Abstract: 3-D printing techniques including adhesion of acrylonitrile-butadiene-styrene deposited onto PVA sacrificial material (or vice versa) via the use of block co-polymers are disclosed. The addition of block polymers to PVA can be used for the adhesion of other FDM materials with PVA support materials. Other techniques include star, comb, ter-, tetrapolymers and the like; copolymers for adhesion of FDM materials to PVA or other support materials. The technique of block copolymer addition to PVA can also enhance the usefulness of PVA as a FDM material itself, either by enhancing its adhesion to support material, or by providing appropriate surface characteristics to the final part. The technique can also be used to enhance the adhesion of other support materials to the FDM part of interest. The technique can be used to allow for PVA to be used as the FDM material, while using a different support material, if any.

Abstract: A system is described for storing and generating hydrogen and, in particular, a system for storing and generating hydrogen for use in an H2/O2 fuel cell. The hydrogen storage system uses beta particles from a beta particle emitting material to degrade an organic polymer material to release substantially pure hydrogen. In a preferred embodiment of the invention, beta particles from 63Ni are used to release hydrogen from linear polyethylene.

Abstract: A system for storing and generating hydrogen generally and, in particular, a system for storing and generating hydrogen for use in an H2/O2 fuel cell. The hydrogen storage system uses the beta particles from a beta particle emitting material to degrade an organic polymer material to release substantially pure hydrogen. In a preferred embodiment of the invention, beta particles from 63Ni are used to release hydrogen from linear polyethylene.

Abstract: An electrical circuit for a photomultiplier tube (PMT) is disclosed that reduces power consumption to a point where the PMT may be powered for extended periods with a battery. More specifically, the invention concerns a PMT circuit comprising a low leakage switch and a high voltage capacitor positioned between a resistive divider and each of the PMT dynodes, and a low power control scheme for recharging the capacitors.

Abstract: A photoresist composition that employs onium salt carboxylates as thermally stable dissolution inhibitors. The photoresist composition can be either an onium carboxylate salt with a phenolic photoresist, such as novolac, or an onium cation protected carboxylate-containing resin such as an acrylic/acrylic acid copolymer. The onium carboxylate can be an onium cholate, wherein the onium cholate is an iodonium cholate. Particularly preferred iodonium cholates are alkyloxyphenylphenyl iodonium cholates and most particularly preferred is octyloxyphenyphenyl iodonium cholate. The photoresist composition will not create nitrogen or other gaseous byproducts upon exposure to radiation, does not require water for photoactivation, has acceptable UV radiation transmission characteristics, and is thermally stable at temperatures required for solvent removal.

Abstract: A substrate material for LIGA applications w hose general composition is Ti/Cu/Ti/SiO2. The SiO2 is preferably applied to the Ti/Cu/Ti wafer as a sputtered coating, typically about 100 nm thick. This substrate composition provides improved adhesion for epoxy-based photoresist materials, and particularly the photoresist material SU-8.

Abstract: A substrate material for LIGA applications w hose general composition is Ti/Cu/Ti/SiO2. The SiO2 is preferably applied to the Ti/Cu/Ti wafer as a sputtered coating, typically about 100 nm thick. This substrate composition provides improved adhesion for epoxy-based photoresist materials, and particularly the photoresist material SU-8.

Abstract: There is provided a light emitting device comprising a plurality of triboluminescent particles dispersed throughout a low density, frangible body and activated by rapidly crushing the body in order to transfer mechanical energy to some portion of the particles. The light emitted by these mechanically excited particles is collected and directed into a light conduit and transmitted to a detector/indicator means.

Abstract: A photoresist composition that employs onium salt carboxylates as thermally stable dissolution inhibitors. The photoresist composition can be either an onium carboxylate salt with a phenolic photoresist, such as novolac, or an onium cation protected carboxylate-containing resin such as an acrylic/acrylic acid copolymer. The onium carboxylate can be an onium cholate, wherein the onium cholate is an iodonium cholate. Particularly preferred iodonium cholates are alkyloxyphenylphenyl iodonium cholates and most particularly preferred is octyloxyphenyphenyl iodonium cholate. The photoresist composition will not create nitrogen or other gaseous byproducts upon exposure to radiation, does not require water for photoactivation, has acceptable UV radiation transmission characteristics, and is thermally stable at temperatures required for solvent removal.

Abstract: There is provided a light emitting device comprising a plurality of triboluminescent particles dispersed throughout a low density, frangible body and activated by rapidly crushing the body in order to transfer mechanical energy to some portion of the particles. The light emitted by these mechanically excited particles is collected and directed into a light conduit and transmitted to a detector/indicator means.

Abstract: A method of imaging acids in chemically amplified photoresists involves exposing to radiation a chemically amplified photoresist comprising a pH-dependent fluorophore. Upon exposure to radiation, such as deep-UV radiation, the chemically amplified photoresist produces an acid, which is then visualized by the fluorescence of the pH-dependent fluorophore. An image is generated from the fluorescence of the pH-dependent fluorophore, thus providing a map of the location of the acid in the photoresist. The images are able to be visualized prior to a post-exposure bake of the resist composition. Chemically amplified photoresists comprising pH-dependent fluorophores are useful in the practice of the present invention. The method finds particular use in examining the efficiency of photoacid generators in chemically amplified photoresists, in that it allows the practitioner the ability to directly determine the amount of acid generated within the photoresist.