Patents by Inventor Paul Graupner
Paul Graupner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9285685Abstract: In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.Type: GrantFiled: April 24, 2014Date of Patent: March 15, 2016Assignees: ASML NETHERLANDS B.V., CARL ZEISS SMT GmbHInventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Adrianus Franciscus Petrus Engelen, Jozef Maria Finders, Paul Gräupner, Johannes Catharinus Hubertus Mulkens, Jan Bernard Plechelmus Van Schoot
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Patent number: 9146475Abstract: A projection exposure system includes an illumination system configured to illuminate a mask with radiation. The projection exposure system also includes a projection objective configured to project an image of a pattern of the mask onto a radiation-sensitive substrate. The projection exposure system further includes an angle-selective filter arrangement arranged at or close to a field surface of the projection objective in a projection beam path optically downstream of the object surface. The angle-selective filter arrangement is effective to filter radiation incident on the filter arrangement according to an angle-selective filter function.Type: GrantFiled: March 5, 2013Date of Patent: September 29, 2015Assignee: Carl Zeiss SMT GmbHInventors: Paul Gräupner, Olaf Conradi, Christoph Zaczek, Wilhelm Ulrich, Helmut Beierl, Toralf Gruner, Volker Graeschus
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Patent number: 9144239Abstract: The invention relates to macrocyclic picolinamides of Formula I and their use as fungicides.Type: GrantFiled: May 28, 2014Date of Patent: September 29, 2015Assignee: Dow AgroSciences LLCInventors: Kevin G. Meyer, Jr., Karla Bravo-Altamirano, James M. Renga, Jessica Herrick, Benjamin Nugent, Timothy Boebel, Fangzheng Li, Nick X. Wang, W. John Owen, Paul Graupner, Chenglin Yao, Ronald J. Heemstra
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Publication number: 20140293248Abstract: In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.Type: ApplicationFiled: April 24, 2014Publication date: October 2, 2014Applicants: ASML NETHERLANDS B.V., CARL ZEISS SMT AGInventors: Bob STREEFKERK, Johannes Jacobus Matheus BASELMANS, Adrianus Franciscus Petrus ENGELEN, Jozef Maria FINDERS, Paul GRÄUPNER, Johannes Catharinus Hubertus MULKENS, Jan Bernard Plechelmus VAN SCHOOT
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Publication number: 20140275171Abstract: The invention relates to macrocyclic picolinamides of Formula I and their use as fungicides.Type: ApplicationFiled: May 28, 2014Publication date: September 18, 2014Inventors: Kevin G. Meyer, JR., Karla Bravo-Altamirano, James M. Renga, Jessica Herrick, Benjamin Nugent, Timothy Boebel, Fangzheng Li, Nick X. Wang, W. John Owen, Paul Graupner, Chenglin Yao, Ronald J. Heemstra
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Patent number: 8570486Abstract: An immersion lithography apparatus includes a liquid supply system configured to supply a liquid to a space through which a beam of radiation passes, the liquid having an optical property that can be tuned by a tuner. The space may be located between the projection system and the substrate. The tuner is arranged to adjust one or more properties of the liquid such as the shape, composition, refractive index and/or absorptivity as a function of space and/or time in order to change the imaging performance of the lithography apparatus.Type: GrantFiled: April 13, 2012Date of Patent: October 29, 2013Assignees: ASML Netherlands B.V., Carl Zeiss SMT AGInventors: Johannes Catharinus Hubertus Mulkens, Johannes Jacobus Matheus Baselmans, Paul Graupner, Erik Roelof Loopstra, Bob Streefkerk
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Publication number: 20130182234Abstract: A projection exposure system includes an illumination system configured to illuminate a mask with radiation. The projection exposure system also includes a projection objective configured to project an image of a pattern of the mask onto a radiation-sensitive substrate. The projection exposure system further includes an angle-selective filter arrangement arranged at or close to a field surface of the projection objective in a projection beam path optically downstream of the object surface. The angle-selective filter arrangement is effective to filter radiation incident on the filter arrangement according to an angle-selective filter function.Type: ApplicationFiled: March 5, 2013Publication date: July 18, 2013Applicant: Carl Zeiss SMT GmbHInventors: Paul Graupner, Olaf Conradi, Christoph Zaczek, Wilhelm Ulrich, Helmut Beierl, Toralf Gruner, Volker Graeschus
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Patent number: 8472006Abstract: The joint between the projection system element and its support comprises an inorganic layer or a direct bond and is thus liquid tight, which can prevent deformation by an immersion liquid. The joint can be made either warm or cold. Solders, glue, and glue protection can all be used in the formation of this joint. In an embodiment, the elements and its support are made of quartz.Type: GrantFiled: May 8, 2009Date of Patent: June 25, 2013Assignees: ASML Netherlands B.V., Carl Zeiss SMT GmbHInventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Paul Graupner, Jan Haisma, Nicodemus Hattu, Christiaan Alexander Hoogendam, Erik Roelof Loopstra, Johannes Catharinus Hubertus Mulkens, Bernard Gellrich
