Patents by Inventor Paul V. Avona

Paul V. Avona has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for cleaning a process chamber
    Patent number: 5693147
    Abstract: Fluorocarbon and water vapor are introduced directly into a plasma in a process chamber, not downstream from the plasma, thereby creating HF vapor to clean the process chamber. The process may also be used to remove a photoresist residue left remaining on a semiconductor wafer.
    Type: Grant
    Filed: November 3, 1995
    Date of Patent: December 2, 1997
    Assignee: Motorola, Inc.
    Inventors: Steven D. Ward, Paul V. Avona