Patents by Inventor Paul William Scholtes-Van Eijk
Paul William Scholtes-Van Eijk has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20230280660Abstract: A mode control system and method for controlling an output mode of a broadband radiation source including a photonic crystal fiber (PCF). The mode control system includes at least one detection unit configured to measure one or more parameters of radiation emitted from the broadband radiation source to generate measurement data, and a processing unit configured to evaluate mode purity of the radiation emitted from the broadband radiation source, from the measurement data. Based on the evaluation, the mode control system is configured to generate a control signal for optimization of one or more pump coupling conditions of the broadband radiation source. The one or more pump coupling conditions relate to the coupling of a pump laser beam with respect to a fiber core of the photonic crystal fiber.Type: ApplicationFiled: May 11, 2023Publication date: September 7, 2023Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Sebastian Thomas BAUERSCHMIDT, Peter Maximilian GÖTZ, Patrick Sebastian UEBEL, Ronald Franciscus Herman HUGERS, Jan Adrianus BOER, Edwin Johannes Cornelis BOS, Andreas Johannes Antonius BROUNS, Vitaliy PROSYENTSOV, Paul William SCHOLTES - VAN EIJK, Paulus Antonius Andreas TEUNISSEN, Mahesh Upendra AJGAONKAR
-
Patent number: 11733617Abstract: An apparatus for receiving input radiation and broadening a frequency range of the input radiation to provide broadband output radiation. The apparatus includes a chamber, a fiber, a gas generating apparatus, and a radical generating apparatus. The fiber includes a hollow core configured to guide radiation propagating through the fiber, the hollow core in fluid communication with the chamber. The gas generating apparatus is configured to provide a gas within the chamber. The radical generating apparatus is configured to provide free radicals within the chamber to reduce contaminants in the gas. The apparatus may be included in a radiation source.Type: GrantFiled: January 11, 2022Date of Patent: August 22, 2023Assignee: ASML Netherlands B.V.Inventors: Patrick Sebastian Uebel, Sebastian Thomas Bauerschmidt, Paul William Scholtes-Van Eijk
-
Patent number: 11687009Abstract: A mode control system and method for controlling an output mode of a broadband radiation source including a photonic crystal fiber (PCF). The mode control system includes at least one detection unit configured to measure one or more parameters of radiation emitted from the broadband radiation source to generate measurement data, and a processing unit configured to evaluate mode purity of the radiation emitted from the broadband radiation source, from the measurement data. Based on the evaluation, the mode control system is configured to generate a control signal for optimization of one or more pump coupling conditions of the broadband radiation source. The one or more pump coupling conditions relate to the coupling of a pump laser beam with respect to a fiber core of the photonic crystal fiber.Type: GrantFiled: May 11, 2022Date of Patent: June 27, 2023Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Sebastian Thomas Bauerschmidt, Peter Maximilian Götz, Patrick Sebastian Uebel, Ronald Franciscus Herman Hugers, Jan Adrianus Boer, Edwin Johannes Cornelis Bos, Andreas Johannes Antonius Brouns, Vitaliy Prosyentsov, Paul William Scholtes-Van Eijk, Paulus Antonius Andreas Teunissen, Mahesh Upendra Ajgaonkar
-
Publication number: 20220269183Abstract: A mode control system and method for controlling an output mode of a broadband radiation source including a photonic crystal fiber (PCF). The mode control system includes at least one detection unit configured to measure one or more parameters of radiation emitted from the broadband radiation source to generate measurement data, and a processing unit configured to evaluate mode purity of the radiation emitted from the broadband radiation source, from the measurement data. Based on the evaluation, the mode control system is configured to generate a control signal for optimization of one or more pump coupling conditions of the broadband radiation source. The one or more pump coupling conditions relate to the coupling of a pump laser beam with respect to a fiber core of the photonic crystal fiber.Type: ApplicationFiled: May 11, 2022Publication date: August 25, 2022Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Sebastian Thomas Bauerschmidt, Peter Maximilian Götz, Patrick Sebastian Uebel, Ronald Franciscus Herman Hugers, Jan Adrianus Boer, Edwin Johannes Cornelis Bos, Andreas Johannes Antonius Brouns, Vitaliy Prosyentsov, Paul William Scholtes - Van Eijk, Paulus Antonius Andreas Teunissen, Mahesh Upendra Ajgaonkar
-
