay. The system includes a microplate, comprising a plurality of wells and a microplate identifier, a reader to read the microplate identifier, a probe signal source and return signal detector, wherein a return signal comprises a probe signal after interaction with the plurality of wells, a calibration database to store the microplate identifier associated with return signal measurements, and a processor to perform the method.

Abstract: Disclosed is a liquid cleaning mixture used to remove DMSO and other solvents and compounds that may build up on the surface of dielectric barrier material in a plasma cleaning device, where the DMSO, solvent and compounds have become contaminants.

Abstract: Disclosed is a liquid cleaning mixture used to remove DMSO and other solvents and compounds that may build up on the surface of dielectric barrier material in a plasma cleaning device, where the DMSO, solvent and compounds have become contaminants.

Abstract: An apparatus and method to clean a substrate and to verify an effectiveness of the cleaning is disclosed. The method includes scanning substrate to generate a pre-cleaning data by using a first mechanism; cleaning substrate by using a second mechanism; scanning substrate to generate a post-cleaning data by using the first mechanism; and generating at least one contamination characteristic based on a comparison between the pre-cleaning data and the post-cleaning data. The contamination characteristic is analyzed for evidence of a contaminant in order to verify effectiveness of the cleaning. Process parameters may be adjusted based upon feedback from the effectiveness of the cleaning.

Abstract: A system to generate plasma to clean at least one object, the apparatus comprising a microplate with an electrode support array comprising a plurality of matched pairs of elongated dielectric barrier members connected to a plurality of electrodes, with said dielectric barrier members of said matched pair being spaced at a pre-determined non-uniform gap, a variable time scale pulsed power source electrically coupled to said electrodes to provide electrical pulses and a plurality of electronic components to control polarity of said electrical pulses, such that said pulses produce electron streamers from opposing elongated dielectric barrier members of said plurality of matched pairs and charge on a surface of said dielectric barrier member is substantially evenly distributed.

Abstract: Apparatus and methods for generating and optimizing a plasma discharge are provided. The device includes a plasma generating device, one or more sensors, and at least one controller for adjusting the plasma in light of the sensed characteristics. Methods for optimizing a plasma, particularly a spatially disoriented plasma discharge include generating a plasma, sensing one or more plasma characteristics, modifying one or more plasma generating properties to optimize the plasma.

Abstract: Apparatus and methods for generating and optimizing a plasma discharge are provided. The device includes a plasma generating device, one or more sensors, and at least one controller for adjusting the plasma in light of the sensed characteristics. Methods for optimizing a plasma, particularly a spatially disoriented plasma discharge include generating a plasma, sensing one or more plasma characteristics, modifying one or more plasma generating properties to optimize the plasma.

Abstract: Disclosed is a liquid cleaning mixture used to remove DMSO and other solvents and compounds that may build up on the surface of dielectric barrier material in a plasma cleaning device, where the DMSO, solvent and compounds have become contaminants.