Abstract: A charged particle beam device is provided including a particle source emitting a primary particle beam, a secondary particle beam generated by the impingement of the primary particle beam on the sample, a detection unit for detecting the secondary particle beam, the detector having at least two detector channels, and a distribution deflecting device for deflecting the secondary particle beam in a chronological sequence. Further, a detection assembly for a fast wafer inspection system is provided including a distribution deflecting device for distributing a secondary particle beam in a chronological sequence and a detector for detecting the secondary particle beam, the detector having multiple detector channels. Further, a method of operating a particle beam device with chronological resolution is provided.

Abstract: An assembly for a detection unit for an optical device is described. The assembly includes a scintillator adapted to received secondary particles and, in response, generate photons, wherein the scintillator includes an opening for trespassing of a primary beam through the scintillator. The scintillator including the opening is asymmetrical with regard to one axis.

Abstract: The present invention provides a charged particle beam device. The device comprises an emitter array for emitting a plurality of charged particle beams. The plurality of charged particle beams are imaged with a lens. An electrode unit is provided for accelerating the plurality of charged particle beams. The potential differences between a first potential of the emitter array, a second potential of the electrode unit, and a third potential of a specimen, are controlled by a first control unit and a second control unit. Thereby, the second potential is capable of accelerating the plurality of charged particle beams with respect to the first potential, and the third potential is capable of decelerating the plurality of charged particle beams with respect to the second potential.

Abstract: A method for operating a charged particle beam emitting device and, in particular, an electron beam emitting device including a cold field emitter is provided. The method includes the steps of placing the cold field emitter in a vacuum of a given pressure, the emitter exhibiting a high initial emission current I0 and a lower stable mean emission current IS under a given electric extraction field; applying the given electric extraction field to the emitter for emitting electrons from the emitter surface; performing a cleaning process by applying at least one heating pulse to the cold field emitter for heating the emitter surface, whereby the cleaning process is performed before the emission current of the cold field emitter has declined to the lower stable mean emission value IS; and repeating the cleaning process to keep the emission current of the emitter continuously above the substantially stable emission value IS.

Abstract: A charged particle beam device is described. The charged particle beam device includes an emitter adapted for emitting a primary charged particle beam, a specimen location adapted for holding a specimen, from which secondary and/or backscattered charged particles are released on impingement of the primary charged particle beam, a detection unit adapted for detecting the secondary particles and/or secondary particles, and a beam guiding unit adapted for guiding the primary charged particle beam to the detection unit for impingement of a primary charged particle beam on the detection unit.

Abstract: An electron beam apparatus and a method for providing an energy-filtered primary electron beam are described. Therein, a primary electron beam having an asymmetric first energy distribution is generated by means of an electron source. The primary electron beam is high-pass energy filtered using a retarding lens.

Abstract: A lens assembly having a magnetic lens assembly for a charged particle beam system is provided. The lens assembly includes: a first pole piece having a connecting portion of the first pole piece and a gap portion of the first pole piece, a second pole piece having a connecting portion of the second pole piece and a gap portion of the second pole piece, wherein the first pole piece and the second pole piece provide a gap at the respective gap portions, a coil for exciting the magnetic lens assembly, a centering element comprising a material that has a smaller Young's modulus than the material of the first and the material of the second pole piece, wherein the pole pieces are connected with each other at the respective connecting portions and have a centering element receiving portion towards the respective gap portion ends of the pole pieces.

Abstract: A lens assembly having an electrostatic lens component for a charged particle beam system is provided. The assembly includes: a first electrode having a conically shaped portion, a second electrode having a conically shaped portion, and a first insulator having a conically shaped portion, wherein the first insulator comprises two extending portions towards each of its ends, and wherein the two extending portions are formed to generate a gap between the insulator and each of the adjacent electrodes.

Abstract: An emitter chamber for a charged particle beam apparatus with a wall defining a vacuum enclosure is provided, the emitter chamber comprising a housing enclosing an emitter (and at least one pump and attachment means for attaching said emitter chamber to the wall of said charged particle apparatus so that the housing of said emitter chamber is accommodated within said vacuum enclosure.

Abstract: A gun chamber for a charged particle emitter is provided, said gun chamber comprising at least one electrode coated with a non-evaporable getter (NEG) material.

Abstract: A magnetic lens for a charged particle beam device and a charged particle beam device are provided. The magnetic lens includes a coil with coil windings to be excited for generation of a magnetic field, a pole piece to guide the magnetic field, a heat shield, which is connected to a cooling system, and a thermal insulation layer provided between the heat shield and the coil.