Patent number: 11360396Abstract: A mode control system and method for controlling an output mode of a broadband radiation source including a photonic crystal fiber (PCF). The mode control system includes at least one detection unit configured to measure one or more parameters of radiation emitted from the broadband radiation source to generate measurement data, and a processing unit configured to evaluate mode purity of the radiation emitted from the broadband radiation source, from the measurement data. Based on the evaluation, the mode control system is configured to generate a control signal for optimization of one or more pump coupling conditions of the broadband radiation source. The one or more pump coupling conditions relate to the coupling of a pump laser beam with respect to a fiber core of the photonic crystal fiber.Type: GrantFiled: August 27, 2020Date of Patent: June 14, 2022Assignees: ASML Netherlands B.V., ASML Holding N.V.Inventors: Sebastian Thomas Bauerschmidt, Peter Maximilian Götz, Patrick Sebastian Uebel, Ronald Franciscus Herman Hugers, Jan Adrianus Boer, Edwin Johannes Cornelis Bos, Andreas Johannes Antonius Brouns, Vitaliy Prosyentsov, Paul William Scholtes-Van Eijk, Paulus Antonius Andreas Teunissen, Mahesh Upendra Ajgaonkar
-
Publication number: 20220128912Abstract: An apparatus for receiving input radiation and broadening a frequency range of the input radiation to provide broadband output radiation. The apparatus includes a chamber, a fiber, a gas generating apparatus, and a radical generating apparatus. The fiber includes a hollow core configured to guide radiation propagating through the fiber, the hollow core in fluid communication with the chamber. The gas generating apparatus is configured to provide a gas within the chamber. The radical generating apparatus is configured to provide free radicals within the chamber to reduce contaminants in the gas. The apparatus may be included in a radiation source.Type: ApplicationFiled: January 11, 2022Publication date: April 28, 2022Applicant: ASML Netherlands B.V.Inventors: Patrick Sebastian Uebel, Sebastian Thomas Bauerschmidt, Paul William Scholtes-Van Eijk
-
Patent number: 11275313Abstract: Disclosed is a metrology apparatus for use in a lithographic manufacturing process. The metrology apparatus comprises a radiation source comprising a drive laser having an output split into a plurality of optical paths, each comprising a respective broadband light generator. The metrology apparatus further comprises illumination optics for illuminating a structure, at least one detection system for detecting scattered radiation, having been scattered by the structure and a processor for determining a parameter of interest of the structure from the scattered radiation.Type: GrantFiled: March 26, 2021Date of Patent: March 15, 2022Assignee: ASML Netherlands B.V.Inventors: Paul William Scholtes-Van Eijk, Ronald Franciscus Herman Hugers
-
Patent number: 11262665Abstract: An apparatus (100) for receiving input radiation (108) and broadening a frequency range of the input radiation so as to provide broadband output radiation (110). The apparatus comprises a fiber (102), wherein the fiber (102) may comprise a hollow core (104) for guiding radiation propagating through the fiber (102). The apparatus (100) further comprises an apparatus for providing a gas mixture (106) within the hollow core (104). The gas mixture (106) comprises a hydrogen component, and a working component, wherein the working component is for broadening a frequency range of a received input radiation (108) so as to provide the broadband output radiation (110). The apparatus may be included in a radiation source.Type: GrantFiled: March 24, 2020Date of Patent: March 1, 2022Assignee: ASML Netherlands B.V.Inventors: Patrick Sebastian Uebel, Sebastian Thomas Bauerschmidt, Paul William Scholtes-Van Eijk
-
Publication number: 20210240088Abstract: Disclosed is a metrology apparatus for use in a lithographic manufacturing process. The metrology apparatus comprises a radiation source comprising a drive laser having an output split into a plurality of optical paths, each comprising a respective broadband light generator. The metrology apparatus further comprises illumination optics for illuminating a structure, at least one detection system for detecting scattered radiation, having been scattered by the structure and a processor for determining a parameter of interest of the structure from the scattered radiation.Type: ApplicationFiled: March 26, 2021Publication date: August 5, 2021Applicant: ASML Netherlands B.V.Inventors: Paul William SCHOLTES - VAN EIJK, Ronald Franciscus Herman HUGERS
-
Patent number: 10990021Abstract: Disclosed is a metrology apparatus for use in a lithographic manufacturing process. The metrology apparatus comprises a radiation source comprising a drive laser having an output split into a plurality of optical paths, each comprising a respective broadband light generator. The metrology apparatus further comprises illumination optics for illuminating a structure, at least one detection system for detecting scattered radiation, having been scattered by the structure and a processor for determining a parameter of interest of the structure from the scattered radiation.Type: GrantFiled: February 13, 2020Date of Patent: April 27, 2021Assignee: ASML Netherlands B.V.Inventors: Paul William Scholtes-Van Eijk, Ronald Franciscus Herman Hugers
-
