Patents by Inventor Paul Jacques Marion

Paul Jacques Marion has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7569716
    Abstract: Chemical grade silicon metalloid having improved performance in the direct process for making organohalosilanes is selected by (A) measuring the temperature of each batch of silicon metalloid during both the refining and the casting of the silicon metalloid; (B) measuring the elemental impurity levels in each batch of the silicon metalloid after refining of the silicon metalloid; (C) predicting the properties of the slag phase produced during refining of the silicon metalloid based on equilibrium calculations using the elemental impurity levels and the measured temperatures of each batch of silicon metalloid; and (D) selecting a chemical grade silicon metalloid for use in the direct process for making organohalosilanes based upon the predicted slag properties; such that the slag density, the viscosity, and the melting point of the slag, are within acceptable and predetermined ranges for each individual batch.
    Type: Grant
    Filed: March 15, 2005
    Date of Patent: August 4, 2009
    Assignee: Dow Corning Corporation
    Inventors: Vishu Dutt Dosaj, Michael George Kroupa, Paul Jacques Marion
  • Publication number: 20080233035
    Abstract: Chemical grade silicon metalloid having improved performance in the direct process for making organohalosilanes is selected by (A) measuring the temperature of each batch of silicon metalloid during both the refing and the casting of the silicon metalloid; (B) measuring the elemental impurity levels in each batch of the silicon metalloid after refining of the silicon metalloid; (C) predicting the properties of the slag phase produced during refining of the silicon metalloid, based on equilibrium calculations, using the elemental impurity levels and the measured temperatures of each batch of silicon metalloid; and (D) selecting a chemical grade silicon metalloid for use in the direct process for making organohalsilanes, based upon the predicted slag properties; such that the slag density, the viscosity, and the melting point of the slag, are within acceptable and predetermined ranges for each individual batch.
    Type: Application
    Filed: March 15, 2005
    Publication date: September 25, 2008
    Inventors: Vishu Dutt Dosaj, Michael George Kroupa, Paul Jacques Marion
  • Patent number: 5880307
    Abstract: A process for the use of water granulated silicon in the preparation of alkylhalosilanes. The process comprises contacting an alkyl halide described by formula RX, with a particulate water granulated silicon containing greater than 0.5 to about 5.0 weight percent iron, in the presence of a catalyst composition comprising copper, at a temperature within a range of about 250.degree. C. to 350.degree. C. where R is selected from the group consisting of alkyls comprising one to about four carbon atoms and X is a halogen.
    Type: Grant
    Filed: February 17, 1998
    Date of Patent: March 9, 1999
    Assignee: Dow Corning Corporation
    Inventors: Richard Dewayne Daugherty, Steven Kerry Freeburne, Paul Jacques Marion, Oliver K. Wilding, Jr.