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Publication number: 20120194790Abstract: An immersion lithography apparatus includes a liquid supply system configured to supply a liquid to a space through which a beam of radiation passes, the liquid having an optical property that can be tuned by a tuner. The space may be located between the projection system and the substrate. The tuner is arranged to adjust one or more properties of the liquid such as the shape, composition, refractive index and/or absorptivity as a function of space and/or time in order to change the imaging performance of the lithography apparatus.Type: ApplicationFiled: April 13, 2012Publication date: August 2, 2012Applicants: CARL ZEISS SMT AG, ASML NETHERLANDS B.V.Inventors: Johannes Catharinus Hubertus Mulkens, Johannes Jacobus Matheus Baselmans, Paul Graupner, Erik Roelof Loopstra, Bob Streefkerk
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Patent number: 8174674Abstract: An immersion lithography apparatus includes a liquid supply system configured to supply a liquid to a space through which a beam of radiation passes, the liquid having an optical property that can be tuned by a tuner. The space may be located between the projection system and the substrate. The tuner is arranged to adjust one or more properties of the liquid such as the shape, composition, refractive index and/or absorptivity as a function of space and/or time in order to change the imaging performance of the lithography apparatus.Type: GrantFiled: September 9, 2008Date of Patent: May 8, 2012Assignees: ASML Netherlands B.V., Carl Zeiss SMT AGInventors: Johannes Catharinus Hubertus Mulkens, Johannes Jacobus Matheus Baselmans, Paul Graupner, Erik Roelof Loopstra, Bob Streefkerk
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Patent number: 7715107Abstract: An optical element for correcting aberrations in an optical apparatus has a casing. The casing is filled with liquid and has a support layer and a cover layer designed to pass light of a predetermined wavelength range. The casing accommodates several actuators. Each actuator has a first end supporting the cover layer and a second end supporting the support layer. Each actuator is able to locally change a local distance between the support layer and the cover layer to correct for local aberrations in a light beam directed to the optical element by providing local phase shifts. The optical element may be used in a lithographic apparatus.Type: GrantFiled: April 25, 2006Date of Patent: May 11, 2010Assignees: ASML Netherlands B.V., Carl Zeiss SMT AGInventors: Erik Roelof Loopstra, Paul Graupner, Johannes Catharinus Hubertus Mulkens
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Publication number: 20090214986Abstract: The joint between the projection system element and its support comprises an inorganic layer or a direct bond and is thus liquid tight, which can prevent deformation by an immersion liquid. The joint can be made either warm or cold. Solders, glue, and glue protection can all be used in the formation of this joint. In an embodiment, the elements and its support are made of quartz.Type: ApplicationFiled: May 8, 2009Publication date: August 27, 2009Applicants: ASML NETHERLANDS B.V., CARL ZEISS SMT AGInventors: Bob STREEFKERK, Johannes Jacobus Matheus BASELMANS, Paul GRAUPNER, Jan HAISMA, Nicodemus HATTU, Christiaan Alexander HOOGENDAM, Erik Roelof LOOPSTRA, Johannes Catharinus Hubertus MULKENS, Bernard GELLRICH
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Patent number: 7545481Abstract: The joint between the projection system element and its support comprises an inorganic layer or a direct bond and is thus liquid tight, which can prevent deformation by an immersion liquid. The joint can be made either warm or cold. Solders, glue, and glue protection can all be used in the formation of this joint. In an embodiment, the elements and its support are made of quartz.Type: GrantFiled: November 24, 2003Date of Patent: June 9, 2009Assignees: ASML Netherlands B.V., Carl Zeiss SMT AGInventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Paul Graupner, Jan Haisma, Nicodemus Hattu, Christiaan Alexander Hoogendam, Erik Roelof Loopstra, Johannes Catharinus Hubertus Mulkens, Bernard Gellrich
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Publication number: 20090021707Abstract: An immersion lithography apparatus includes a liquid supply system configured to supply a liquid to a space through which a beam of radiation passes, the liquid having an optical property that can be tuned by a tuner. The space may be located between the projection system and the substrate. The tuner is arranged to adjust one or more properties of the liquid such as the shape, composition, refractive index and/or absorptivity as a function of space and/or time in order to change the imaging performance of the lithography apparatus.Type: ApplicationFiled: September 9, 2008Publication date: January 22, 2009Applicants: ASML NETHERLANDS B.V., CARLZEISS SMT AGInventors: Johannes Catharinus Hubertus Mulkens, Johannes Jacobus Matheus Baselmans, Paul Graupner, Erik Roelof Loopstra, Bob Streefkerk
