Patents by Inventor Pavel Staryuk

Pavel Staryuk has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • The dome: shape and temperature controlled surfaces
    Publication number: 20020000198
    Abstract: The present invention provides an HDP-CVD tool using simultaneous deposition and sputtering of doped and undoped silicon dioxide capable of excellent gap fill and blanket film deposition on wafers. The tool of the present invention includes: a dual RF zone inductively coupled plasma source; a dual zone gas distribution system; temperature controlled surfaces within the tool; a symmetrically shaped turbomolecular pumped chamber body; a dual cooling zone electrostatic chuck; an all ceramic/aluminum alloy chamber; and a remote plasma chamber cleaning system.
    Type: Application
    Filed: July 23, 2001
    Publication date: January 3, 2002
    Applicant: Applied Materials, Inc.
    Inventors: Tetsuya Ishikawa, Pavel Staryuk, Hiroji Hanawa
  • Dome: shape and temperature controlled surfaces
    Patent number: 6286451
    Abstract: The present invention provides an HDP-CVD tool using simultaneous deposition and sputtering of doped and undoped silicon dioxide capable of excellent gap fill and blanket film deposition on wafers. The tool of the present invention includes: a dual RF zone inductively coupled plasma source; a dual zone gas distribution system; temperature controlled surfaces within the tool; a symmetrically shaped turbomolecular pumped chamber body; a dual cooling zone electrostatic chuck; an all ceramic/aluminum alloy chamber; and a remote plasma chamber cleaning system.
    Type: Grant
    Filed: May 29, 1997
    Date of Patent: September 11, 2001
    Assignee: Applied Materials, Inc.
    Inventors: Tetsuya Ishikawa, Pavel Staryuk, Hiroji Hanawa
  • Antenna coil assemblies for substrate processing chambers
    Patent number: 6192829
    Abstract: The present invention provides exemplary antenna coil assemblies and substrate processing chambers using such assemblies. In one embodiment, an antenna coil assembly (100) for a substrate processing chamber includes an antenna coil (102) disposed in a frame (104). The frame includes a plurality of spaced apart tabs (120) around a periphery of the frame, with the coil coupled to the frame at the tabbed locations. At least one notch (122) is provided between each pair of adjacent tabs. The notches are adapted to facilitate thermal expansion and contraction of the frame at the notched locations to reduce stresses on the frame and coil connections.
    Type: Grant
    Filed: September 17, 1999
    Date of Patent: February 27, 2001
    Assignee: Applied Materials, Inc.
    Inventors: Michael P. Karazim, Tetsuya Ishikawa, Rudolf Gujer, Thomas Kring, Pavel Staryuk, Abhi Desai, Tom Cho, Michael Douglas