Abstract: Elevation mechanisms for table saws and anti-backdrive mechanisms for use in elevation mechanisms for table saws are disclosed. The anti-backdrive mechanisms typically include three sub-assemblies: an input assembly, an output assembly, and a fixed assembly. The anti-backdrive mechanisms prevent a torque related to the output assembly from changing the blade elevation. For example, the weight of the blade and the structure supporting the blade is prevented from backdriving the elevation mechanism and allowing the blade to drop.

Abstract: Elevation mechanisms for table saws and anti-backdrive mechanisms for use in elevation mechanisms for table saws are disclosed. The anti-backdrive mechanisms typically include three sub-assemblies: an input assembly, an output assembly, and a fixed assembly. The anti-backdrive mechanisms prevent a torque related to the output assembly from changing the blade elevation. For example, the weight of the blade and the structure supporting the blade is prevented from backdriving the elevation mechanism and allowing the blade to drop.

Abstract: Table saws and features for table saws are disclosed. Some of the disclosed features are particularly relevant to portable table saws such as jobsite and bench-top table saws. Disclosed features include, but are not limited to, extendable rails, mechanisms to lock rails in position, drawers, compartments and components to store table saw accessories, switch boxes, dust collection systems, table saw housings, tables, and handles.

Abstract: A dust collection system designed for a table saw is disclosed. The dust collection system includes a dust shroud and dust shield to channel dust generated by a blade as it cuts wood or other material. The dust shroud includes fins and walls to “peel” dust and air off a spinning blade and direct the dust and air downward. The dust shroud encloses the lower front portion of a blade. An insert with a channel into which a dust shield can extend is disclosed.

Abstract: Table saws and features for table saws are disclosed. Some of the disclosed features are particularly relevant to portable table saws such as jobsite and bench-top table saws. Disclosed features include, but are not limited to, extendable rails, mechanisms to lock rails in position, drawers, compartments and components to store table saw accessories, switch boxes, dust collection systems, table saw housings, tables, and handles.

Abstract: Elevation mechanisms for table saws and anti-backdrive mechanisms for use in elevation mechanisms for table saws are disclosed. The anti-backdrive mechanisms typically include three sub-assemblies: an input assembly, an output assembly, and a fixed assembly. The anti-backdrive mechanisms prevent a torque related to the output assembly from changing the blade elevation. For example, the weight of the blade and the structure supporting the blade is prevented from backdriving the elevation mechanism and allowing the blade to drop.

Abstract: A dust collection system designed for a table saw is disclosed. The dust collection system includes a dust shroud and dust shield to channel dust generated by a blade as it cuts wood or other material. The dust shroud includes fins and walls to “peel” dust and air off a spinning blade and direct the dust and air downward. The dust shroud encloses the lower front portion of a blade. An insert with a channel into which a dust shield can extend is disclosed.

Abstract: Elevation mechanisms for table saws and anti-backdrive mechanisms for use in elevation mechanisms for table saws are disclosed. The anti-backdrive mechanisms typically include three sub-assemblies: an input assembly, an output assembly, and a fixed assembly. The anti-backdrive mechanisms prevent a torque related to the output assembly from changing the blade elevation. For example, the weight of the blade and the structure supporting the blade is prevented from backdriving the elevation mechanism and allowing the blade to drop.

Abstract: Blade guards for power tools such as table saws are disclosed. The blade guard may include a shroud that pivots up and down to allow a workpiece to move past the guard, a dust collection channel, and a pivot joint which maintains the dust collection channel in an operable condition as the shroud pivots up or down. The guard may also include a wood stop and anti-kickback pawls. The blade guard may be part of a dust collection system and may be connected to a vacuum system by a conduit such as a flexible hose.

Abstract: A dust collection system designed for a table saw is disclosed. The dust collection system includes a dust shroud and dust shield to channel dust generated by a blade as it cuts wood or other material. The dust shroud includes fins and walls to “peel” dust and air off a spinning blade and direct the dust and air downward. The dust shroud encloses the lower front portion of a blade.

Abstract: An assembly for holding a substrate in a chemical mechanical planarization (CMP) apparatus is provided. The assembly includes a holder frame insertable into the chemical mechanical planarization apparatus, the holder frame having an inner wall. The assembly further includes at least one rolling mechanism rotatably mounted in the holder frame such that at least a portion of the rolling mechanism protrudes from the inner wall. The assembly also includes a wafer chuck movably mounted in the holder frame, the wafer chuck having a first side shaped to substantially conform to the inner wall and to be in continuous contact with the at least one rolling mechanism during planarization, and a second side adapted to receive a substrate for planarization. Also provided are an improved assembly for holding a substrate in a CMP apparatus and a method for reducing friction in a gimbaling mechanism of a wafer chuck in a wafer holder in a CMP apparatus during planarization.

Abstract: An assembly for holding a substrate in a chemical mechanical planarization (CMP) apparatus is provided. The assembly includes a holder frame insertable into the chemical mechanical planarization apparatus, the holder frame having an inner wall. The assembly further includes at least one rolling mechanism rotatably mounted in the holder frame such that at least a portion of the rolling mechanism protrudes from the inner wall. The assembly also includes a wafer chuck movably mounted in the holder frame, the wafer chuck having a first side shaped to substantially conform to the inner wall and to be in continuous contact with the at least one rolling mechanism during planarization, and a second side adapted to receive a substrate for planarization. Also provided are an improved assembly for holding a substrate in a CMP apparatus and a method for reducing friction in a gimbaling mechanism of a wafer chuck in a wafer holder in a CMP apparatus during planarization.