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Patent number: 7433015Abstract: An immersion lithography apparatus includes a liquid supply system configured to supply a liquid to a space through which a beam of radiation passes, the liquid having an optical property that can be tuned by a tuner. The space may be located between the projection system and the substrate. The tuner is arranged to adjust one or more properties of the liquid such as the shape, composition, refractive index and/or absorptivity as a function of space and/or time in order to change the imaging performance of the lithography apparatus.Type: GrantFiled: October 12, 2004Date of Patent: October 7, 2008Assignees: ASML Netherlands B.V., Carl Zeiss SMT AGInventors: Johannes Catharinus Hubertus Mulkens, Johannes Jacobus Matheus Baselmans, Paul Graupner, Erik Roelof Loopstra, Bob Streefkerk
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Publication number: 20080096956Abstract: The present invention is related to the use of malonomicin compounds and derivatives in fungicidal applications and to new derivatives of malonomicin.Type: ApplicationFiled: January 20, 2006Publication date: April 24, 2008Inventors: Todd Werk, Carl Snipes, Paul Graupner, Cathy Peacock, Eleanor Chapin, William Brewster, Frederick Green
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Publication number: 20080068599Abstract: In order to optimize the image properties of several optical elements of which at least one is moved relative to at least one stationary optical element, the overall image defect resulting from the interaction of all optical elements is first of all measured. This is represented as a linear combination of the base functions of an orthogonal function set. The movable element is then moved to a new measurement position and the overall image defect is measured once again. After the linear combination representation of the new overall image defect, the image defects of the movable element and of the stationary element are calculated from the data thereby obtained. With only one movable optical element a target position in which the overall image defect is minimized can be directly calculated and adjusted there from. If several movable optical elements are available, methods are given for the efficient determination of the respective target position.Type: ApplicationFiled: November 16, 2007Publication date: March 20, 2008Applicant: Carl Zeiss SMT AGInventors: Bernd Geh, Paul Graupner, Thomas Stammler, Dirk Stenkamp, Jochen Stuhler, Klaus Wurmbrand
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Patent number: 7301622Abstract: In order to optimize the image properties of several optical elements of which at least one is moved relative to at least one stationary optical element, the overall image defect resulting from the interaction of all optical elements is first of all measured. This is represented as a linear combination of the base functions of an orthogonal function set. The movable element is then moved to a new measurement position and the overall image defect is measured once again. After the linear combination representation of the new overall image defect, the image defects of the movable element and of the stationary element are calculated from the data thereby obtained. With only one movable optical element a target position in which the overall image defect is minimized can be directly calculated and adjusted there from. If several movable optical elements are available, methods are given for the efficient determination of the respective target position.Type: GrantFiled: July 22, 2005Date of Patent: November 27, 2007Assignee: Carl Zeiss SMT AGInventors: Bernd Geh, Paul Gräupner, Thomas Stammler, Dirk Stenkamp, Jochen Stühler, Klaus Wurmbrand
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Publication number: 20070247605Abstract: An optical element for correcting aberrations in an optical apparatus has a casing. The casing is filled with liquid and has a support layer and a cover layer designed to pass light of a predetermined wavelength range. The casing accommodates several actuators. Each actuator has a first end supporting the cover layer and a second end supporting the support layer. Each actuator is able to locally change a local distance between the support layer and the cover layer to correct for local aberrations in a light beam directed to the optical element by providing local phase shifts. The optical element may be used in a lithographic apparatus.Type: ApplicationFiled: April 25, 2006Publication date: October 25, 2007Applicant: ASML Netherlands B.V.Inventors: Erik Loopstra, Paul Graupner, Johannes Mulkens
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Publication number: 20070173539Abstract: The present invention is related to the use of malonomicin compounds and derivatives in fungicidal applications and to new derivatives of malonomicin.Type: ApplicationFiled: January 20, 2006Publication date: July 26, 2007Inventors: Todd Werk, Carl Snipes, Paul Graupner, Cathy Peacock, Eleanor Chapin, William Brewster, Frederick Green