Patents by Inventor Paul Willard Ackmann

Paul Willard Ackmann has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8010915
    Abstract: An optical proximity correction (OPC) method for photolithography applications can be utilized to reduce the processing time, cost, and post-OPC file size associated with conventional methods. The OPC method provides a target layout pattern that represents a corresponding mask pattern for a photolithography mask, and aligns the target layout pattern relative to a suitably dimensioned fragmentation grid. Then, at least one feature of the target layout pattern is fragmented using the fragmentation grid. Thereafter, a fragment data set is generated in response to the grid-based fragmentation of the target layout pattern.
    Type: Grant
    Filed: July 10, 2008
    Date of Patent: August 30, 2011
    Assignee: GLOBALFOUNDRIES, Inc.
    Inventors: Norman Shaowen Chen, Scott Goad, Paul Willard Ackmann
  • Publication number: 20100011335
    Abstract: An optical proximity correction (OPC) method for photolithography applications can be utilized to reduce the processing time, cost, and post-OPC file size associated with conventional methods. The OPC method provides a target layout pattern that represents a corresponding mask pattern for a photolithography mask, and aligns the target layout pattern relative to a suitably dimensioned fragmentation grid. Then, at least one feature of the target layout pattern is fragmented using the fragmentation grid. Thereafter, a fragment data set is generated in response to the grid-based fragmentation of the target layout pattern.
    Type: Application
    Filed: July 10, 2008
    Publication date: January 14, 2010
    Applicant: ADVANCED MICRO DEVICES, INC.
    Inventors: Norman Shaowen CHEN, Scott GOAD, Paul Willard ACKMANN