Publication number: 20210063894Abstract: A mode control system and method for controlling an output mode of a broadband radiation source including a photonic crystal fiber (PCF). The mode control system includes at least one detection unit configured to measure one or more parameters of radiation emitted from the broadband radiation source to generate measurement data, and a processing unit configured to evaluate mode purity of the radiation emitted from the broadband radiation source, from the measurement data. Based on the evaluation, the mode control system is configured to generate a control signal for optimization of one or more pump coupling conditions of the broadband radiation source. The one or more pump coupling conditions relate to the coupling of a pump laser beam with respect to a fiber core of the photonic crystal fiber.Type: ApplicationFiled: August 27, 2020Publication date: March 4, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Sebastian Thomas BAUERSCHMIDT, Peter Maximilian GÖTZ, Patrick Sebastian UEBEL, Ronald Franciscus Herman HUGERS, Jan Adrianus BOER, Edwin Johannes Cornelis BOS, Andreas Johannes Antonius BROUNS, Vitaliy PROSYENTSOV, Paul William SCHOLTES - VAN EIJK, Paulus Antonius Andreas TEUNISSEN, Mahesh Upendra AJGAONKAR
-
Publication number: 20200310251Abstract: An apparatus (100) for receiving input radiation (108) and broadening a frequency range of the input radiation so as to provide broadband output radiation (110). The apparatus comprises a fiber (102), wherein the fiber (102) may comprise a hollow core (104) for guiding radiation propagating through the fiber (102). The apparatus (100) further comprises an apparatus for providing a gas mixture (106) within the hollow core (104). The gas mixture (106) comprises a hydrogen component, and a working component, wherein the working component is for broadening a frequency range of a received input radiation (108) so as to provide the broadband output radiation (110). The apparatus may be included in a radiation source.Type: ApplicationFiled: March 24, 2020Publication date: October 1, 2020Applicant: ASML Netherlands B.V.Inventors: Patrick Sebastian UEBEL, Sebastian Thomas BAUERSCHMIDT, Paul William SCHOLTES-VAN EIJK
-
Publication number: 20200264521Abstract: Disclosed is a metrology apparatus for use in a lithographic manufacturing process. The metrology apparatus comprises a radiation source comprising a drive laser having an output split into a plurality of optical paths, each comprising a respective broadband light generator. The metrology apparatus further comprises illumination optics for illuminating a structure, at least one detection system for detecting scattered radiation, having been scattered by the structure and a processor for determining a parameter of interest of the structure from the scattered radiation.Type: ApplicationFiled: February 13, 2020Publication date: August 20, 2020Applicant: ASML Netherlands B.V.Inventors: Paul William SCHOLTES-VAN EIJK, Ronald Franciscus Herman HUGERS
-
Patent number: 8681308Abstract: An immersion lithographic apparatus is disclosed that includes a fluid confinement system configured to confine fluid to a space between a projection system and a substrate. The fluid confinement system includes a fluid inlet to supply fluid, the fluid inlet connected to an inlet port and an outlet port. The immersion lithographic apparatus further includes a fluid supply system configured to control fluid flow through the fluid inlet by varying the flow rate of fluid provided to the inlet port and the flow rate of fluid removed from the outlet port.Type: GrantFiled: September 13, 2007Date of Patent: March 25, 2014Assignee: ASML Netherlands B.V.Inventors: Paul Petrus Joannes Berkvens, Roelof Frederik De Graaf, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniel Jozef Maria Direcks, Franciscus Johannes Joseph Janssen, Paul William Scholtes-Van Eijk, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Mathieus Anna Karel Van Lierop, Christophe De Metsenaere, Marcio Alexandre Cano Miranda, Patrick Johannes Wilhelmus Spruytenburg, Joris Johan Anne-Marie Verstraete
-
Publication number: 20090073395Abstract: An immersion lithographic apparatus is disclosed that includes a fluid confinement system configured to confine fluid to a space between a projection system and a substrate. The fluid confinement system includes a fluid inlet to supply fluid, the fluid inlet connected to an inlet port and an outlet port. The immersion lithographic apparatus further includes a fluid supply system configured to control fluid flow through the fluid inlet by varying the flow rate of fluid provided to the inlet port and the flow rate of fluid removed from the outlet port.Type: ApplicationFiled: September 13, 2007Publication date: March 19, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Paul Petrus Joannes Berkvens, Roelof Frederik De Graaf, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Simons, Daniel Jozef Maria Direcks, Franciscus Johannes Joseph Janssen, Paul William Scholtes-Van Eijk, Gert-Jan Gerardus Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Mathieus Anna Karel Van Lierop, Christophe De Metsenaere, Marcio Alexandre Cano Miranda, Patrick Johannes Spruytenburg, Joris Johan Verstraete