Abstract: A charged particle detector assembly comprises a particle detector, which has at least one particle sensitive region for detecting at least a portion of the spatial distribution of charged particles and for generating a two-dimensional optical signal which correlates to the detected spatial distribution. Further, an image conduit has an input coupled to the particle sensitive region of the particle detector for transmitting the two-dimensional optical signal to at least one optical detector. Further, a selecting means is adapted for selecting at least a portion of the two-dimensional optical signal.

Abstract: An assembly for a detection unit for an optical device is described. The assembly includes a scintillator adapted to received secondary particles and, in response, generate photons, wherein the scintillator includes an opening for trespassing of a primary beam through the scintillator. The scintillator including the opening is asymmetrical with regard to one axis.

Abstract: A charged particle beam device is provided. The device includes a primary objective lens for focusing a primary charged particle beam, the primary objective lens defining an optical axis, a specimen stage defining a specimen location area, a deflection unit for deflecting the primary charged particle beam between the primary objective lens and the specimen location area, towards a beam path for impingement on the specimen, wherein the deflection unit is movable with respect to the optical axis.

Abstract: The invention provides electron multiple beam devices (1) for probing or structuring a non-transparent specimen (20) with primary electron beams (14) with an array of electron beam sources (3) to generate multiple primary electron beams (14), an electron sensor (12) with electron sensor segments (12a) to detect electrons of the primary electron beams (14) and at least one anode (7) to direct the primary electron beams (14) towards the electron sensor (12). The electron sensor (12) serves to inspect the primary electron beams (14), calibrate the positions of the primary electron beams (14) and possibly adjust final focus length (13) and currents of the primary electron beams before or after a probing or structuring the upper surface (20a) of a non-transparent specimens (20). Further, methods to inspect primary electron beams (14), to adjust final focus lengths (13) and to calibrate the multiple electron beam device (1) are provided.

Abstract: A charged particle beam apparatus is provided which comprises a charged particle source for producing a primary beam of charged particles, aperture means for collimating said primary beam of charged particles, wherein said aperture means is adapted to switch between a collimation of said primary beam resulting in a width appropriate for serial imaging of a sample as well as a collimation of said primary beam to a width appropriate for parallel imaging of said sample, a condenser lens for condensing said primary beam of charged particles, scanning means for deflecting said primary beam of charged particles, an objective lens for focusing said condensed primary beam, a sectorized detector for detecting a secondary charged particles. Also, several different operation modes of the beam apparatus are described allowing for serial imaging as well as parallel imaging.

Abstract: The invention provides an electron beam device 1 comprising at least one field emission cathode 3 and at least one extracting electrode 5, whereby the field emission cathode 5 comprises a p-type semiconductor region 7 connected to an emitter tip 9 made of a semiconductor material, an n-type semiconductor region 11 forming a pn-diode junction 13 with the p-type semiconductor region 7 a first electric contact 15 on the p-type semiconductor region 7 and a second electric contact 17 on the n-type semiconductor region 11. The p-type semiconductor region 7 prevents the flux of free electrons to the emitter unless electrons are injected into the p-type semiconductor region 7 by the pn-diode junction 13. This way, the field emission cathode 3 can generate an electron beam where the electron beam current is controlled by the forward biasing second voltage V2 across the pn-diode junction. Such electron beam current has an improved current value stability.

Abstract: The invention provides an optical system for a charged particle multi-beam system. The optical system comprises an electrostatic lens component and a magnetic lens component. The components are used to focus a plurality of charged particle beams in a separate opening for each of at least a plurality a charged particle beams traveling through the optical system.

Abstract: A method for operating a charged particle beam emitting device and, in particular, an electron beam emitting device including a cold field emitter is provided. The method includes the steps of placing the cold field emitter in a vacuum of a given pressure, the emitter exhibiting a high initial emission current I0 and a lower stable mean emission current IS under a given electric extraction field; applying the given electric extraction field to the emitter for emitting electrons from the emitter surface; performing a cleaning process by applying at least one heating pulse to the cold field emitter for heating the emitter surface, whereby the cleaning process is performed before the emission current of the cold field emitter has declined to the lower stable mean emission value IS; and repeating the cleaning process to keep the emission current of the emitter continuously above the substantially stable emission value IS.

Abstract: A charged particle beam apparatus and a method are provided. The apparatus comprises a charged particle emitter located within a gun chamber, the gun chamber being adapted to encompass a first pressure; at least one further vacuum chamber adapted to encompass a second pressure between one order and four orders of magnitude higher than the first pressure; a first aperture unit; comprising at least a first aperture opening and a molecule blocking area; a second aperture unit comprising a second aperture opening. Thereby, the first aperture unit and/or the second aperture unit is a differential pressure aperture separating two independently evacuateable vacuum chambers and being adapted for maintaining a pressure difference of at least two orders of magnitude and the emitter, the molecule blocking area and the second aperture opening are positioned to be on a straight line.