Abstract: There is provided an improved solvent especially adapted for cleaning silicon wafers and consisting essentially of a haloalkylhydrocarbon and a partially fluorinated alcohol. This solvent provides excellent cleaning and drying of the wafer.

Abstract: There is provided a corrosion inhibiting alkoxy silane characterized by an alkyleneamino group attached to silicon through a Si--C linkage, a carbonyl or thiocarbonyl group attached to an amine group and a terminal group which may be saturated or unsaturated aliphatic or cycloaliphatic group containing 6 to 20 carbon atoms, a saturated or unsaturated aminoaliphatic or amino cycloaliphatic group containing 6-20 carbon atoms; NHNH.sub.2 ; NH(CH.sub.2).sub.n N(R).sub.2 ; or a ##STR1## group where R.sup.2 is a saturated or unsaturated alkyl or haloalkyl group containing 3 to 20 carbon atoms. The invention also provides a method of inhibiting corrosion of metal surfaces by applying a coating containing or consisting of a novel silane as above described.

Abstract: There is provided a novel class of alkoxy silanes useful as corrosion inhibitors for metal surfaces and characterized by an alkylene group attached to silicon through a Si--C linkage. These compounds also contain nitrogen as an amine or an imine group in a linear or cyclic structure. Sulfur and/or a carbonyl or thiocarbonyl group may also be present. The invention also provides a method of inhibiting corrosion of metal surfaces by applying a coating containing or consisting of a novel silane as above described.

Abstract: Novel terpenoid alkoxysilanes having the general formula: ##STR1## wherein Y is hydrogen or Si(R.sup.2).sub.n X.sub.m (OR.sup.3).sub.3-(N-m), Z is hydrogen or Si(R.sup.2).sub.n X.sub.m (OR.sup.3).sub.3-(n+m), one of Y and Z being Si(R.sup.2).sub.n X.sub.m (OR.sup.3).sub.3-(n+m), R.sup.2 and R.sup.3 being the same or different C.sub.1 -C.sub.3 alkyl group, X is halogen, m and n are independently selected from 1 and 0, and II W is Si(R.sup.2).sub.n X.sub.m (OR.sup.3).sub.3-(n+m), where R.sup.2, R.sup.3, X, n and m are as defined above.