Patents by Inventor Paul Klatser

Paul Klatser has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9397397
    Abstract: A phased-array antenna that includes a photonic beamformer is disclosed. In some embodiments, a front stage of electrical-domain processing applies a 16-to-1 signal-combination ratio, a single stage of photonic beamforming applies a 4-to-1 signal-combination ratio, and a passive, electrical-domain, signal combiner applies a 32-to-1 signal-combination ratio.
    Type: Grant
    Filed: October 3, 2012
    Date of Patent: July 19, 2016
    Assignee: Universiteit Twente
    Inventors: Willem Paul Beeker, Chris Gerardus Hermanus Roeloffzen, Leimeng Zhuang, Johannes Wilhelmus Eikenbroek, Paul Klatser, Paulus Wilhelmus Leonardus van Dijk
  • Patent number: 7593094
    Abstract: A system and method allow for a more effective and efficient patterning device architecture and control arrangement. A lithography apparatus comprises an illumination system, a patterning device, and a projection system. The illumination system is configured to condition a beam of radiation. The patterning device is configured to pattern the beam of radiation. The patterning device comprises a control system and an array of individually controllable elements. The control system is configured to convert analog signals having respective first voltage values to corresponding differential control signals having second, higher voltage values. Corresponding ones of the individually controllable elements in the array of individually controllable elements are configured to actuate based on receiving a corresponding one of the differential control signals. The projection system is configured to project the patterned beam onto a target area of a substrate.
    Type: Grant
    Filed: June 26, 2006
    Date of Patent: September 22, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Bert Pieter Van Drieƫnhuizen, Antonius Johannes Maria Montagne, Jeroen-Frank Dekkers, Paul Klatser, Marcus Hagting
  • Publication number: 20070296944
    Abstract: A system and method allow for a more effective and efficient patterning device architecture and control arrangement. A lithography apparatus comprises an illumination system, a patterning device, and a projection system. The illumination system is configured to condition a beam of radiation. The patterning device is configured to pattern the beam of radiation. The patterning device comprises a control system and an array of individually controllable elements. The control system is configured to convert analog signals having respective first voltage values to corresponding differential control signals having second, higher voltage values. Corresponding ones of the individually controllable elements in the array of individually controllable elements are configured to actuate based on receiving a corresponding one of the differential control signals. The projection system is configured to project the patterned beam onto a target area of a substrate.
    Type: Application
    Filed: June 26, 2006
    Publication date: December 27, 2007
    Applicant: ASML Netherlands B.V.
    Inventors: Bert Pieter Van Drieenhuizen, Anton Montagne, Jeroen-Frank Dekkers, Paul Klatser, Marcus Hagting
  • Patent number: 5834973
    Abstract: A voltage isolation circuit having an improved method of combining the HF path and LF path is provided. The LF path comprises an opto-isolator to achieve voltage isolation of the input signal while passing low frequencies. The HF path comprises a transformer to achieve voltage isolation of the input signal while passing high frequencies. The HF path and LF path are combined at a summing node to obtain an isolated input signal. Obtaining a flat frequency response requires that the cross-over frequency between the LF path and HF path be closely matched. A portion of the LF path is injected into the HF path such that LF components are canceled out in the region of the transition frequency. In this way, the pole frequency of the transformer in the HF path may be compensated for to achieve a flat frequency response for the combined LF and HF paths.
    Type: Grant
    Filed: May 1, 1997
    Date of Patent: November 10, 1998
    Assignee: Fluke Corporation
    Inventors: Paul Klatser, Egbert Jan Cornelis Kruisdijk
  • Patent number: 5790480
    Abstract: A method and apparatus for measuring very short time periods, or differences between two events, such as the delta-T between a trigger point on a waveform and a sampling clock edge of a digital oscilloscope. The delta-T measurements are made using the time-to-voltage transformation of an integrator. The output sweep ramp of the integrator is normalized to a fixed differential time and differential amplitude by correction current provided by a reference circuit that has a reference integrator substantially identical to the delta-T integrator. The reference integrator is operated at the same timing as the delta-T integrator, and an error correction loop furnishes the right amount of current to both integrators to normalize the peak voltage of both to a predetermined reference voltage.
    Type: Grant
    Filed: May 12, 1997
    Date of Patent: August 4, 1998
    Assignee: Fluke Corporation
    Inventor: Paul Klatser
  • Patent number: 5120984
    Abstract: A sawtooth generator for an oscilloscope which provides an accurate DC voltage control after flyback of the sawtooth voltage. The sawtooth generator includes a balance circuit in the control loop and an error amplifier with symmetrical outputs. A current-mirrored copy of the integration current is supplied as the tail current for the balance circuit. The control loop is thus forced to control around a zero error signal.
    Type: Grant
    Filed: August 22, 1991
    Date of Patent: June 9, 1992
    Assignee: U.S. Philips Corporation
    Inventor: Paul Klatser